* Your assessment is very important for improving the workof artificial intelligence, which forms the content of this project
Download chapter 1 - introduction to semiconductor
Current source wikipedia , lookup
Stray voltage wikipedia , lookup
Voltage optimisation wikipedia , lookup
Mains electricity wikipedia , lookup
Alternating current wikipedia , lookup
Surge protector wikipedia , lookup
Optical rectenna wikipedia , lookup
Shockley–Queisser limit wikipedia , lookup
Buck converter wikipedia , lookup
EMT112 CHAPTER 1 Introduction to Semiconductor By En. Rosemizi B. Abd Rahim Introduction to Semiconductor Chapter Outline : 1.1 1.2 1.3 1.4 1.5 1.6 1.7 1.8 1.9 1.10 Atomic Structures Semiconductors, Conductors, and Insulators Covalent Bonds Conduction in Semiconductor N-Type and P-Type Semiconductor The Diode Biasing the Diode Voltage Current Characteristic of a Diode Diode Models Testing a Diode Introduction to Semiconductor Chapter Objectives : Discuss basic operation of a diode Discuss the basic structure of atoms Discuss properties of insulators, conductors and semiconductors Discuss covalent bonding Describe the properties of both p and n type materials Discuss both forward and reverse biasing of a p-n junction 1.1 Atomic Structures History of Semiconductor 1.1 Atomic Structures Atomic number basic structure Electron shells ATOM Valence electron Free electron ionization 1.1 Atomic Structures smallest particle of an element contain 3 basic particles: Protons (positive charge) Neutrons (uncharged) Electrons (negative charge) Nucleus (core of atom) ATOM 1.1 Atomic Structures Atomic Number Element in periodic table are arranged according to atomic number Atomic number = number of protons in nucleus 1.1 Atomic Structures Electron Shells and Orbits - In an atom, the orbits are group into energy bands – shells Diff. in energy level within a shell << diff. an energy between shells Energy increases as the distance from the nucleus increases. 1.1 - Atomic Structures Valence Electrons Electrons with the highest energy levels exist in the outermost shell. Electron in the valence shell called valence electrons. The term valence is used to indicate the potential required to removed any one of these electrons. 1.1 Atomic Structures Bohr model of an atom This model was proposed by Niels Bohr in 1915. • electrons circle the nucleus. • nucleus made of: i) +protons ii) Neutral:neutron 1.2 Semiconductors, Conductors and Insulators • Atom can be represented by the valence shell and a core • A core consists of all the inner shell and the nucleus Carbon atom: -valence shell – 4 e -inner shell – 2 e Nucleus: -6 protons -6 neutrons +6 for the nucleus and -2 for the two inner-shell electrons 1.2 Semiconductors, Conductors and Insulators Conductors material that easily conducts electrical current. The best conductors are single-element material (copper, silver, gold, aluminum) One valence electron very loosely bound to the atom- free electron Insulators material does not conduct electric current valence electron are tightly bound to the atom – less free electron 1.2 Semiconductors, Conductors and Insulators Semiconductors material between conductors and insulators in its ability to conduct electric current in its pure (intrinsic) state is neither a good conductor nor a good insulator most commonly use semiconductor ; silicon(Si), germanium(Ge), and carbon(C). contains four valence electrons 1.2 Semiconductors, Conductors and Insulators 1.2 Semiconductors, Conductors and Insulators Energy Bands 1.2 Semiconductors, Conductors and Insulators Energy Bands •Energy gap-the difference between the energy levels of any two orbital shells •Band-another name for an orbital shell (valence shell=valence band) •Conduction band –the band outside the valence shell 1.2 Semiconductors, Conductors and Insulators Energy Bands at room temperature 25° eV (electron volt) – the energy absorbed by an electron when it is subjected to a 1V difference of potential 1.2 Semiconductors, Conductors and Insulators Comparison of a Semiconductor Atom & Conductor Atom A Silicon atom: •4 valence electrons •a semiconductor •Electron conf.: 2:8:4 14 protons 14 nucleus 10 electrons in inner shell A Copper atom: •only 1 valence electron •a good conductor •Electron conf.:2:8:18:1 29 protons 29 nucleus 28 electrons in inner shell 1.3 Covalent Bonding Covalent Covalent bonding –1-3 holding atoms Bonding together by sharing valence electrons sharing of valence electron produce the covalent bond To form Si crystal 1.3 Covalent Bonding The result of the bonding: 1. The atom are held together forming a solid substrate 2. The atoms are all electrically stable, because their valence shells are complete 3. The complete valence shells cause the silicon to act as an insulator-intrinsic (pure) silicon is a very poor conductor 1.3 Covalent Bonding