Download Nanostructures written by single photons – directly without a mask

Nanostructures written by single photons – directly
without a mask
Innovation
So far lithographic patterning techniques either use sources of radiation with very short
wavelengths, or complex optical systems and/or masks to generate structures in the
nanometer range. The masks are prepared in a time-consuming process, can only be used
for a specific pattern and decrease the achievable resolution because of diffraction effects.
The current methods are not very suitable for mass production. At the Peter Grünberg
Institute of Semiconductor Nanoelectronics (PGI-9) a lithographic concept based on single
photons has been developed. Thus micro- and nanostructures can be produced much
easier and without a mask. In addition any pattern can be generated without much effort.
Therefore the method is not only suitable for mass production of nanostructures but also
for prototype development in which the patterns generated can be varied and optimized in
rapid succession.
Technology
Structures are written directly onto the medium by a single photon source. This allows the
transfer of very fine structures onto the medium without using a lithographic mask. By
several photon sources each controlled separately complex structures and any pattern can
be written. For example prototypes of new structures can be written in a quick, simple and
cost-effective manner. The technology is not limited by diffraction in contrast to
conventional lithography.
Potential use
Semiconductor industry, micro- and nanoelectronics, optoelectronics, photonics
IP
Mitglied der Helmholtz-Gemeinschaft
DE 102012016178B3, applied for on 16 August 2012, granted on 29 August 2013, PCT
application pending.
1
Forschungszentrum Jülich:
With approximately 5,000 employees we conduct outstanding research in the areas of energy and environment, information and brain research.
Visit us at www.fz-juelich.de and http://social.helmholtz.de/fzj.
Developmental Status and Next Steps
Proof of principle has been shown. More research and development has to be conducted,
including:
 Optimization of material and growth of the single photon sources
 Development of the architecture of control circuits for the single photon sources
Forschungszentrum Jülich is seeking industry partners who will develop the technology
further to market-readiness.
Keywords
Optical lithography, single photon sources, micro-and nanostructures, semiconductor
technology, photonics
Contact
Mitglied der Helmholtz-Gemeinschaft
Forschungszentrum Jülich GmbH
Technology Transfer
Sonja Raiber
Wilhelm-Johnen-Straße
52428 Jülich
Germany
Phone: +49 2461 61-9287
Mobile: +49 160 5366584
E-Mail: [email protected]
2
Forschungszentrum Jülich:
With approximately 5,000 employees we conduct outstanding research in the areas of energy and environment, information and brain research.
Visit us at www.fz-juelich.de and http://social.helmholtz.de/fzj.