Download MOSFET I-V characteristics: general consideration

MOSFET I-V characteristics:
general consideration
The current through the channel
is
V
I=
R
The gate length L
+
-
where V is the DRAIN – SOURCE voltage
V-GS
V
G
+
S
D
Semiconductor
Here, we are assuming that V << VT (we will see why, later on)
The channel resistance, R (W is the device width):
R=
L
q n μ aW
=
L
q ns μ W
where nS = (ci/q) × (VGS – VT)
The channel current is: I = V (q nS μ W) /L = V q μ W (ci/q) × (VGS – VT) /L
I = μ W ci × (VGS – VT) V /L
1
MOSFET transconductance
In most MOSFET applications, an input signal is the gate voltage VG
and the output is the drain current Id.
The ability of MOSFET to amplify the signal is given by the
output/input ratio: the transconductance, gm = dI/dVGS.
I = μ W ci × (VGS – VT) V /L
From this:
(V is the Drain – Source voltage)
gm = V μ W ci /L
Key factors affecting FET performance (for any FET type):
μ
I and gm
L
I and gm
High carrier mobility μ and short gate length L are the key features of FETs
2
Modern submicron gate FET
Source
Drain
V-groove quantum wire transistor
Gate
2 μm
Operating frequency – up to 300 GHz
3
Drain current saturation in MOSFET
The gate length L
+
-
VGS-
+
V
G
S
D
Semiconductor
When no drain voltage V is applied, the entire channel has the same
potential as the Source, i.e. VCH = 0.
In this case, as we have seen, nS = (ci/q) × (VGS – VT)
where VGS is the gate – source voltage and VT is the threshold voltage
When the drain voltage V is applied, the channel potential changes
from VCH = 0 on the Source side to VCH= V on the drain side.
In this case, the induced concentration in the channel also depends
on the position.
4
Drain current saturation in MOSFET
The gate length L
+
-
VGS-
+
V
G
S
D
Semiconductor
With the drain voltage V is applied, the actual induced concentration in
any point x of the channel depends on the potential difference between
the gate and the channel potential V(x) at this point.
This is because this local potential difference defines the voltage that
charges the elementary gate – channel capacitor.
On the source end of the channel (x=0, VCH=0):
nS(0) = (ci/q) × (VGS – VT).
On the drain end of the channel (x=L, VCH= V):
nS(L) = (ci/q) × (VGS – VT - V) < nS(0)
At any point between source and drain,
nS(L) < nS(x) = (ci/q) × [VGS – VT – V(x)] < nS(0)
5
Drain current saturation in MOSFET
VGS
V
G
S
D
Semiconductor
nS
VGS > VT
Id
V=0
V1 > 0
V2 > V1
V3 = VGS-VT
L
V
x
6
MOSFET Modeling
1. Constant mobility model
Assuming a constant electron mobility,
μn, using the simple charge control
model the absolute value of the electron
velocity is given by,
dV
vn = μnF = μn
dx
With the gate voltage above the threshold, the drain current, Id, is given by
dV
ns
dx
Id
dV =
dx
W μn ci (VGT −V )
Id = Wqμ n
Rewriting,
Where W is the device width
Where VGT
= VGS – VT.
dV vs dx dependence represents a series connection of the elementary
parts of MOSFET channel
(for the series connection, voltages add up whereas current is the same).
7
(VGT −V )×dV =
Id
W μ n ci
dx
Integrating along the channel, from x=0 (V=0) to x=L (V=VDS), we obtain:
For, VDS << VGT,
For, larger VDS ,
W μn ci
Id =
VGT VDS
L
Id =
Wμ n ci ⎛
V ⎞
⎜ VGT − DS ⎟ V DS
L ⎝
2 ⎠
Linear region
Sub-linear region
Sub-linear
8
Channel pinch off and current saturation
Pinch off occurs when VG – VCH = VT at the drain end;
nS (L) =0; the current Id saturates
When,
VDS = VSAT = VGS − VT
where VSAT is the saturation voltage.
From the Id – V dependence,
at VDS=VSAT = VGT,
Id =
Wμ n ci ⎛
V ⎞
⎜ VGT − DS ⎟ V DS
L ⎝
2 ⎠
The saturation (pinch off) current,
Wμ n ci 2
Id = Isat =
VGT
2L
9
Transconductance
Defined as
gm =
dId
dVGS V DS
From the equations for the drain current, Id, derived above, we find that
⎧βVDS ,
gm = ⎨
⎩βVGT ,
for VDS << VSAT
for VDS > VSAT
where
W
β = μ n ci
L
High transconductance is obtained with high values of
the low field electron mobility, thin gate insulator layers
(i.e., larger gate insulator capacitance ci = εi/di), and
large W/L ratios.
10
2. Velocity saturation model
In semiconductors, electric field F accelerates electrons, i.e. the drift velocity of
electron increases:
v=μF
However, at high electric fields this velocity
saturates
In modern short channel devices with channel
length of the order of 1 µm or less, the electric
field in the channel can easily exceed the
characteristic electric, Fs field of the velocity
saturation
vs
Fs =
μn
11
Electric field in the channel
1.2
18
0.8
0.6
0.4
0.2
Electric Field (kV/cm)
1.2
Potential (V)
16
1
1
14
1
12
1.2
10
8
6
4
2
0
0
0
1 2 3 4 5
Distance (µm)
0
1 2 3 4 5
Distance (µm)
Surface Concentration (1012 1/cm2)
the electric field in the channel in the direction parallel to the semiconductorinsulator interface
dV
Id
v
=
μ
F
=
μ
F=
n
n
n
dx
qμ nns (V )W
1.4
1.2
1
0.8
0.6
1
0.4
1.2
0.2
0
0
1 2 3 4 5
Distance (µm)
Potential, electric field, and surface electron concentration in the channel of a Si MOSFET for VDS = 1 and
1.2 V. L = 5 µm, di = 200 Å, µn = 800 cm2/Vs, VGS = 2 V, VT = 1 V.
12
Once the electric field at the drain side of the channel (where the electric field
is the highest) exceeds Fs, the electron velocity saturates, leading to the current
saturation.
