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Centre of NEMS and Nanophotonics, IIT Madras
Mask Writing Requisition Form
Name
Roll No. / Employment Id
Size of the mask layout
Minimum feature size
Type of Mask (Dark/Bright Field)
Mask #
(in case of multiple lithography steps)
Device Description (to be fabricated):
Signature of guide
Date:
Signature of faculty-in-charge
Date:
Operator's comments & signature with dates (after fabrication):
Mask Inventory No:

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