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Chlorine Trifluoride (ClF3) Detection and Monitoring Using MDA Scientific Instruments T/N 1998-0190 Rev. 3 10-06 Introduction Chlorine trifluoride (ClF3) is a very toxic, corrosive compound which is increasingly being used in semiconductor applications such as chemical vapor deposition (CVD) and diffusion furnace cleaning. The ability to utilize ClF3 in these processes is attractive in that it minimizes downtime, which can be excessive for other cleaning methods. This technical note provides toxicity and reactivity information, and discusses the MDA Scientific instruments, calibrations, and Chemcassette® tapes which can be used to monitor ClF3. Toxicity Toxicity Levels: Chlorine trifluoride is considered to be highly toxic. It has a Threshold Limit Value (TLV) of 100 ppb (0.1 ppm). NIOSH has set the Immediately Dangerous to Life and Health (IDLH) concentration at 20 ppm. Pulmonary Effects: Chlorine trifluoride is extremely irritating and corrosive to both the upper and lower airway. The corrosive action of ClF3 may cause both an inflammation of the lungs and chemical pneumonitis. Skin Contact: Chlorine trifluoride is highly corrosive to the skin and mucous membranes, resulting in extremely painful burns. Reactivity ClF3 is one of the most reactive compounds in the class known as halogen fluorides. With the exception of elemental fluorine, ClF3 may, in fact, be one of the most reactive chemicals known. ClF3 is extremely reactive to moisture, even at ambient levels normally found in the workplace, and produces mostly hydrogen fluoride (HF) and chlorine dioxide (ClO2) along with hydrogen chloride (HCl), chlorine (Cl2), chlorine fluoride (ClF), and various oxyhalogen compounds (HClO2, OCl2, OF2, ClOF, ClO2F, ClO3F) when released in air. The presence and concentration of all by-products are dependent on the reaction conditions and the amount of water vapor present in the air. Detecting and Monitoring ClF3 In anticipation of increased usage of ClF3 in semiconductor manufacturing, Honeywell Analytics provides the detection and monitoring solutions using MDA Scientific Chemcassette-based instruments and Electrochemical cell detection technology. As ClO2 and HF are the expected main compounds produced from ClF3 hydrolysis in air, it is generally recommended that the workplace be monitored for HF and or ClO2 along with ClF3. The use of the ClO2 calibration has been recommended because the similar toxicity of ClO2, a Category 1 Highly Toxic gas. The low level HF calibration curves with XP Mineral Acid Chemcassette, that are now available, are also recommended because the expected concentration of HF as a byproduct of a 1 TLV release of ClF3 is at ppb levels, as any hydrolysis of ClF3 will produce at least an equal amount of HF. The following gas calibrations on Chemcassette-based instruments (CM4, Vertex and SPM) and Electrochemical Cell detector (MIDAS) designed specifically for ClF3 applications are available. Detect as ClO2 Detect as low level HF Detector Model CM4 Vertex SPM MIDAS CM4 Vertex SPM MIDAS Calibration P/N 1971-0141 1971-0199 MIDAS-S-BR2 1971-0214 1971-0241 MIDAS-S-HFL Detection LDL range 0 - 1000 ppb 32 ppb 0 - 1000 ppb 32 ppb 0 - 300 ppb 31 ppb 0 - 0.4 ppm 0.04 ppm 0 - 2000 ppb 20 ppb 0 - 2000 ppb 20 ppb 0 - 2000 ppb 50 ppb 0 - 2 ppm 0.22 ppm Chemcassette P/N 1874-9306 1295-0220 1740-9306 1874-9310 1295-0507 1740-9310 Information Sources: Air Products and Chemicals, Inc. Chlorine Trifluoride Technical Data, Safety and Handling, Technical Information Center, Carmen Gugliemini C. Gugliemini and A. Johnson, “Properties and Reactivates of Chlorine Trifluoride” , Semiconductor International June 1999, BOC Gases, Material Data Safety Sheet (MSDS) G-240, revised 4/10/96 Emergency Response Planning Guideline, AIHA 1995