In short-channel MOSFETs, this occurs at the drain bias smaller than the
pinch-off voltage VDS = VGT.
Id
dV =
dx
W μn ci (VGT −V )
Field at drain
Saturation condition,
Id
dV
F ( L) =
x=L =
dx
W μn ci (VGT −VDS )
ISAT
Fs =
μ nci (VGT − VSAT )W
13
Saturation current versus gate-to-source voltage for 0.5 µm gate and 5 µm gate
MOSFETs. Dashed lines: constant mobility model, solid lines: velocity
saturation model.
14
MOSFET saturation current accounting for velocity saturation:
Isat =
gch VGT
⎛V ⎞
1 + 1 + ⎜ GT ⎟
⎝ VL ⎠
2
where VL = FsL and the channel conductance gch =
q µn ns W / L,
where ns=ci VGT/q
When FS L >> VGT (MOSFET with long gate or no velocity saturation):
Isat =
gch VGT
⎛V ⎞
1 + 1 + ⎜ GT ⎟
⎝ VL ⎠
2
gch
I sat ≈
VGT
2
Wμ n ci 2
Id = Isat =
VGT
2L
(Expression obtained before on slide 9)
When FS L << VGT (MOSFET with short gate or early velocity saturation):
Isat =
gch VGT
⎛V ⎞
1 + 1 + ⎜ GT ⎟
⎝ VL ⎠
2
I sat ≈ gch VL
(Note that gch is controlled by VGT)
15
Source and drain series resistances.
Source and drain parasitic series resistances, Rs and Rd, play an important role,
especially in short channel devices where the channel resistance is smaller.
Gate
Source
R
s
R
d
Drain
Vds= Id R s + VDS + Id R
d
VGS = Vgs − Id Rs
VDS = Vds − I d (Rs + Rd )
16
The measured transconductance
(extrinsic)
dId
gm =
dVgs
The intrinsic transconductance
(VGS and VDS being intrinsic
voltages)
Vds =const
dId
g mo =
dVGS V = const
DS
g mo
gm =
1 + g mo R s + gdo ( R s + Rd
These parameters are related as
Where gd0 is the drain conductance
dI d
g do =
dVDS
)
VGS =const
In the current saturation region (VDS > VSAT), gd0 ≈ 0
Similarly, extrinsic drain conductance can be written as,
gd =
gdo
1 + gm o R s + g ( R s + R
do
d
)
17
The saturation current in MOSFET with parasitic resistances:
Isat =
gcho Vgt
(
1 + gcho Rs + 1 + 2gcho Rs + Vgt / VL
)
2
where VL = FsL and gcho = ciVgtµnW/L.
160
160
140
120
Drain Current (mA)
Drain Current (mA)
140
100
80
60
40
20
120
100
80
60
40
20
0
0
0.5
1
1.5
2
2.5
Drain-to-Source Voltage (V)
0
0
0.5
1
1.5
2
2.5
Drain-to-Source Voltage (V)
MOSFET output characteristics calculated for zero parasitic
resistances and parasitic resistances of 5 Ω. Gate length is 1 µm
18
MOSFET capacitance-voltage characteristics
VGS
S
G
V
D
Semiconductor
To simulate MOSFETs in electronic circuits, we need to have models for both
the current-voltage and the capacitance-voltage characteristics.
As MOSFETs is a three terminal device, we need three capacitances: Cgs, Cgd
and Cds.
Capacitance (differential) is defined as C = dQ/dV. For example,
Cgs = dQs/dVgs (where Qs is the channel charge between S and G)
Therefore, the total channel charge QN has to be divided (partitioned) between
the source and drain charges. How should we partition QN between Qs and Qd?
It is clear from the device symmetry that at zero drain bias Qs = Qd. If the total
channel charge is QN, then Qs = 0.5 QN and Qd = 0.5 QN.
19
MOSFET capacitance-voltage characteristics
In the saturation regime, the charge distribution is no longer symmetrical: Qs > Qd
In this case, we let Qs = FpQN and Qd = (1 – Fp)QN,
where Fp is the partitioning factor. In saturation, Fp > 0.5
The challenge using this model is to determine Fp as a function of Vgs and V
20
Meyer model for MOSFET capacitance
(used in SPICE)
2⎤
⎡
2 ⎢ ⎛ VGT −VDS ⎞ ⎥
Cgs = Ci 1 − ⎜
⎟ +C f
3 ⎢ ⎝ 2VT −VDS ⎠ ⎥
⎣
⎦
2 ⎡⎢ ⎛ VGT
Cgd = Ci 1 − ⎜
3 ⎢ ⎝ 2VT −VDS
⎣
⎞
⎟
⎠
2⎤
⎥ +C f
⎥
⎦
Ci = ci × W × L is the channel capacitance
The capacitance Cf is the fringing capacitance.
C f ≈ βc ε s W
where βc ≈ 0.5
In saturation, VDS has to be replaced by VSAT (where VSAT = VGT)
This results in
CGS SAT = (2/3) Ci+Cf;
CGd SAT = Cf
21
Meyer model for MOSFET capacitance
(used in SPICE)
0.7
C GS/C i
0.6
C/Ci
0.5
0.4
0.3
CGD/C i
0.2
0.1
0.0
0
0.2
0.4
0.6
0.8
1.0 1.2
1.4
VDS/VSAT
22