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CARRIER TRANSPORT PROPERTIES OF ALUMINUM OXIDE/POLYPYRROLE FILMS DOPED WITH NAPHTHALENE-1,5-DISULFONIC ACID M. Campos Universidade Paulista (UNIP), Grupo de Pesquisa “Ciência dos Materiais” 14025-270 Ribeirão Preto-SP [email protected] Filmes de Al/Al2O3/PPy-NSA/Au foram investigados com a utilização de medidas de corrente elétrica em função da voltagem externa aplicada (I-V) e, de capacitância em função da voltagem (C-V), em temperaturas que variaram no intervalo de 90-350 K. As medidas de (C-V) foram realizadas em freqüências de 1kHz a 20 MHz. Para analise das características elétricas dos filmes, foram considerados efeitos de resistência elétrica em série, camada interfacial e estados interfaciais. Foi observado que (I-V) segue um modelo de emissão termiônica dos portadores sobre uma barreira de potencial, supondo uma distribuição gaussiana para a altura da barreira. As medidas de (C-V) exibiram um pico, cujo máximo é deslocado para baixas voltagens e, apresenta também uma diminuição de intensidade, com o aumento da freqüência de medida. Palavras-chave: corrente, capacitância, barreira de Schottky, polímero condutor. Carrier transport properties of aluminum oxide/polypyrrole films doped with naphthalene-1,5-disulfonic acid The electrical structure of the Al/Al2O3/PPy-NSA/Au has been investigated by means of current-voltage (I-V) and capacitance-voltage (C-V) measurements, in a temperature range of 90-350 K. The forward C-V measurements have been carried out in the range of frequency of 1 kHz to 20 MHz. The effects of series resistance, interfacial layer and interface states on I-V and C-V characteristics are investigated. At high current densities in the forward direction, the series resistance effect has been observed for voltages greater than 0.7 V. The analysis of I-V characteristics based on the thermionic emission mechanism has been explained by the assumption of a Gaussian distribution of barrier heights, due to barrier height inhomogeneities that prevail at the interface. It has been observed that the forward C-V plot exhibits a peak, whose position shifts towards lower voltages and that decreases with increasing frequency. The nonlinearity of 1/C2 versus V plot at high frequency was explained with the assumption that only some of the interface states follow the applied ac signal. Keywords: conducting polymer, capacitance, Schottky barrier, current. 1. Introduction The presence of a thin insulator layer between metal and semiconductor in the MIS structure gives these devices the properties of a capacitor, which stores the electric charge due to the presence of oxide layers. In a MIS structure, if the thickness δ of the interfacial insulator layer is larger than 50 Ǻ, the interface states are in equilibrium with the semiconductor. If the insulator layer thickness is less than 50 Ǻ, direct tunneling becomes possible in MIS structure [1]. In the case that δ is smaller than 10 Ǻ, the interface states are in equilibrium with the metal [2]. Hence, current transport may be dominated by tunneling and non-rectifying devices are expected [3]. The characterization of interface states and series resistance in MIS structure has become a subject of very intensive research for more than four decades [4]. A number of workers have suggested several ways of characterization of these behavior [5]. It is well known that interface states cannot follow ac signal at higher frequencies [6]. Thus, low frequency capacitance of Schottky contacts is applied to interpret interface states [7]. Also, those interface states can affect the C-V characteristics of MIS structures causing a bending of the C-2 versus V as well increasing the ideality factor. An anomalous peak in forward C–V characteristics, attributed to interface states and series resistance, has been reported earlier [4]. The objective of this study is to obtain some properties of Al/Al2O3/PPy-NSA/Au structure and investigate the effects of the interface states and series resistance by measuring current-voltage (IV) characteristics in a temperature range of 90-350 K. Measurements also have been made for C-V characteristics under forward and reverse bias at frequencies changing from 1 kHz to 20 MHz. Temperature dependences of the ideality factors and barrier height have been analyzed in the light of the inhomogeneity model. 