Certain atoms will combine in this way to form a crystal structure. Silicon and Germanium atoms combine in this way in their intrinsic or pure state. Covalent bonds in a 3-D silicon crystal 1.4 Conduction in Semiconductor (Conduction Electron and holes) FIGURE 1-10 Energy band diagram for a pure (intrinsic) silicon crystal with unexcited atoms. There are no electrons in the conduction band. 1.4 Conduction in Semiconductor (Conduction Electron and holes) Absorbs enough energy (thermal energy) to jumps a free electron and its matching valence band hole FIGURE 1-11 Creation of electron-hole pairs in a silicon crystal. Electrons in the conduction band are free. 1.4 Conduction in Semiconductor (Conduction Electron and holes) FIGURE 1-12 Electron-hole pairs in a silicon crystal. Free electrons are being generated continuously while some recombine with holes. 1.4 Conduction in Semiconductor (Electron and holes currents) Electron current free electrons Apply voltage FIGURE 1-13 Electron current in intrinsic silicon is produced by the movement of thermally generated free electrons. 1.4 Conduction in Semiconductor (Electron and holes currents) movement of holes FIGURE 1-14 Hole current in intrinsic silicon. 1.5 N-types and P-types Semiconductors (Doping) Doping -the process of creating N and P type materials -by adding impurity atoms to intrinsic Si or Ge to imporove the conductivity of the semiconductor -Two types of doping – trivalent (3 valence e-) & pentavalent (5 valence e-) p-type material – a semiconductor that has added trivalent impurities n-type material – a semiconductor that has added pentavalent impurities Trivalent Impurities: Pentavalent Impurites: •Aluminum (Al) •Phosphorus (P) •Gallium (Ga) •Arsenic (As) •Boron (B) •Antimony (Sb) •Indium (In) •Bismuth (Bi) 1.5 N-types and P-types Semiconductors N-type semiconductor: - Pentavalent impurities are added to Si or Ge, the result is an increase the free electrons - Extra electrons becomes a conduction electrons because it is not attached to any atom - No. of conduction electrons can be controlled by the no. of impurity atoms - Pentavalent atom gives up an electron -call a donor atom - Current carries in n-type are electrons – majority carries - Holes – minority carries Sb impurity atom Pentavalent impurity atom in a Si crystal 1.5 N-types and P-types Semiconductors P-type semiconductor: - Trivalent impurities are added to Si or Ge to create a deficiency of electrons or hole charges - The holes created by doping process - The no. of holes can be controlled by the no. of trivalent impurity atoms - The trivalent atom can take an electron- acceptor atom - Current carries in p-type are holes – majority carries - electrons – minority carries B impurity atom Trivalent impurity atom in a Si crystal 1.6 The Diode -n-type material & p-type material become extremely useful when joined together to form a pn junction – then diode is created -p region- holes (majority carriers), e- (minority carriers) -n region- e- (majority carriers), holes (minority carriers) -before the pn junction is formed -no net charge (neutral) 1.6 The Diode (The Depletion Region) 1.6 The Diode (The Depletion Region) Summary: When an n-type material is joined with a p-type material: 1. A small amount of diffusion occurs across the junction. 2. When e- diffuse into p-region, they give up their energy and fall into the holes in the valance band covalent bonds. 3. Since the n-region have lost an electron, they have an overall +ve charge. 4. Since the p-region have gained an electron, they have an overall –ve charge. 5 The difference in charges on the two sides of the junction is called the barrier potential. (typically in the mV range) Barrier Potential: • The buildup of –ve charge on the p-region of the junction and of +ve charge on the n-region of the junction-therefore difference of potential between the two sides of the junction is exist. • The forces between the opposite charges form a “field of forces "called an electric field. • This electric field is a barrier to the free electrons in the n-region-need energy to move an ethrough the electric field. • The potential difference of electric field across the depletion region is the amount of voltage required to move e- through the electric field. [ unit: V ] • Depend on: type of semicon. material, amount of doping, temperature. (e.g : 0.7V for Si and 0.3 V for Ge at 25°C) 1.6 The Diode (Energy Diagram of the PN Junction and Depletion Region) Energy level for n-type (Valence and Cond. Band) << p- type material (difference in atomic characteristic : pentavalent & trivalent) After cross the junction, the e- lose energy & fall into the holes in p-region valence band. As the diffusion continues, the depletion region begins to form and the energy level of n-region conduction band decrease. Soon, no more electrons left