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Thermal Sensors and Actuators: A Survey of Principles and Applications Chang Liu Chang Liu MASS UIUC Outline • General knowledge of heat and energy transfer • Thermal actuators • Thermal sensors – Thermal sensors: sensors for thermal phenomena or sensors that use thermal phenomena – Bimetallic cantilevers – Thermal resistors – Sensors that are based on thermal transfer principles Chang Liu MASS UIUC Thermal Transfer Principles Heat will flow between two points of different temperatures. The heat transfer can take one of three forms • Conduction • Convection – Natural convection – Forced convection • Radiation Chang Liu MASS UIUC Chang Liu MASS UIUC Thermal Resistance Chang Liu MASS UIUC Example: Thermal Resistance of a Suspended Bridge Chang Liu MASS UIUC Chang Liu MASS UIUC Energy Storage • The term sh is the specific heat (J/KgK) • The term Cth is heat capacity Chang Liu MASS UIUC Actuation Methods • • • • • Chang Liu Electrostatic Thermal actuation Magnetic actuation Piezoelectric actuation Pneumatic actuation MASS UIUC Thermal Actuation • Thermal expansion – Liquid – Air – Solid • Phase change expansion – Vapor – Bubble generation – Solidification (volume contraction) • Most famous example: ink jet nozzle Chang Liu MASS UIUC Ink Jet Droplet Injector (TIJ 1.0, 1984) • • • • • • • • Chang Liu Bubble formation time: 1 ms. Ink ejection time: 15 ms. Peak pressure: 14 ATM Upon removal of heat, vapor cools and the bubble retreats. Refill at 24 ms, lasts about 25 ms. Surface temperature: 90% of critical temperature (vaporization temperature) which is 330 oC. Homogeneous boiling across the surface of the heater, made of tantalum-aluminum (Ta-Al) alloy. The heater has near zero TCR, so zero thermal expansion. • HP Ink Jet Printer - Single Drop MASS UIUC Comparison of Thermal Actuation and Electrostatic Actuation • Electrostatic actuation – Power: low power due to voltage operation. – Response speed: high speed. – Construction and fabrication: relatively simple – range of motion: for parallel plate capacitor, range of motion relatively small. Chang Liu • Thermal actuation – Relatively high power: due to current operation. – Lower response speed due to thermal time constant (dissipation and thermal charging) – Construction and fabrication: more complex due to material compatibility considerations. – Range of motion: relatively large. MASS UIUC Thermal Sensor Principles • Summary of major principles discussed in class – Thermal bimetallic bending induced by temperature change – Thermal resistive transducers • measures change of resistance under temperature variation • common materials include polysilicon and metal oxide. – Thermal couples • Seebeck effect – Semiconductor type temperature sensors • diode, transistors Chang Liu MASS UIUC Basic Principle • Thermal expansion coefficient: dimensional expansion of materials under elevated temperature. – Unit: 1/degC. Or Chang Liu L L T MASS UIUC Thermal Bimorph Actuator Chang Liu MASS UIUC Example: T -> E • A thermostat for home use • Energy in thermal domain • Translates into energy in mechanical domain (bimetallic bending) • Translate into position of mercury balls in the tube • Translate into electrical trigger for controlling the AC Chang Liu MASS UIUC Scanning Probe Microscopy Probe for Nano Lithography Chang Liu MASS UIUC Thermal Bimetallic Actuation Chang Liu MASS UIUC Chang Liu MASS UIUC Material Properties • Rules for designing efficient thermal bimetallic actuator: • maximize difference in a • ease of fabrication • material thermal stability Chang Liu Material Aluminum Thermal conductivity (W/cmK) 2.37 Temperature coefficient of expansion (ppm/K) 25 Aluminum oxide (polycrystalline) 0.36 8.7 Aluminum oxide (saphire) Carbon Carbon (diamond) Cr Cu GaAs Ge Au Si 0.46 0.016 23 0.94 4.01 0.56 0.6 3.18 1.49 6 16.5 5.4 6.1 14.2 2.6 SiO2 (thermal oxide) 0.0138 0.35 SiN (silicon nitride) 0.16 1.6 Polyimide (Dupont PI 2611 D) Poly silicon (LPCVD) 0.34 3 2.33 Ni Ti 0.91 0.219 13 8.6 MASS UIUC Micro Ciliary Motion System - biomimetic micro motion system • Biomimetic ciliary transport system – utilizing large number of distributed actuators to achieve macroscopic motion. Chang Liu MASS UIUC Thermal Bimetallic Actuator • Composite layer: polyimide (organic polymer) + metal (heater) • Resistance of heater: 30-50 ohm • current input: 25 mA (above which polyimide might be damaged) • Cutoff frequency is 10 Hz. • Beam bends upward due to intrinsic stress (tensile) in polyimide; • Upon heating, the thermal expansion in the polyimide is more extensive - the beam therefore bends downwards. Chang Liu MASS UIUC Thermal Resistive Transducers • As temperature increases, the following variables change – electrical resistivity – dimensions, since R l A • The value of the resistance as a function of the temperature is generally referred to as RT R0 (1 a R [T T0 ]) – where R0 is the