2. Experimental The samples were chemically obtained. For that, pyrrole monomer (Sigma-Aldrich) was purified by distillation under reduced pressure prior to use. Ammonium persulfate (APS) (Sigma-Aldrich) was used as oxidant. The dopant used was naphthalene-1,5-disulfonic acid (NSA) (Sigma-Aldrich), used without further purification. The doped PPy was chemically synthesized by in situ doped oxidative coupling polymerization. The solution of 0.68 g (3.0 mmol) ammonium persulfate in 10.0 mL deionized water was slowly added to the mixture of 1.2 mmol of dopant and 1.0 mL (14.5 mmol) pyrrole in 20.0 mL deionized water. The reaction was maintained at 0°C for 2 hours. The polypyrrole was precipitated by pouring the reaction mixture into a large excess amount of deionized water. The PPy powder was washed several times with deionized water and methanol before drying in a vacuum at room temperature. Films were prepared dissolving PPy powder into m-cresol. The thickness of the prepared films was typically 10-25 µm, and the total active area of about 0.85 cm2. Aluminum oxide (Al2O3), with estimated thickness to be about 23 Ǻ obtained from high frequency measurement of the oxide capacitance in the strong accumulation region at high frequency (1 MHz), was deposited on one surface of PPy by atomic layer chemical vapor deposition [8]. Gold circular electrode of about 0.20 cm2 were deposited on one side, with vacuum of 10-5 Torr, while Al circular electrodes of the same area were vacuum deposited on the aluminum oxide surface using suitable mask, in order to allow the I-V measurements. Therefore, we have in one side of the sample a rectifying contact (Al) and an ohmic contact in the other side (Au), similar to conventional inorganic semiconductor Schottky barrier diodes. Current-voltage measurements were made with the use of a Keithley 6517A electrometer, and a Keithley 230 programmable voltage source. The capacitance-voltage characteristic (C-V) was measured using a Solartron 1260 impedance/gain-phase analyzer coupled with a Solartron 1296 Anais do 10o Congresso Brasileiro de Polímeros – Foz do Iguaçu, PR – Outubro/2009 dielectric interface in the frequency range from 1 kHz to 20 MHz. All measurements were carried out with the help of a microcomputer trough an IEEE-488 ac/dc card in dark. Measurements were made between 90-350 K using a homemade temperature controlled cryostat. 3. Results and Discussion 3.1 Current-voltage characteristics The (I-V) characteristics of the Al/Al2O3/PPy-NSA/Au structure, is shown in Fig. 1, for temperature of 330 K. As we can see from Fig. 1 the electrical current in forward bias is quickly dominated by series resistance given rise to the curvature observed at high electrical current. In general, the forward bias I-V characteristics is linear on a semi-logarithmic scale at low forward bias voltage, but deviates considerably from linearity due to the effect of the series resistance (RS), the interfacial layer, and interface states when the applied voltage is sufficiently large. The parameter resistance is only effective in the downward curvature region of the I-V characteristics, but the other two parameters play significant role in both the linear and non-linear regions of these measurements. It was observed a weak voltage dependence of the reverse bias current