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22nd International Symposium on Plasma Chemistry July 5-10, 2015; Antwerp, Belgium Comparison of DNA damage by sub-ionized and ionized energy electron collisions and novel component separable nonthermal atmospheric plasma Y. Park1, H. Noh2, H. Cho2, S. Leon3 and R. Wagner3 1 Plasma Technology Research Center, National Fusion Research Institute, Gunsan, South Korea 2 Department of Physics, Chungnam National University, Daejeon, South Korea 3 Université de Sherbrooke, Sherbrooke J1H 5N4, Québec, Canada Abstract: Low energy electrons (LEEs) under 15 eV can indirectly damage DNA subunits via dissociative electron attachment (DEA). We have compared DNA damage induced by LEE and high energy electron (HEE) collisions. We have also tried XPS analysis to clearly interpret the exact mechanism of DNA damage by LEE. Finally, we introduce a new design of nonthermal atmospheric plasma source to investigate plasma effects of plasma agriculture and food applications. Keywords: DNA damage, dissociative electron attachment, plasma jet, XPS analysis 1. Introduction It is very interesting that LEE can generate DNA damage by resonant mechanism even they have not enough energy to cause direct ionization [1]. We have studied the exact damage mechanism by LEE and other causes like UV, radical and ions at the molecular level. We will introduce some results and would like to discuss them with you to further understand. And we are planning to make a new experimental system to investigate plasma effects of plasma based agriculture and food applications. 2. Experiment The dried DNA films through the lyophilized technique were irradiated by LEE (1 eV and 10 eV) and HEE (10 keV) under ultra-high vacuum. And then, the irradiated DNA samples were analysed with HPLC, LC MS/MS and XPS to compare the yield of DNA damage and find out new types of DNA damage. 3. Results and discussion We confirm that LEEs can indirectly generate DNA damage through DEA resonant process and HEE can directly generate DNA damage through one electron ionization. Fig. 1 shows HPLC chromatogram of 1 eV electron collision and control. We observed many new types of DNA damage with 1 eV, 10 eV and 10 keV electron collisions. Fig. 2 shows the comparison of XPS spectra. The change of C1s peaks may be related to the damage of bonds such as C-C, C-N, C-H on DNA subunits. Peaks in C1s region are increased or decreased after LEE collision and adding Fe ion. 0,007 TpT 0,005 0,003 0,002 TpTp pTpT Thy pT 0,004 Tp Absorption at 260 nm (a.u.) TpTpT (1) TpTpT(1 eV irradiation) (2) TpTpT(No 1 eV irradiation) (a) 0,006 (1) 0,001 0,000 (2) 0 10 20 30 40 50 60 70 Retention time (min) Fig. 1. HPLC chromatograms of (1) 1 eV electron collision on DNA and (2) control. (a (b) C1s Scan A C1s Scan A C1s C1s C1s Scan B C1s Scan B C1s Scan C (c ) C1s Scan C C1s Scan A C1s (d) C1s Scan A C1s Scan B C1s C1s Scan B C1s Scan C C1s Scan C Fig. 2. XPS spectra of C1s region for DNA film samples: (a) DNA without LEE and Fe ion; (b) DNA with LEE only; (c) DNA without LEE and with Fe ion; and (d) DNA with LEE and Fe ion. P-III-10-24 1 4. Conclusion We have compared DNA damage by LEE and HEE collisions. And we also tried XPS analysis of DNA damage to further investigate of DNA damaging mechanism. We introduce a novel component separable nonthermal atmospheric plasma source. 5. References [1] B. Boudaiffa, et al. Science, 287, 1658 (2000) 2 P-III-10-24