* Your assessment is very important for improving the workof artificial intelligence, which forms the content of this project
Download So far, we have only considered DC analysis and only resistive drops
Ground (electricity) wikipedia , lookup
Power inverter wikipedia , lookup
Stray voltage wikipedia , lookup
Telecommunications engineering wikipedia , lookup
Ground loop (electricity) wikipedia , lookup
Skin effect wikipedia , lookup
Mains electricity wikipedia , lookup
History of electric power transmission wikipedia , lookup
Transmission line loudspeaker wikipedia , lookup
Amtrak's 25 Hz traction power system wikipedia , lookup
Buck converter wikipedia , lookup
Single-wire earth return wikipedia , lookup
Electrical substation wikipedia , lookup
Time-to-digital converter wikipedia , lookup
Lumped element model wikipedia , lookup
Overhead line wikipedia , lookup
Alternating current wikipedia , lookup
Switched-mode power supply wikipedia , lookup
Resistive opto-isolator wikipedia , lookup
Interconnect………..continued So far, we have only considered DC analysis and only resistive drops! AC analysis due to di/dt and dv/dt of inductive and capacitive loads has to be taken into account. These are called Vdd and Ground bounce. RC Delays As device sizes decrease the delay of the switching devices decrease, but the delay due to interconnect keep increasing. This is shown in the figure below. The length of interconnect is a major parameter affecting delay, usually we try to keep interconnects as short as possible. A typical interconnects length distribution is shown in the graph below. Page 1 of 20 Lecture#7 Overview An interconnect is a distributed RC network, with certain time constant that contribute to delay due to charging and discharging of the entire line every time the input changes. For simplicity, the entire line usually approximated to a lumped resistor and a capacitor. Fringing and Parallel plate Capacitances Interconnect wires are laid over insulators. As such they have capacitances: Parallel Plate and Fringing. As wire width are scaled down the effect of the fringing capacitance are becoming dominant. Page 2 of 20 Lecture#7 Overview Ctotal C p C f Parallel Plate Capacitor can be determined as: W L H C p C p 0 * W .L Cp 0 Where, Cp0 is the capacitance per unit area. H is the thickness of the insulator. The fringing capacitor can be determined empirically using the following relationship: T CF r * 4H 2H T ln( 1 (1 1 )) T H From the picture above, T is the thickness of wire and H is the distance of wire to substrate. When dimension of interconnect are large, then the parallel plate component dominates however as we scale dimensions the fringing component dominates as shown in the graph below Page 3 of 20 Lecture#7 Overview Cross talk between adjacent metal nets Crosstalk is the unwanted voltages induced in one conductor from a neighboring conductor due to capacitive coupling between them, Page 4 of 20 Lecture#7 Overview Cross section view of metal interconnects and associated parasitic capacitances Page 5 of 20 Lecture#7 Overview Delay of interconnect line Consider an interconnect line of length L and width W, Capacitance = C/unit area * L (length) * W (width) = C Resistance = R/ * number of squares = R What to do if we need to model the RC line in order to get the delay? 1. Time Constant Analysis LUMPED MODEL T-MODEL -MODEL 2T-MODEL 2 -MODEL Similarly, 3T or 3 models can be obtained. As we increase the modeling complexity, a better approximation of the delay is obtained. Table below gives correlation between different modeling methods. Voltage Range 0 – 50% 0 – 63% 10 – 90% Page 6 of 20 Lumped RC 0.69RC RC 2.2RC Distributed RC 0.38RC 0.5RC 0.9RC Lecture#7 Overview Assume R = Resistance per unit length, C = Capacitance per unit area The line can be described as a distributed RC network as From the analysis, delay rc N ( N 1) , where N is the number of sections or units. r is the resistance/section 2 and c is the capacitance /section delay 2 rcl , where l is the length of the interconnect, r is the resistance/unit length and c 2 is the capacitance /unit length. Page 7 of 20 Lecture#7 Overview Interconnect Continued RC distributed model for interconnect was derived previously as: rc 2 l , where rc is per unit resistance and capacitance 2 rc 0r n(n 1) 2 Now for the circuit shown below What is the maximum practical length that can be used? Let us take an example Example A signal is propagated on a 6mm length metal 1 (M1) interconnect, using minimum wire width. Calculate the