and the exponential increase of the forward bias current. This behavior is a characteristic property of rectifying interfaces. Since we know that we have an interfacial oxide layer (Al2O3) between Al and the conducting polymer, we are in the MIS condition. The transport of charge over the potential barrier, from semiconductor into the metal, is generally described by the thermionic emission theory without diffusion and tunneling, and it can be expressed for the forward bias case as [9] I = I0 exp [qV/(nkT)] (1) where q is the electronic charge, T the temperature, V the applied voltage, and k the Boltzmann’s constant. I0 is the saturation current, and can be expressed as I0 = A A* T2 exp [− qφB/(kT)] (2) where φB is the effective barrier height at zero bias, A* and A are, respectively, the effective Richardson constant and effective diode area. The forward bias current-voltage characteristics due to thermionic emission of a Schottky diode with the series resistance (RS) and V > 3kT/q can be expressed as [10] I = I0 exp [q(V − VS)/(nkT)] (3) The term VS = IRS represents the voltage drop across series resistance of diode, and n is the ideality factor (n=1 in the ideal case). Anais do 10o Congresso Brasileiro de Polímeros – Foz do Iguaçu, PR – Outubro/2009 Fig. 2 shows the experimental series resistance values, as obtained from I-V characteristics as a function of temperature. The effective barrier height (φB) can be obtained from Richardson plot of the saturation current. Eq. (2) can be rewritten as ln (I0/T2) = ln (A A*) − qφB/(kT) (4) The ideality factor n is determined from the slope of the straight-line region of the semi log forward-bias I-V characteristics through the relation n = (q/kT) dV/d[ln (I)] (5) 300 10-3 250 Series Resistance (Ω) Current (A) 10-4 10-5 10-6 10-7 200 150 100 10-8 -1,5 -1,0 -0,5 0,0 0,5 1,0 1,5 2,0 50 100 V (Volt) Figure 1-Plot of (I-V) characteristics for temperature of 330 K. 150 200 250 300 Temperature (K) Figure 2-Electrical series resistance as a function of temperature According to Eq. (4), if the barrier height φB is independent of temperature, we should obtain a linear dependence on the ln (I0/T2) versus T−1 curve. However, the corresponding results presents a non-zero curvature, thus indicating that φB is temperature dependent. Because was observed a increase of zero-bias barrier height and decrease of the ideality factor with increase in temperature, to explain the experimental data one has to look for other possibility, for example that we have barrier inhomogeneities [11]. As far as the barrier height distribution is concerned, different functions, including Gaussian distribution, have been proposed [12,13]. Let us assume that we have Gaussian distribution of the barriers heights with a mean value φm and a standard deviation σ [12], in the form P(φ) = (1/σ) (2π)−1/2 exp [− (φ −φm)2/(2 σ2)] (6) The total current under the forward bias V is given by I(V)= ∫ ∞ −∞ {I0 exp[qV/(nkT)] (1/σ)(2π)−1/2 exp[−(φ−φm)2/(2σ2)]} dφ (7) After the integration we have: I(V)=A A* T2 {1−exp [−(qV/(kT)]} exp [(qV)/(nakT)] exp {−(q/(kT)][φm −σ2/(2kT)]} and Anais do 10o Congresso Brasileiro de Polímeros – Foz do Iguaçu, PR – Outubro/2009 (8) I0 = A A* T2 exp [− qφa/(kT)] (9) where φa and na are, respectively, the apparent barrier height and apparent ideality factor, and given by φa = φm0 − qσ02/(2kT) (10) [(1/na) − 1] = −ξ+ qψ/(2kT) (11) where φm0 stands for the mean barrier height at zero bias, and σ0 is the standard deviation, also at zero bias. Here ξ and ψ are the corresponding voltage coefficients which may depend on T and quantify the voltage deformation [14]. Assuming linear dependence for the Gaussian parameters we have: φ = φm0 + ξV (12) σ = σ0 +ψV (13) As was considered in Eq. (13), the temperature dependence of σ is very small and can be neglected [15]. Thus, fitting