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The Photoelectric Effect and Measuring Planck`s Constant
The Photoelectric Effect and Measuring Planck`s Constant

chemistry i
chemistry i

Revision topic 1-3
Revision topic 1-3

... Positive ions are smaller than their parent atoms (because of loss of the outer shell). Negative ions are larger than their parent atoms (because of increased electron repulsion by addition of electrons). The ionic radii decrease as a period is crossed from the left to the right (because of increase ...
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first chapter - damtp - University of Cambridge
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... The electrons are held in the atom by the electrostatic attraction between each electron and the nucleus. There is also an attraction because of the gravitational force, but this is about 10 40 times less strong, and so may be neglected. The protons and neutrons are held together in the nucleus by a ...
Chemistry 1 Practice Final Exam - Tutor
Chemistry 1 Practice Final Exam - Tutor

... a) Circle the permissible sets of quantum numbers for an electron in a hydrogen atom: n = 2, l = 1, ml = 1 : n = 4, l = 2, ml = -2 : n = 3, l = 1, ml = 2 : n = 2, l = 2, ml = -1 ...
Lecture 11
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... • The treatment described here can be applied to any hydrogen-like atom, i.e. an atom with an electron and a nucleus of charge Zq. Simply replace everywhere e2 → Ze2 . • It is interesting to compute the expectation value of the momentum. Since the�typical size of the atom is a0 , we deduce from the ...
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Chemistry 11 – Course Outcomes

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... Solve: The gamma ray wavelength λ = 1.73 × 10−4 nm corresponds to a photon energy of Ephoton = hc/λ = 7.2 MeV. From Fig. 41.17, we can see that a photon of this energy is emitted in a transition from the n = 2 to n = 1 energy level. This can happen after a proton-nucleus collision if the proton’s im ...
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Chapter 8 - Bakersfield College
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... through space as quanta of energy called photons. These photons, if of sufficient energy, could dislodge electrons from a metal surface causing the photoelectric effect. C. Einstein's equation for the photoelectric effect is hf = KE + w where hf = energy of a photon whose frequency is f, KE = kineti ...
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X-ray photoelectron spectroscopy



X-ray photoelectron spectroscopy (XPS) is a surface-sensitive quantitative spectroscopic technique that measures the elemental composition at the parts per thousand range, empirical formula, chemical state and electronic state of the elements that exist within a material. XPS spectra are obtained by irradiating a material with a beam of X-rays while simultaneously measuring the kinetic energy and number of electrons that escape from the top 0 to 10 nm of the material being analyzed. XPS requires high vacuum (P ~ 10−8 millibar) or ultra-high vacuum (UHV; P < 10−9 millibar) conditions, although a current area of development is ambient-pressure XPS, in which samples are analyzed at pressures of a few tens of millibar.XPS is a surface chemical analysis technique that can be used to analyze the surface chemistry of a material in its as-received state, or after some treatment, for example: fracturing, cutting or scraping in air or UHV to expose the bulk chemistry, ion beam etching to clean off some or all of the surface contamination (with mild ion etching) or to intentionally expose deeper layers of the sample (with more extensive ion etching) in depth-profiling XPS, exposure to heat to study the changes due to heating, exposure to reactive gases or solutions, exposure to ion beam implant, exposure to ultraviolet light.XPS is also known as ESCA (Electron Spectroscopy for Chemical Analysis), an abbreviation introduced by Kai Siegbahn's research group to emphasize the chemical (rather than merely elemental) information that the technique provides.In principle XPS detects all elements. In practice, using typical laboratory-scale X-ray sources, XPS detects all elements with an atomic number (Z) of 3 (lithium) and above. It cannot easily detect hydrogen (Z = 1) or helium (Z = 2).Detection limits for most of the elements (on a modern instrument) are in the parts per thousand range. Detection limits of parts per million (ppm) are possible, but require special conditions: concentration at top surface or very long collection time (overnight).XPS is routinely used to analyze inorganic compounds, metal alloys, semiconductors, polymers, elements, catalysts, glasses, ceramics, paints, papers, inks, woods, plant parts, make-up, teeth, bones, medical implants, bio-materials, viscous oils, glues, ion-modified materials and many others.XPS is less routinely used to analyze the hydrated forms of some of the above materials by freezing the samples in their hydrated state in an ultra pure environment, and allowing or causing multilayers of ice to sublime away prior to analysis. Such hydrated XPS analysis allows hydrated sample structures, which may be different from vacuum-dehydrated sample structures, to be studied in their more relevant as-used hydrated structure. Many bio-materials such as hydrogels are examples of such samples.
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