delay and comment on methods for reducing this delay. Delay of wire = rc 2 l 2 Now the resistance and capacitance of CMOSIS5 are given as (from the manual): r = 0.07 / c = 46 aF/µm2, c = 46*1 exp -18, (a = 1 exp -18), If we normalize the resistance and capacitance to unit length ( assuming our unit length to be 0.6µ, r = 0.07 / unit length c = 46 * 0.36 aF / unit length 0.07 * 4.6 * 0.36 *1018 6000 2 ( ) *109 ns 2 0.6 0.057ns Page 8 of 20 Lecture#7 Overview Is the time constant acceptable? It really depends on the design. If this result is not acceptable, then we have to solve this problem, by either widening the wire, thus decreasing the resistance, however that increases the capacitance as well. Now since the delay is proportional to l2 then a possible solution is to break down the long interconnect line into smaller segments. Let us assume, we insert a buffer in the middle of the line, Using the equation rc 2 l 2 0.07 * 4.6 * 0.36 *1018 3000 2 ( ) *109 ns 2 0.6 0.014ns The overall delay of the two interconnects plus the new buffer is now: delayoverall 2 * 0.014 buff if the buffer has a delay of buff 0.01ns 2 * 0.014 0.010 tot 0.038ns 0.057ns(original value) One solution is to insert buffers in the transmission line until the total delay of the line becomes much smaller than the delay of the buffer. For the buffer introduced we did minimize the delay. But this one dimensional minimization, we did mot study its effect on other parameters. . By introducing the buffer, we have increased the power dissipation, the area and the routing complexities. When other factors are included, then it is possible to say we can introduce the buffer or not. Generally, the maximum length of the wire should be calculated according to the following criteria. buff Page 9 of 20 2 * buff rc 2 ) l or l ( rc 2 Lecture#7 Overview This formula has different values depending on the type of material being used, for example, the time constant for metal 1 is different from that of poly-silicon. In case of segmented and unequal interconnects, we usually break down the total length into multiple paths, each one with their own time constant. Page 10 of 20 Lecture#7 Overview Example Determine the delay difference if metal 2 was used for interconnect for a signal to propagated on same length of interconnect, using minimum wire width. Then change For the same length change the width to1.2 cm and calculate the time. For Delay use delay rc 2 rc N ( N 1) ( or l ) 2 2 where N is the number of sections or units. Do remember that: Small line length: transistor speed governs the circuit speed. Medium line length Transistor output resistance and line capacitance govern the circuit speed. Long line length, line resistance and line capacitance govern the circuit speed. Cooling the room temperature to 77K reduces the resistivity by an order of magnitude. At higher frequencies, Ghz and above the skin effect has to be taken into account Design Guide Lines for high fan-out Lines with multiple loads will have longer delays. For lines such as Clocks, Data buses, Control lines Use wider lines but calculate delay break point Delay is proportional to l**2 try to avoid long wires if you can, or insert buffers. Avoid using wider lines if they are long. Small Geometries When should the concept of transmission line theory be used? Whenever the rise time and fall time of a signal is comparable to an interconnect delay, then the line can be model as a transmission line. pd 33 r , with unit of ps/cm Where, r is the dielectric constant of the material.. An empirical rule to obtain the critical path delay is: τpd =1/3 [min (tr, tf )] if l is the interconnect line length and v is the speed then, Page 11 of 20 Lecture#7 Overview tr,f < 3 (l / v) then use transmission line modeling tr,f > 5 (l / v) then use lumped model modeling In between you can use either model. What is the maximum size of silicon chip? What is the maximum size of a silicon chip? Various factors affect the physical size of an integrated chip mainly: Power dissipation Packaging Number of pins Technology The interconnect used The maximum chip size is obtained by Page 12 of 20 Lecture#7 Overview Achip 0.16 RoCo ln( RintCint CINT Area packaging Cl 2 ) Co Rint, Cint and CINT are resistance and capacitance / per unit length of the interconnect and the lower and upper case subscript refers to the chip and the package. A is the area of the die, Co and Ro are the input capacitance and output resistance of a minimum size inverter and CL is a typical off-chip load. Page 13 of 