in n-region conduction band with enough energy to cross the junction to p-region conduction band. Figure (b), the junction is at equilibrium state, the depletion region is complete diffusion has ceased (stop). Create an energy gradient –energy ‘hill’ – electron at n-region must climb to get to the p-region. The energy gap between valence & cond. band – remains the same 1.7 Biasing The Diode (Bias) No electron move through the pn-junction at equilibrium state. Bias is a potential applied (dc voltage) to a pn junction to obtain a desired mode of operation – control the width of the depletion layer Two bias conditions : forward bias & reverse bias The relationship between the width of depletion layer & the junction current Depletion Layer Width Junction Resistance Junction Current Min Min Max Max Max Min 1.7 Biasing The Diode ( Forward Bias) Diode connection •Voltage source or bias connections are + to the p material and – to the n material •Bias must be greater than barrier potential (0 .3 V for Germanium or 0.7 V for Silicon diodes) •The depletion region narrows. •R – limits the current to prevent damage for diode Flow of majority carries and the voltage across the depletion region •The negative side of the bias voltage push the free electrons in the n-region -> pn junction •Also provide a continuous flow of electron through the external connection into n-region •Bias voltage imparts energy to the free e- to move to p-region •Electrons in p-region loss energy- positive side of bias voltage source attracts the e- left the pregion •Holes in p-region act as medium or pathway for these e- to move through the p-region 1.7 Biasing The Diode ( The Effect of Forward Bias on the Depletion Region) As more electrons flow into the depletion region, the no. of +ve ion is reduced. As more holes flow into the depletion region on the other side – the no. of –ve ions is reduced. Reduction in +ve & -ve ions – causes the depletion region to narrow 1.7 Biasing The Diode ( The Effect of the Barrier Potential during Forward Bias) Electric field between +ve & -ve ions in depletion region creates “energy hill” -prevent free e- from diffusing at equilibrium state -> barrier potential When apply forward bias – free e- provided enough energy to climb the hill and cross the depletion region Electron got the same energy = barrier potential to cross the depletion region An add. small voltage drop occurs across the p and n regions due to internal resistance of material – called dynamic resistance – very small and can be neglected 1.7 Biasing The Diode ( ReverseBias) Diode connection •Condition that prevents current through the diode •Voltage source or bias connections are – to the p material and + to the n material •Current flow is negligible in most cases. •The depletion region widens Shot transition time immediately after reverse bias voltage is applied •+ side of bias pulls the free electrons in the nregion away from pn junction • cause add. +ve ions are created , widening the depletion region •In the p-region, e- from – side of the voltage source enter as valence electrons •e- move from hole to hole toward the depletion region, then created add. –ve ions. •As the depletion region widens, the availability of majority carriers decrease 1.7 Biasing The Diode ( Reverse Current) • extremely small current exist – after the transition current dies out • caused by the minority carries in n & p regions that are produced by thermally generated electron-hole pairs • small number of free minority e- in p region are “pushed” toward the pn junction by the –ve bias voltage • e- reach wide depletion region – they “fall down the energy hill” combine with minority holes in n -region as valence e- (flow towards the +ve bias voltage) – create small hole current • the cond. band in p region is at higher energy level compare to cond. band in n-region e- easily pass through the depletion region 1.8 Voltage-Current Characteristic of a Diode ( V-I Characteristic for forward bias) -When a forward bias voltage is applied – current called forward current, I F -In this case with the voltage applied is less than the barrier potential so the diode for all practical purposes is still in a non-conducting state. Current is very small. -Increase forward bias voltage – current also increase FIGURE 1-26 Forward-bias measurements show general changes in VF and IF as VBIAS is increased. 1.8 Voltage-Current Characteristic of a Diode ( V-I Characteristic for forward bias) -With the applied voltage exceeding the barrier potential (0.7V), forward current begins increasing rapidly. -But the voltage across the diode increase only above 0.7 V. FIGURE 1-26 Forward-bias measurements show general changes in VF and IF as VBIAS is increased. 