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A Laser Coupler for DVD/CD Playback
A Laser Coupler for DVD/CD Playback

... then used to form the 650nm stripe, then ion implantation was used to form the 780nm stripe. An extremely high accuracy of the emitting position between the 650nm and the 780nm element was obtained. In the etching process for forming the 650nm stripe, the pcap layer was removed at the side of the 65 ...
Time-resolved coherent anti-Stokes Raman scattering microscopy: Imaging based on Raman free induction decay
Time-resolved coherent anti-Stokes Raman scattering microscopy: Imaging based on Raman free induction decay

... A time-resolved coherent anti-Stokes Raman scattering 共CARS兲 microscope allows three-dimensional imaging based on Raman free induction decay of molecular vibration with no requirement for labeling of the sample with natural or artificial fluorophores. A major benefit of the technique is the capabili ...
Flow Cytometry and Sorting, Part 1
Flow Cytometry and Sorting, Part 1

... have very sharp cutons and cutoffs since there will be many orders of magnitude more scattered laser light than fluorescence  Can specify wavelengths that filter must reject to certain tolerance (e.g., reject 488 nm light at 10-6 level: only 0.0001% of incident light at 488 nm gets through) ...
Optical properties of silicon at low temperatures
Optical properties of silicon at low temperatures

... • for p-polarised light there is no reflection on a surface if the angle of incident is the brewster angle • so all light can be used for the measurement without losses because of reflected light • scattered light causes problems inside a cryostat ...
On-chip gas detection in silicon optical microcavities
On-chip gas detection in silicon optical microcavities

... room temperature and atmospheric pressure. A resonance shift of approximately 0.2 nm is clearly visible. To confirm that the shift in resonance is due entirely to the difference in gasses we repeated the measurement 3 times alternating between air and acetylene. We calculate an average resonance shi ...
Short-pulse limits in optical instrumentation design for the S
Short-pulse limits in optical instrumentation design for the S

The mechanism for continuum polarization in laser induced
The mechanism for continuum polarization in laser induced

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... This procedure makes the measurement method less sensitive to environmental changes Question Why does the use of reference laser make the wavelength meter less sensitive to environmental changes? Reference lasers Helium-neon (HeNe) lasers emitting at 632.9907 nm are often used as wavelength referenc ...
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Associate Professor Shien

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Physical optics - Manual (with template)
Physical optics - Manual (with template)

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... frequency ranges over which the properties of the “image” are drastically different. To describe these observations complete the table on the answer form by adding a row to this table for each such frequency range and fill it in by using the appropriate notations explained on that page. ...
The Physics of the Optical Fibre
The Physics of the Optical Fibre

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Chapter 2

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Controllable optical negative refraction and

... through a perturbative medium12 . Realization of phase conjugation is based on degenerate four-wave mixing, in which two counterpropagating beams are used to write a holographic grating into a nonlinear crystal, while a third beam is diffracted in a direction exactly opposite to the incident wave. T ...
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Lecture 21: Polarisation of light and other waves

... oscillating, but in such a way that the total is constant and the direction describes a clockwise circle. This is Right-Handed (RH) polarised light. If the V component lags by 90◦ this gives Left Handed (LH) polarised light, with the E field going round anticlockwise. If 45◦ plane polarised light is ...
Microsoft Word Format - University of Toronto Physics
Microsoft Word Format - University of Toronto Physics

... track. If necessary adjust the mirror but not adjust the laser during this part of the alignment process. 3. Tilt the mirror holder until the beam passes through the same spot above the alignment bar everywhere along the track. Note that the entire beam does NOT have to pass through the pinhole. 4. ...
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... Taking into account that ratio l 0 / j for the given scattering spheres does not depend on their concentration and is determined only by scattering properties of the single particle [l;( s f ) 21 , as well as j ;l and l 0 /l52k 0 2 / ^ q̄ 2 & , where s is the scattering cross-section of the single p ...
Optical frequency standard
Optical frequency standard

