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Atmospheric-pressure piezo-driven microplasma source for bio-medical applications P. Rajasekaran, N. Bibinov and P. Awakowicz Institute for Electrical Engineering and Plasma Technology, Ruhr-Universitaet Bochum, Germany Abstract: The microplasma source using a piezo-electric transformer is investigated for bio-medical applications. It comprises of a rod-shaped piezo transformer with a rectangular cross-section. The piezo element is housed in the front end of a metal tube; the power and gas supply enter the tube through its rear end. A quartz tube is coaxially fitted to the metal tube for experimental purpose and to protect the active plasma from perturbation by ambient air. Helium is generally used as the working gas. Nitrogen is used as admixture for diagnostics. Plasma conditions are characterized by determining gas temperature and plasma parameters namely electron density and electron distribution function. Gas temperature in the plasma volume is determined using optical emission spectroscopy and numerical simulation. The excitation emission of N 2(C-B, 0-0) at 337 nm is fitted with rotational distributions simulated for different gas temperatures. Electron velocity distribution function (EVDF in eV -3/2) is determined by comparing the ratio of excitation emission of N2(C-B, 0-0) to that of N2+ (B-X, 0-0) with the measured emission intensities. Electron density (ne in m-3) in the active plasma volume is determined from the excitation emission of N2(C-B, 0-0) taking into account quenching and rate constant for this excitation emission. Keywords: piezo, optical diagnostics, biomedical, emission spectroscopy, electron density 1. Introduction Non-thermal plasma devices for biomedical applications have been developed by a number of research groups. These devices are based on different operating principles including the dielectric barrier discharge (DBD)[1] and are operated from low frequencies (in the order of kHz) to microwave frequencies[2]. Recently, plasma sources comprising of a piezo transformer have been introduced and characterized profoundly[3,4] in order to identify potential low-temperature applications, especially in the biomedical field. In this report, a piezo-driven microplasma source is introduced and the microplasma produced in a mixture of helium-nitrogen is characterized in order to identify potential applications. The working and characteristics of piezo-driven plasma sources have been profoundly discussed in the literature[3,4]. Hence, in this report more focus is laid on the characterization of the microplasma produced a piezo device in order to determine the plasma conditions. The microplasma is characterized by the determination of gas temperature in the active plasma volume and plasma parameters such as electron density and electron distribution function. Experimental methods namely optical emission spectroscopy, current-voltage measurements and microphotography are used. Numerical simulation complements experimental methods and most parameters are determined comparing the experimental measurements and simulated values. 2. Piezo driven microplasma source The piezo-driven microplasma source comprises of a piezo element with a rectangular cross-section (6 x 2 mm). It is 7.5 cm long and is held in position by two halves of a copper ring which are fastened to each other using polymer screws. The rear side of each half of the copper ring is provided with a point contact that arises from a control-circuit which converts low frequency of the applied voltage to a high frequency which is the resonant frequency of the piezo element. The resonant frequency is measured to be 140 kHz. The piezo arrangement is confined in a metal tube through which the working gas flows. In the experiments reported here, helium-nitrogen (95%5%) mixture is used as the working gas. Nitrogen is used in small concentration for diagnostic purpose. To protect the helium-nitrogen plasma from perturbations caused by ambient air, a quartz tube is coaxially fitted to the metal tube. The quartz tube also facilitates optical diagnostics of the plasma. The microplasma produced in the working gas mixture is shown in figure 1. center of one of the edges where plasma with low emission is observed (as shown in figure 2). Figure 2: (Side-on view of the piezo element). Spots on the piezo element chosen for optical emission spectroscopy. 3. Experimental arrangement The microplasma is characterized to determine the plasma conditions which includes determination of plasma parameters namely the electron density and electron distribution function. For plasma characterization, experimental methods such as optical emission spectroscopy, current voltage measurements and microphotography are used. In addition, numerical simulation is used to determine the plasma conditions. Optical diagnostics is performed using a relatively and absolutely-calibrated Echelle spectrometer [5] which is provided with an optic fiber fitted with a diaphragm to enhance spatial resolution. The volume of active plasma in the corner of the piezo element is determined from the image captured using microphotography. A high speed sensitive camera with a minimum exposure time of 500 ns is used for microphotography. Figure 3 shows the inverse microphotograph of the piezodriven microplasma taken with an exposure time of 50 ms. Figure 1: Piezo-driven microplasma Plasma is ignited on the four corners of the piezo element where the electric field is high. In addition, plasma with low emission is also observed on the edges of the face of the piezo element. In this preliminary investigation of the piezo-driven microplasma, optical diagnostics are performed on one of the corners of the piezo element and at the Figure 3: Side-on inverse