value of resistance at room temperature To aR is called the TCR, or temperature coefficient of resistance, with unit being oC-1. – Note the equation is true for moderate temperature excursions. Chang Liu MASS UIUC Common Materials for Thermal Resistor • Doped silicon or polysilicon – Most commonly used in silicon micromachining for simplicity of fabrication – doping on the neighborhood of 1-2x1019 cm-3 gives zero TCR – higher doping, TCR approximately 0.2-0.5%/oC – lower doping, TCR approximately - 2%/oC (1018 cm-3 doping) or 6%/oC (2x1016 cm-3 doping) • Pure metal – the value of aR is on the order of 5000 ppm/oC, which is around 0.5%/oC. – Usually positive (resistance increase with temperature) • Semiconducting oxides of metal – oxide of Li, Cu, Co, Ti, Mn, Fe, Ni etc – value of is around negative 4-6%/oC, or 4-6%/K. Chang Liu MASS UIUC Known TCR of Polysilicon (Doped with Boron) • High TCR at low concentration; but value is less stable over long term. 1 0 TCR (%/C) -1 -2 -3 -4 -5 -6 -7 1.00E+16 1.00E+17 1.00E+18 1.00E+19 1.00E+20 Boron Doping (cm^-3) Chang Liu MASS UIUC A resistive temperature sensor may also serve as a ohmic heater • Ohmic heating power • P=I2R • The heating power is partially used to raise the temperature of a resistor and partially lost to surroundings through – Conduction – Convection – Radiation Chang Liu MASS UIUC IV-Characteristics • The Current-Voltage Relationship for a resistor is obtained when the voltage is systematically varied and the current is recorded. – Automated machine (semiconductor curve tracer) – Manual data collection • What is the IV characteristic of a thermal resistor? • Why cann’t we just use an ohm-meter (multimeter) to measure the resistance? Chang Liu MASS UIUC Thermal Insulation if Characterized by Thermal Resistance, RT Electrical vs. thermal analogy Voltage – temperature difference Current – thermal heat flux Resistance – thermal resistance l V R ;R A I l T Rth th ; Rth A P Chang Liu I, or P For electrical R[Ohm]=V[Volt]/I[Amp] =electrical resistivity*length/area For thermal RT=(T1-T2)/power[W] =thermal resistivity*length/area MASS UIUC Conclusions • Know how to measure the TCR of a thermal resistor; • Know how to measure the current-voltage characteristics (IV curve) of a thermal resistor; • Know how to obtain resistance-power relationship based on the IV curve; • Know how to obtain the temperature-power relationship based on the IV curve; • Know how to calculate the thermal resistance based on the IV curve. Chang Liu MASS UIUC Thermal Couples - Seebeck Effect • Thermal electric effect refers to the generation of electrical potential when a temperature differential exist across a piece of material. At the high temperature end, more electron will be excited into the conduction band and starts diffusion into the colder region. • The Seebeck effect (nameed after Seebeck), is commonly characterized by the Seeback coefficient which is expressed in the following form, for a single piece of metal: a V T • A working thermal couple with two different Seeback coefficients develop a voltage difference when subject to a temperature change of T. High T ΔV a ab a a a b V (a a a b )T Low T Chang Liu Why “thermal couple”? MASS UIUC Chang Liu MASS UIUC Seebeck Coefficient of Common Thermal Couple Materials • The rule of thumb is to find materials with maximum different of Seebeck coefficients. Parameters Type J Type K Type N Type T Type P Composition 1 (as, mV/K) Iron (17.7) Platinum (0 TO -5) 45% Ni 55% Al (?) -40 Constantan (55% Cu 45% Ni) (?) -250 87% Pt 13% Rh (?) Minimum temperature Nicrosil (71-86% Ni 14% Cr 0-15% Fe) (?) Nisil (95% Ni 4.5% Si) (?) -230 Copper (?) Composition 2 (as, mV/K) Chromel (90% Ni 10% Cr) (29.8) Alumel (95% Ni 2% Al 2% Mn 1% Si) (-10.85) -200 Maximum temperature 850 1100 1230 400 1350 Chang Liu -50 MASS UIUC Exercise Problem • First calculate the radius k 1 6 w1w2 E1 E2t1t 2 (t1 t 2 )(a1 a 2 )T 2 2 2 2 2 2 r ( w1 E1t1 ) ( w2 E2t 2 ) 2 w1w2 E1 E2t1t 2 (2t1 3t1t 2 2t 2 ) 6 (10 10 6 ) 2 57 150 1018 0.5 1.5 10 12 2 10 6 11.67 10 6 20 (10 10 6 150 109 2.25 10 12 ) 2 ( w2 E2t 22 ) 2 2 w1w2 E1 E2t1t 2 (2t12 3t1t 2 2t 22 ) 1.796013 10 9 1.1390625 10 11 (10 10 6 57 109 0.25 10 12 ) 2 ... 1.796013 10 9 1.1390625 10 11 2.030625 10 14 2 (10 10 6 ) 2 57 150 1018 0.5 1.5 10 12 (2t12 3t1t 2 2t 22 ) 1.796013 10 9 1.141093125 10 11 1.2825 (2 2.25 10 12 3 0.625 10 12 2 0.25 10 12 ) 1.796013 10 9 88.78794 1.141093125 10 11 1.2825 6.875 10 12 r 0.01126m Chang Liu MASS UIUC Calculate Vertical Displacement q=l/r=0.08881 radian=5.0884 o • d=r-rxcosq44.3758 mm. q r r d Chang Liu MASS UIUC MEMS Infra Red Sensor – Hybrid Sensing • Thermal bimetallic material as sensing • IR infrared beam heat the top plate • temperature rise causes the zigzagged beam to bend • The distance between the parallel plate capacitor changes • thermal isolation allows maximum temperature rise given the absorbed energy. Chang Liu MASS UIUC