Download CC 1998-0190 R2 ClF3 detection

Chlorine Trifluoride (ClF3)
Detection and Monitoring Using MDA Scientific Instruments
T/N 1998-0190
Rev. 3 10-06
Introduction
Chlorine trifluoride (ClF3) is a very toxic, corrosive compound which is increasingly being
used in semiconductor applications such as chemical vapor deposition (CVD) and diffusion
furnace cleaning. The ability to utilize ClF3 in these processes is attractive in that it
minimizes downtime, which can be excessive for other cleaning methods. This technical
note provides toxicity and reactivity information, and discusses the MDA Scientific
instruments, calibrations, and Chemcassette® tapes which can be used to monitor ClF3.
Toxicity
Toxicity Levels:
Chlorine trifluoride is considered to be highly toxic. It has a Threshold Limit Value (TLV) of
100 ppb (0.1 ppm). NIOSH has set the Immediately Dangerous to Life and Health (IDLH)
concentration at 20 ppm.
Pulmonary Effects:
Chlorine trifluoride is extremely irritating and corrosive to both the upper and lower airway.
The corrosive action of ClF3 may cause both an inflammation of the lungs and chemical
pneumonitis.
Skin Contact:
Chlorine trifluoride is highly corrosive to the skin and mucous membranes, resulting in
extremely painful burns.
Reactivity
ClF3 is one of the most reactive compounds in the class known as halogen fluorides. With
the exception of elemental fluorine, ClF3 may, in fact, be one of the most reactive
chemicals known.
ClF3 is extremely reactive to moisture, even at ambient levels normally found in the
workplace, and produces mostly hydrogen fluoride (HF) and chlorine dioxide (ClO2) along
with hydrogen chloride (HCl), chlorine (Cl2), chlorine fluoride (ClF), and various
oxyhalogen compounds (HClO2, OCl2, OF2, ClOF, ClO2F, ClO3F) when released in air.
The presence and concentration of all by-products are dependent on the reaction
conditions and the amount of water vapor present in the air.
Detecting and Monitoring ClF3
In anticipation of increased usage of ClF3 in semiconductor manufacturing, Honeywell
Analytics provides the detection and monitoring solutions using MDA Scientific
Chemcassette-based instruments and Electrochemical cell detection technology.
As ClO2 and HF are the expected main compounds produced from ClF3 hydrolysis in air,
it is generally recommended that the workplace be monitored for HF and or ClO2 along
with ClF3.
The use of the ClO2 calibration has been recommended because the similar toxicity of ClO2,
a Category 1 Highly Toxic gas.
The low level HF calibration curves with XP Mineral Acid Chemcassette, that are now
available, are also recommended because the expected concentration of HF as a byproduct of a 1 TLV release of ClF3 is at ppb levels, as any hydrolysis of ClF3 will produce
at least an equal amount of HF.
The following gas calibrations on Chemcassette-based instruments (CM4, Vertex and
SPM) and Electrochemical Cell detector (MIDAS) designed specifically for ClF3
applications are available.
Detect as
ClO2
Detect as
low level
HF
Detector
Model
CM4
Vertex
SPM
MIDAS
CM4
Vertex
SPM
MIDAS
Calibration
P/N
1971-0141
1971-0199
MIDAS-S-BR2
1971-0214
1971-0241
MIDAS-S-HFL
Detection
LDL
range
0 - 1000 ppb
32 ppb
0 - 1000 ppb
32 ppb
0 - 300 ppb
31 ppb
0 - 0.4 ppm 0.04 ppm
0 - 2000 ppb
20 ppb
0 - 2000 ppb
20 ppb
0 - 2000 ppb
50 ppb
0 - 2 ppm 0.22 ppm
Chemcassette
P/N
1874-9306
1295-0220
1740-9306
1874-9310
1295-0507
1740-9310
Information Sources:
Air Products and Chemicals, Inc. Chlorine Trifluoride Technical Data, Safety and
Handling, Technical Information Center, Carmen Gugliemini
C. Gugliemini and A. Johnson, “Properties and Reactivates of Chlorine Trifluoride” , Semiconductor
International June 1999,
BOC Gases, Material Data Safety Sheet (MSDS) G-240, revised 4/10/96
Emergency Response Planning Guideline, AIHA 1995