microphotograph of piezo-driven microplasma. Exposure time = 50 ms. 4. Plasma characterization The averaged plasma parameters are determined using optical emission spectroscopy and numerical simulation. First, the averaged gas temperature (Tg) in the active plasma channel is determined using emission of second positive system of neutral nitrogen molecules N2(C-B, 0-0) at 337.1 nm with the assumption that the rotational temperature of diatomic molecules (Trot) is equal to the gas temperature at atmospheric pressure condition. Emission spectra for various rotational temperatures are simulated with the same spectral resolution (∆λ = 25 pm) as in the experiment. The measured spectrum is compared with simulated spectra and averaged Tg with confidence interval is determined by fitting procedure. The density of nitrogen molecule and helium atoms at Tg is calculated using the ideal gas law p = [M]kBTg where p is pressure (in Pa), [M] is density of nitrogen molecules or helium atoms (in m-3) and kB is the Boltzmann constant. For determination of plasma parameters, photoemission of neutral (N2(CB)) and ionized (N2+(B-X)) nitrogen molecules are used, under the assumption of direct electron-impact excitation from ground state of nitrogen molecule N2(X). The intensities of nitrogen molecules IN2 and IN2+ (in photons s-1), as shown in (1), are obtained by integrating the measured spectrum corresponding wavelength range (1 -2). I N ( B X , 0 0 ) 2 I N 2 ( C B, 00 ) in the 2 QN 2 (C) k depends on the electron velocity distribution function (EVDF – f(E) in eV-3/2) and the corresponding collisional cross-section σ (in m2) as shown in (2): k 4 2 f (E) 0 2e E ( E )dE me (2) where, me is the mass of electron (in kg), e is the elementary charge of electron (in C), and E is the kinetic energy of electrons (in eV). f(E) is normalized to fulfill equation (3): 4 2 f (E) E dE 1 (3) 0 f(E) is determined by comparing the measured emission of nitrogen molecules and ions individually with their calculated emissions. To calculate emissions, Boltzmann‟s equation is solved numerically in “local” approximation for a mixture of 95% helium / 5% nitrogen at atmospheric pressure condition, using the program code “EEDF” [7]. In the fitting procedure, f(E) and the corresponding reduced electric field (E/N in Td) are determined. The rate constants for electron-impact dissociation are determined using (2). Electron density, ne (in m-3) in the active plasma volume is determined using the expression (4). N2 He met Q N ( B) ([ N 2 ] k exc b1 [He] k exc ) 2 N2 (C) Q N2 ( C) [ N 2 ] k exc (1) ne where, Q N ( B) m3 s-1) is quenching rate constant of the corresponding excited states during collision with gas species „M‟. A Ak N 2 ( B ) q1 [ N 2 ] k qN22 ( B) [He] A Ak N2 (C) q3 [ N 2 ] k qN42 ( C ) [He ] -1 and , b1 is the branching factor, A (in s ) is the Einstein coefficient [6], k (in m3 s-1) is the rate constant for ionization or excitation of the respective species, [M] (in m-3) is the density of the gas species, kq (in IN G QN 2 N (C ) [ N 2 ] kexc Vp 2 2 (C ) (4) where G is the geometric factor, Vp (in m3) is the volume of the active plasma. 5. Results Using optical emission spectroscopy and numerical simulation, gas temperature in the active plasma volume is determined as 300 + 20 K (c.f. figure 4) at the corners of the piezo element as well as in the center of the edge. Intensity (a.u.) measured spectrum simulated spectrum at 300 K Acknowledgement 336 (nm) Financial support by the German Research Foundation (DFG) within the frame of the project „FOR1123-Physics of Microplasmas‟ is gratefully acknowledged. 337 Figure 4: Fitting of measured emission spectrum with simulated spectrum to determine gas temperature in the active plasma volume. The spectra are shifted for clarity. E/N in the corner of the piezo element is about 50 Td and ne is 9·1015m-3 while E/N in the center of the element is about 40 Td and ne is 3.1·1014 m-3. The rate constants for electron-impact excitation of neutral nitrogen molecule and nitrogen ion, respectively, are 0.22·10-15 m3 s-1 and 0.02·10-15 m3 s-1 at the corners, and 0.16 ·10-15 m3 s-1 and 0.01 ·10-15 m3 s-1in the center of the piezo element. 40 Td 50 Td 1 0.1 -3/2 ) 0.01 EVDF (eV Electron density is in the order of 1014-1015 m-3 in the active plasma volume. Gas temperature is determined as 300 + 20 K from the experimentallymeasured excitation emission of nitrogen molecule fitted using numerically-simulated spectra. References [1] P. Rajasekaran, C. Oplander, D. Hoffmeister, N. Bibinov, C. V. Suschek and P. Awakowicz, Plasma Processes and Polymers 8, 246 (2011) [2] S. Kühn, N. Bibinov, R. Gesche and P. Awakowicz, Plasma Sources Science and Technology 19, 015013 (2010) [3] H. Kim, A. Brockhaus and J. Engemann, Applied Physics Letters 95, 211501 (2009) [4] M. Teschke and J. Engemann, Contrib. Plasma Phys. 49, 614 (2009) 1E-3 [5] N. Bibinov, H. Halfmann, P. Awakowicz, K. Wiesemann, Meas. Sci. Technol. 18, 1327 (2007) 1E-4 1E-5 1E-6 [6] S. V. Pancheshnyi, S. M. Starikovskaia and A. Y. Starikovskii Chem. Phys. 262, 349 (2000) 1E-7 1E-8 1E-9 1E-10 0 10 20 30 40 50 Energy (eV) 6. Summary The plasma conditions in a piezo-driven microplasma source in helium-nitrogen mixture are investigated by plasma characterization where plasma parameters such as electron density and electron velocity distribution function are determined. Experimental methods and numerical simulation are used for plasma characterization. Plasma is ignited at the corners of the electrode where the electric field is high, and low-intensity emission is also observed along the sides connecting the four corners of the rectangular piezo element. [7] Code EEDF, available from A P Napartovich, Triniti Institute for Innovation and Fusion Research, Troizk, Moscow Region, Russia