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2011170051 금가연 화공생명공학과 Article Review Nanosphere lithography: Fabrication of Large Area Ag Nanoparticle Arrays by Convective Self-Assembly and Their Characterization by Scanning UV-Visible Extinction Spectroscopy Overall Summary: This article, published in Langmuir in 2004, is focused on how to produce large area (about 1cm3) silver nanoparticle array and their characterization using Scanning UV-Visible Extinction Spectroscopy. Article first introduces various methods of sample preparation to utilize nanoparticle arrays, but authors focus on Nanosphere Lithography (NSL). Though NSL is only applicable to few substrate materials, it shows good control over particles’ size, shape, and especially inter-particle spacing. Nanoparticle shape is controlled by precision of template, the angle of deposition, or by post deposition steps like thermal annealing. To build metal nanoparticle array using NSL method, hexagonally close-packed nanosphere arrays should be formed first. This is the most critical step to produce highly ordered and uniform metal nanoparticle array. The colloidal crystal template is formed from suspension of nanospheres drop-coated onto the substrate where they self-assemble into a hexagonally close-packed array. Then the colloidal crystal templates are then mounted into the chamber where vapor deposition of Ag or Au happens. This article applied convective self-assembly (CSA) method to further improve the process. Authors implement Scanning UV-Vis extinction spectroscopy to better understand the nanoparticle arrays produced. Traditional ways such as AFM has limitations, but using Scanning UVVis extinction spectroscopy and observing the sensitivity of Localized Surface Plasmon Resonance (LSPR) can be an excellent way to assess quality and morphology of nanosphere packing. This spectroscopy allows for analysis or large areas of sample in a reasonable time with reliable measurements. Experiment 1. Materials: Ag, Glass substrate, pre –treatment of glass substrate (H2SO4, H2O2, NH4OH), surfactant free, white carboxyl-substituted polystyrene latex nanospheres suspended in water, absolute ethanol. 2. Nanosphere Mask formation by CSA: The glass substrate was placed on a translational stage, and 10mL drop of nanosphere solution was placed onto the edge of the substrate. Using a 1mm-thick-Teflon sheet attached to a rectangular glass coverslip placed at a distance h, above the substrate surface. The position of the spreader created two zones, the dry zone in the front and the wet zone in the back. Monolayer formation occurs in dry zone whereas in wet zone consists of bulk droplet solution. Humidity and temperature not controlled. 3. Preparing Periodic Particle Arrays (PPAs) After formation of nanosphere template, the samples were mounted in Vapor deposition system, and the vapor deposited at a rate of 0.1nm s-1. After deposition, nanosphere mask was removed via sonication of the sample in absolute ethanol for 2 min. 4. AFM/SEM Images were taken from AFM and SEM. Authors used etched Si nanoprobe tips in AFM which had resonance frequencies between 280 and 320 kHz. 5. Scanning UV-Vis Macro-Extinction Spectroscopy UV-Vis extinction spectra were taken using white light transmitted through 200nm core multimode optical fiber. The light was focused on a sample with a spot size of 0.5mm in diameter. The light emitted through the sample was collected with a collimating lens attached to 200mm core multimode fiber connected to CCD detector. Result and Discussion: The formation of a monolayer array is controlled by three factors: capillary force, convective transfer, and water evaporation. When solution drops to the substrate, a pressure differential is created which causes a capillary effect that transfers solution to the dry zone, forming a thin film. Then evaporation plays key factor; as water evaporates, spheres form hexagonally close-packed layer. To evenly distribute particles, the stage should be moved in the opposite direction to the monolayer formation at a constant velocity. Also, withdrawal rate should be same with evaporation rate. If not, it can cause multiple empty zones when withdrawal rate is faster and nanoparticle accumulation when withdrawal rate is slower than evaporation rate. The distance between spreader and substrate is also important; this can be aided with Teflon membrane equalizing the capillary forces across the sample. Because Teflon membrane is highly flexible, it does not apply enough downward force onto dry zone to disrupt the layer formation. Authors points out several limitations of traditional imaging methods such as AFM: restricted access to sample sites, unacceptable time required to resolve image of large area of sample, and difficulty in distinguishing between monolayers, bilayers, and multiple layers. Authors implemented Scanning UV-Vis extinction spectroscopy, which can observe the sensitivity of LSPR of the nanosphere packing. Well ordered templates produce highly uniform PPAs with characteristic spectra. Defects in mask result in defects in the metal nanoparticle array, which cause perturbations in LSPR spectrum. A broad spectrum happens when large defects exist, but the type and the exact number of defects cannot be obtained. However, the overall quantity of each spot can be addressed on the basis of spectral shape, which can provide relative amounts of defects overall. After reading the first article above, I looked up another article to better understand nanosphere lithography. I’ll briefly summarize what I’ve focused on while reading. Nanosphere Lithography: A Versatile Nanofabrication Tool for Studies of SizeDependent Nanoparticle Optics Brief Summary: This article was published in The Journal of Physical Chemistry B in 2001. Author tells us that the signature optical property of a metallic nanoparticle is LSPR. This resonance occurs when the correct wavelength of light strikes a metallic nanoparticle, causing plasma of conducting electrons to oscillate. This collective oscillation is localized near surface region, hence called localized surface Plasmon resonance (LSPR). Excitation of LSPR can bring about selective photon absorption and generation of locally enhanced or amplified electromagnetic field. Author explains that unlike conventional ways to produce nanoparticles such as photolithography and electron beam lithography, Nanosphere lithography (NSL) can be a good alternative with low production cost and high throughput. Every NSL structure starts with self-assembly of size-monodisperse nanoshperes to form 2-D colloidal crystal deposition mask. Ways to deposit nanospheres include spin coating, drop coating, and thermoelectrically cooled angle coating. Nanospheres should be able to freely disperse across the substrate, and this can be achieved by chemically modifying the surface of the nanosphere with negatively charged functional groups. As solvent evaporates, capillary forces draw nanospheres together, and they form a hexagonally closedpacked pattern. Then a metal or other material is deposited by thermal evaporation, electron beam deposition, or pulsed laser deposition. With NSL, double layers or 3-D structures of metal nanoparticle arrays can be built, not only single layer. More complex nanoparticle assemblies can be built by covalently attaching chemically synthesized Ag or Au colloids to SL PPA template with bifuctional self-assembled monolayer linkers. Various shapes can be achieved altering Θdep, which is the angle between the nanosphere mask and the beam of material being deposited. The relationship between nanoparticle size and LSPR extinction maximum, λmax, has been recognized, and since NSL can acquire any wanted size of nanoparticle by changing nanosphere size, It is easy to observe that relationship/ Reference: Hicks, E.C.M. ( 1 ), et al. "Nanosphere Lithography: Fabrication Of Large-Area Ag Nanoparticle Arrays By Convective Self-Assembly And Their Characterization By Scanning UV - Visible Extinction Spectroscopy." Langmuir 20.16 (2004): 6927-6931. Scopus®. Web. 17 Nov. 2014. Haynes, C.L., and R.P. Van Duyne. "Nanosphere Lithography: A Versatile Nanofabrication Tool For Studies Of SizeDependent Nanoparticle Optics." Journal Of Physical Chemistry B 105.24 (2001): 5599-5611. Scopus®. Web. 17 Nov. 2014.