... Quite generally, frequency standards with a high oscillation frequency profit from a better stability than those with lower oscillation frequencies. Although optical sources are used for some functionalities (optical pumping, laser cooling of atoms), all present primary and secondary frequency stand ...
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Experimental Demonstration of a 2

... Tapped-delay-lines are a fundamental building block for many data signal processing functions, including correlation, equalization, filtering, and almost any element that provides a transfer function [1]. Moreover, it may be beneficial to enable an optical tapped-delay-line (OTDL) so that: (i) certa ...
EEE440 Modern Communication Systems Optical Fibre
EEE440 Modern Communication Systems Optical Fibre

... At the right-hand mirror, the wave experiences a 180° phase shift and continues to propagate. At the left-hand mirror, this wave again has the same phase shift and continues to travel yielding a stable pattern called a standing wave ...
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... made by changing many design parameters simultaneously. This requires a true non-linear optimisation algorithm. The software uses damped least squares as the basic optimisation method, but with several enhancements [4], such as an extended line search option. The merit function is powerful and flexi ...
Imaging with Terahertz Pulses
Imaging with Terahertz Pulses

... metric as a function of thickness identifies the predicted material thickness and the complex refractive index. We investigate the limits of our method with respect to the minimum measurable refractive index and compare our results to literature data for several different materials. For each pixel, ...
LABORATORY TECHNIQUES
LABORATORY TECHNIQUES

... the interference pattern. The angle should be chosen such that a complete interference pattern can be seen. Adjust the position of the collimating lens until the desired interference pattern is obtained (uniform central area for parallel flat, largest fringe pattern for wedge flat). Collimating with ...
Imaging optical singularities; Understanding the duality of C-points and optical vortices
Imaging optical singularities; Understanding the duality of C-points and optical vortices

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Ellipsometry

Ellipsometry is an optical technique for investigating the dielectric properties (complex refractive index or dielectric function) of thin films. Ellipsometry can be used to characterize composition, roughness, thickness (depth), crystalline nature, doping concentration, electrical conductivity and other material properties. It is very sensitive to the change in the optical response of incident radiation that interacts with the material being investigated.Typically, the measured signal is the change in polarization as the incident radiation (in a known state) interacts with the material structure of interest (reflected, absorbed, scattered, or transmitted). The polarization change is quantified by the amplitude ratio, Ψ, and the phase difference, Δ (defined below). Because the signal depends on the thickness as well as the materials properties, ellipsometry can be a universal tool for contact free determination of thickness and optical constants of films of all kinds.This technique has found applications in many different fields, from semiconductor physics to microelectronics and biology, from basic research to industrial applications. Ellipsometry is a very sensitive measurement technique and provides unequaled capabilities for thin film metrology. As an optical technique, spectroscopic ellipsometry is non-destructive and contactless. Because the incident radiation can be focused, small sample sizes can be imaged and desired characteristics can be mapped over a larger area (m^2).The one weakness of ellipsometry is the need to model the data. Entire courses are taught in the modeling of the raw data. Models can be physically based on energy transitions or simply free parameters used to fit the data.Upon the analysis of the change of polarization of light, ellipsometry can yield information about layers that are thinner than the wavelength of the probing light itself, even down to a single atomic layer. Ellipsometry can probe the complex refractive index or dielectric function tensor, which gives access to fundamental physical parameters like those listed above. It is commonly used to characterize film thickness for single layers or complex multilayer stacks ranging from a few angstroms or tenths of a nanometer to several micrometers with an excellent accuracy.The name ""ellipsometry"" stems from the fact that Elliptical polarization of light is used. The term ""spectroscopic"" relates to the fact that the information gained is a function of the light's wavelength or energy (spectra). The technique has been known at least since 1888 by the work of Paul Drude, (the term ""ellipsometry"" being first used probably in 1945 ) and has many applications today. A spectroscopic ellipsometer can be found in most thin film analytical labs. Ellipsometry is also becoming more interesting to researchers in other disciplines such as biology and medicine. These areas pose new challenges to the technique, such as measurements on unstable liquid surfaces and microscopic imaging.
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