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MEMS Strain Sensors and Strain Engineered CMOS
Professor Toshikazu (Toshi) Nishida
Interdisciplinary Microsystems Group
Department of Electrical and Computer Engineering
University of Florida
11:00 AM June 25, 2007
Hewlett 102
Abstract:
Strain in semiconductors will be discussed in the context of
variable stress strain sensors and fixed stress strain-engineered
advanced CMOS. Common physics in these different applications will be
outlined. The design and characterization of a MEMS piezoresistive
microphone and measurement of the piezoresistance coefficients at high
stresses will be described.
Toshikazu (Toshi) Nishida is associate professor in the Department of Electrical and
Computer Engineering (ECE) and an Affiliate Associate Professor in the Department of
Mechanical and Aerospace Engineering (MAE) at the University of Florida. His research
interests include solid-state physical sensors and actuators, transducer noise, strained
semiconductor devices, and reliability physics of semiconductor devices. He and his
students are currently investigating strain effects in piezoresistive microelectromechanical
systems (MEMS) transducers and advanced CMOS devices, noise mechanisms in
piezoresistive MEMS transducers, MEMS piezoelectric transducers for vibrational energy
reclamation, MEMS capacitive microphones, and biomedical applications of MEMS. He
received his Ph.D. (1988) and M.S. degrees in Electrical and Computer engineering and
B.S. degree in Engineering physics at the University of Illinois at Urbana-Champaign. With
colleagues and students, he has received three best paper awards. He also received the 2003
College of Engineering Teacher of the Year award. He holds three U.S. patents. He is a
member of IEEE, Materials Research Society, American Physical Society, and the
American Society for Engineering Education
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