20 Lecture#7 Overview Inductances Definition: In electromagnetism, permeability is the degree of magnetization of a material that responds linearly to an applied magnetic field. Magnetic permeability Unit: H/m henries per meter. There exist two types of inductances: Die wires and on-chip inductances. For die wires, L p 4h ln( ) 2 d Where h is the height of the wire above the substrate, d is the diameter of the wire and pis the magnetic permeability of the material in H/m. For on-chip, L Page 14 of 20 p 8h w ln( ) 2 w 4h . Lecture#7 Overview Example Determine values for x, y due to inductive and resistive losses when the output driver sources 10mA in 1.5ns in the following circuit. Assume inductance of the line 13.9 nH/mm Page 15 of 20 Lecture#7 Overview From the above circuit, there will be both ground bounce and VDD bounce. Calculate the total amount of wire inductance For a wire strip of 1cm, Ltot=13.9*10=139nH Calculate the voltage drop across the wire Voltage drop across wire = 139 *10 9 * i t 10 *103 = 139 *10 * 1.5 *109 9 = 139 *10 mv 1.5 = 0.926V = 926 mV Assuming that the power supply for the output buffer is 3.3V, we hence have the following circuit. At this example we have neglected the resistive drops that usually has to be taken into account. Example of ground bounce So for the above circuit, if the ground is taken to an inverter as shown below: Page 16 of 20 Lecture#7 Overview When a ‘1” is applied at the nMOS, while the output is suppose to be ‘0” it might turn on momentarily because of the spike a voltage of 0.926 appear at the output. The same spike will propagate through the adjacent circuit. It is also particularly damaging to dynamic circuit. Also it will alter the VSB and that will have an effect on speed and current drive capability of the inverter. How to avoid this problem? The 1cm length wire is not practical in today’s technology. We now also use tens or hundreds of VDD and GND pads. As a result, the distance of 1 cm is very impractical. More realistic distances are 1mm and less. Also the assumed inductance is too high and is not practical. How about when we drive several buffers at the same time? This is very possible, as buses are getting wider, as well as the current demand increases several folds while it has to be delivered in shorter time, thus the ground bounce and VDD bounce is increased. Always calculate GND bounce and VDD bounce when distributing power lines! Design Guidelines Add .01microF decoupling capacitors on the supply lines. Put simultaneously switching output/input lines next to power lines or just sandwich them. Other techniques include: Using a Flip Chip device packages Reduce slew rate Limit the number of simultaneously switching output. Spread out simultaneously switching outputs, SSOs Use Out-of-phase simultaneously switching output (SSOs) using phase-locked loops (PLLs) Page 17 of 20 Lecture#7 Overview Example What will be the power line width if you drive a 10pF load at 1GHz Assume Vdd=3.5V. Solution The required power is P = fVDD2CL 9 = 1*10 * (3.5) = 0.1Watt 2 *10 *1012 P=I*V I = 0.1/3.5 I ≈ 30mA If we use a conductor with current density J = 1mA / um, we will need a width of 30um At this point, we need to go back and re-do the calculation for the inductance with the new width & length parameters. Page 18 of 20 Lecture#7 Overview Charge Sharing Consider a bus circuit with the following structure Qb = CbVb, where Qb is charge on the bus, Cb is the bus capacitance and Vb is the voltage at the bus. Similarly, for the charge on the signal line, we have Qs=CsVs, where Qs is charge on the signal line, Cs is the signal line capacitance and Vs is the voltage present on the signal line. When the NMOS transistor switches on, charge sharing occurs between the bus and the signal line. The net charge of the two lines combine becomes QR = CRVR, where VR is the resulting voltage of the bus and the signal. VR = QR /CR VR CbVb CsVs Cs Cb Consider one scenario Let, Vb = 3.3 Volt representing logic ‘1’ and Vs = 0V representing logic ‘0’ According to charge sharing, VR Page 19 of 20 CbVb CsVs Cs Cb Lecture#7 Overview VR 3.3Cb C s Cb VR 3.3 1.7V 2 This is under the assumption that Cs and Cb are equal, and the resulting VR is unacceptable! How to remedy this problem: Hence we must have the bus capacitance Cb >> Cs Example Calculate the drop in voltage for 64 read lines each consisting of 0.1pF capacitances. Assume bus capacitance to be 10pF. VDD * Cb C s Cb 3.3 *10 pF VR 10 (64 * 0.1 pF ) VR VR 33 16.4 VR 2V Page 20 of 20 Lecture#7 Overview