Eq. (8) to the experimental results for I-V, one gets φa and na which are temperature dependent as was seen in Eqs. (10) and (11). So the plot of φa versus T−1 should be a straight line, what allow us to obtain the values of φm0 = 0.84 eV and σ0 = 0.086, as can be seen in Fig. 3. The values of ξ = − 0.0632 and ψ = − 0.00315 V were obtained from the linear dependence of [(1/na) − 1] versus T−1, represented in Fig. 4. The Richardson plot can be modified by combining Eqs. (9) e (10): ln(I0/T2) − q2σ02/(2k2T2) = ln(AA*) − qΦm0/kT (14) A plot of Eq. (anterior) as a function of T−1 result in a straight line, providing the values φm0=0.83 0,9 -0,3 0,8 -0,4 0,7 -0,5 0,6 [(1/na ) - 1] Apparent barrier height (eV) eV and A*= 138 A cm−2 K−2. 0,5 0,4 0,3 -0,6 -0,7 -0,8 0,2 -0,9 0,1 2 4 6 8 10 103/T (K-1) Figure 3- Apparent barrier height as a function of T−1. 12 2 4 6 8 10 12 103/T (K-1) Figure 4-Apparent ideality factor as a function of T−1. Anais do 10o Congresso Brasileiro de Polímeros – Foz do Iguaçu, PR – Outubro/2009 3.2 Capacitance-voltage characteristics When an ac signal is applied to the diode, there is a frequency dependence of the C-V curve, which does not exist in the ideal case. When the dc voltage corresponds to a reverse bias, the differential capacitance represents the response of the depletion layer to the ac signal. In simple Schottky barrier theory, the capacitance of the barrier varies with the applied reverse voltage V in such a way that a straight line is obtained if 1/C2 is plotted against V. With the use of the simple depletion layer theory, this relation is given by C−2 = 2 (Vd + V)/(εs ε0 q A2 NA) (15) where Vd is the diffusion potential at zero bias, which can be determined from the C−2versus V results, εs is the dielectric constant of the semiconductor, NA the carrier concentration and A is the effective area of the diode. However, since we have interfacial layer, extra terms have to be included [16] C−2 = [2(Vd + V)/εsε0q A2 NA ] [1 − 4 (εsd/εmw)2 + ...........] (16) where d and εm are, respectively, the thickness and the dielectric constant of the organic layer, and w is the width of the interface layer. For non-ideal structures, the barrier height can be calculated by [17] φB = βVd + Vp (17) where β = n−1 , and Vp is the potential difference between the Fermi level and the top of the valence band in the neutral regime, given by Vp = kT ln (Nv/NA) (18) where Nv is density of states in the valence band [18]. From the plot of C−2 versus V characteristics of Al/Al2O3/PPy-NSA/Au Schottky diode at 250 kHz and room temperature, the Vd value was found to be 0.82 V. The barrier height φB = 0.79 eV was calculated from C-V curve, using the obtained Vd and Vp (0.29 V) values. The φB value obtained from C-V measurements is higher than the φB value obtained from I-V measurements. The discrepancy between these values may occur due to existence of barrier inhomogeneities [19], such as non-uniformity of the interfacial layer thickness and distribution of the interfacial charges [20]. As the potential drops across the interfacial layer, this potential changes with applied voltage and therefore the interface state charge changes, resulting in an increase in barrier height. Fig. 5 shows the experimental C-V curves of the Al/Al2O3/PPy-NSA/Au structure measured in the frequencies of 300 kHz and 2 MHZ at room temperature. As can be seen in Fig. 5 the capacitance peak values decrease with increasing frequency. Furthermore, the peak position shifts towards a lower voltage values with increasing frequency, and also with decreasing of interface state density. Anais do 10o Congresso Brasileiro de Polímeros – Foz do Iguaçu, PR – Outubro/2009 It is well known that the capacitance of Schottky barrier diodes is extremely sensitive to the interface properties, as the interface states respond differently to low and high frequencies 450 400 Capacitance (pF) 350 300 250 200 150 100 -1,0 -0,5 0,0 0,5 1,0 Voltage (V) Figure 5-Plot of capacitance as a function of voltage measured in frequencies of 300 kHz (O) and 2 MHz (O) at room temperature. 