1.8 Voltage-Current Characteristic of a Diode ( V-I Characteristic for forward bias) -Plot the result of measurement in Figure 126, you get the V-I characteristic curve for a forward bias diode - VF Increase to the right - I F increase upward dynamic resistance r’d decreases as you move up the curve zero bias VF 0.7V VF 0.7V r ' d VF / I F 1.8 Voltage-Current Characteristic of a Diode ( V-I Characteristic for Reverse bias) Breakdown voltage -not a normal operation of pn junction devices - the value can be vary for typical Si Reverse Current 1.8 Voltage-Current Characteristic of a Diode ( Complete V-I Characteristic curve) Combine-Forward bias & Reverse bias Complete V-I characteristic curve 1.8 Voltage-Current Characteristic of a Diode ( Temperature effect on the diode V-I Characteristic) • Forward biased dioed : T , I F for a given value of VF • For a given I F ,VF • Barrier potential decrease as T increase • Reverse current breakdown – small & can be neglected 1.9 Diode Models ( Diode structure and symbol) anod cathode Directional of current 1.9 Diode Models The Ideal Diode Model The Practical Diode Model DIODE MODEL The Complete Diode Model 1.9 Diode Models ( The ideal Diode model) Ideal model of diodesimple switch: •Closed (on) switch -> FB •Open (off) switch -> RB •Assume V 0V F •Forward current, by Ohm’s law IF VBIAS (1-2) RLIMIT IR 0A VR VBIAS 1.9 Diode Models ( The Practical Diode model) •Adds the barrier potential to the ideal switch model • r ' ‘d is neglected •From figure (c):VF 0.7V ( Si) VF 0.3V (Ge) The forward current [by applying Kirchhoff’s voltage low to figure (a)] VBIAS VF VRLIMIT 0 VRLIMIT I F RLIMIT •Represent by VF produced across the pn junction Ohm’s Law VBIAS VF IF RLIMIT •Equivalent to close switch in series with a small equivalent voltage source equal to the barrier potential 0.7V (1-3) •Same as ideal diode model IR 0A VR VBIAS 1.9 Diode Models ( The Complete Diode model) Complete model of diode consists: •Barrier potential •Dynamic resistance, r ' d •Internal reverse resistance, r ' R •The forward voltage: VF 0.7V I F rd' (1-4) •The forward current: IF VBIAS 0.7V RLIMIT rd' (1-5) •acts as closed switch in series with barrier potential and small r ' d •acts as open switch in parallel with the large r ' R 1.9 Diode Models ( Example) (1) Determine the forward voltage and forward current [forward bias] for each of the diode model also find the voltage across the limiting resistor in each cases. Assumed rd’ = 10 at the determined value of forward current. 1.0kΩ 1.0kΩ 10V 5V 1.9 a) Diode Models ( Example) Ideal Model: VF 0 V 10V I F BIAS 10mA R 1000 VRLIMIT I F RLIMIT (10 10 3 A)(1103 ) 10V b) Practical Model: VF 0.7V IF (c) Complete model: (VBIAS VF ) 10V 0.7V 9.3mA RLIMIT 1000 VRLIMIT I F RLIMIT (9.3 10 3 A)(1103 ) 9.3V IF VBIAS 0.7V 10V 0.7V 9.21mA ' RLIMIT rd 1k 10V VF 0.7V I F rd' 0.7V (9.21mA)(10) 792mV VRLIMIT I F RLIMIT (9.21mA)(1k) 9.21V 1.9 Diode Models ( Typical Diodes) Diodes come in a variety of sizes and shapes. The design and structure is determined by what type of circuit they will be used in. 1.10 Testing A Diodes ( By Digital multimeter) Testing a diode is quite simple, particularly if the multimeter used has a diode check function. With the diode check function a specific known voltage is applied from the meter across the diode. With the diode check function a good diode will show approximately .7 V or .3 V when forward biased. When checking in reverse bias the full applied testing voltage will be seen on the display. K A A K 1.10 Testing A Diodes ( By Digital multimeter) NG DIODE 1.10 Testing A Diodes ( By Analog multimeter – ohm function ) Select OHMs range Good diode: Forward-bias: get low resistance reading (10 to 100 ohm) Reverse-bias: get high reading (0 or infinity) Summary Diodes, transistors, and integrated circuits are all made of semiconductor material. P-materials are doped with trivalent impurities N-materials are doped with pentavalent impurities P and N type materials are joined together to form a PN junction. A diode is nothing more than a PN junction. At the junction a depletion region is formed. This creates barrier which requires approximately .3 V for a Germanium and .7 V for Silicon for conduction to take place. Summary A diode conducts when forward biased and does not conduct when reverse biased When reversed biased a diode can only withstand so much applied voltage. The voltage at which avalanche current occurs is called reverse breakdown voltage. There are three ways of analyzing a diode. These are ideal, practical, and complex. Typically we use a practical diode model. Assignment 1. Describe the difference between: a) n-type and p-type semiconductor materials b) donor and acceptor impurities c) majority and minority carries 2. Predict the voltmeter reading in Figure 2.1. (assumed voltage across the diode is 0.7V, R1= 10kohm, V1 = 5V). Then, calculate current, I. XMM1 voltmeter R1 V1 10kohm 5V I Figure 2.1 D1 1N4148