4. Conclusions Some electrical properties of the Al/Al2O3/PPy-NSA/Au structure were investigated using I-V and C-V characteristics in the temperature range of 90-350 K, in the absence of light. It was found that the value of the ideality factor n as calculated from forward bias I-V measurement was greater than unity. This behavior can be ascribed to the interfacial layer, interface states and series resistance. The applied bias voltage decreases across the oxide layer causing the forward current also to decrease, thus producing a deviation from the ideal I-V characteristics. The values of ideality factor and barrier height have been obtained at room temperature (25°C) from I-V characteristics as 1.65 and 0.68 eV respectively, and were found to be strongly temperature dependent. It is shown that the series resistance values decreased as the temperature is increased. Such behavior has been attributed to distribution of interface states, interface layer and barrier height inhomogeneities. The forward-bias C-V plot exhibits a peak due to substrate series resistance. It has been found that the peak value of the capacitance and its position depend on the interface states. At high frequency, where the influence of interface states decreases, the peak value of the capacitance decreased and the peak position shifted towards lower voltages. The non-linearity of the C−2 versus V plot at high frequency can be explained with the assumption that only some of the interface states follow the applied ac signal. Anais do 10o Congresso Brasileiro de Polímeros – Foz do Iguaçu, PR – Outubro/2009 Acknowledgments This work was supported by Vice-Reitoria de Pós-Graduação e Pesquisa da Universidade Paulista (UNIP), São Paulo, Brazil. The author wish to thank Dr R.W. Xingwu for the supply of the samples. References 1. I. Dökme, S. Altindal, Semicond. Sci. Technol. 2006, 21,1053. 2. N. Tugluoglu, S. Karaneniz, A.B. Seiçuk, S. B. Ocak, Phys.B:Condensed Matter 2007,400, 168 3. W. Bantikassegn,P. Dametum, O. Inganas, W. R. Salaneck, Thin Solid Films 1993, 224, 232. 4. S. Altindal, S. Karadeniz, N. Tugluoglu, A. Tataroglu, Solid State Electron. 2003, 47, 1847. 5. P. Cova, A. Singh, J. Appl. Phys. 1997, 82, 5217. 6. G. Güler, O. Güllo, S. Karatas, O.F. Bakkaloglu, J. Phys.:Conf. Ser. 2009, 153, 012054. 7. R. Clerc, T. Devolvre, G. Ghibaudo, C. Caillat, G. Guégan, G. Reimbold, G. Pananakis, Microeletron. Reliability, 2000, 40, 571. 8. M. Avice, U. Grossner, O. Nilsen, J.S. Christensen, H. Fjellvag, B.G. Svensson, Phys. Scri. T 2006, 126, 6. 9. L. Li, G. Weler, H. Kosina, Appl. Phys. Lett. 2008, 92, 013307. 10. R. Sahingoz, H. Kanbur, M. Voigt, C. Soykan, Synth. Met. 2008, 158, 727. 11. A.R. Saha, C.B. Dimitriu, A.B. Horsfall, S. Chattopadhyay, N.G. Wright, A.G. O’Neill, G. Bose, C.K. Maiti, J. Appl. Phys. 2006, 99, 113707. 12. S. Bandyopadhyay, A. Bhattacharyya, S.K. Sen, J. Appl. Phys. 1999, 85, 3671. 13 Y.P. Song, R.I. van Meihaeghe, W.H. Lafière, F. Cardon, Solid State Electron. 1986, 29, 633. 14. S. Karatas, S. Altindal, A. Türüt, A. Özmen, Appl. Surf. Sci. 2003, 217, 250. 15. C.A. Dimitriadis, S. Logothetidis, I. Alexandrou, Appl. Phys. Lett. 1995, 66, 502. 16. H. Haick, M. Ambrico, T. Ligonzo, R.T. Tung, D. Cahen, J. Am. Chem. Soc. 2006, 128, 6854. 17. M. Çakar, C. Temirci, A. Türüt, Synth. Met. 2004,142,177. 18. W. Mönch, Semiconductor Surfaces and Interfaces, third ed. Springer, Berlin, 2001. 19. A.F. Özdenir, A. Türüt, A. Kökçe, Thin Solid Films 2003, 425, 210. 20. F. Yakuphanoglu, Synth. Met. 2008, 158, 108. Anais do 10o Congresso Brasileiro de Polímeros – Foz do Iguaçu, PR – Outubro/2009