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Presentation On MEMS Strain Sensors and Strain Engineered CMOS Professor Toshikazu (Toshi) Nishida Interdisciplinary Microsystems Group Department of Electrical and Computer Engineering University of Florida 11:00 AM June 25, 2007 Hewlett 102 Abstract: Strain in semiconductors will be discussed in the context of variable stress strain sensors and fixed stress strain-engineered advanced CMOS. Common physics in these different applications will be outlined. The design and characterization of a MEMS piezoresistive microphone and measurement of the piezoresistance coefficients at high stresses will be described. Toshikazu (Toshi) Nishida is associate professor in the Department of Electrical and Computer Engineering (ECE) and an Affiliate Associate Professor in the Department of Mechanical and Aerospace Engineering (MAE) at the University of Florida. His research interests include solid-state physical sensors and actuators, transducer noise, strained semiconductor devices, and reliability physics of semiconductor devices. He and his students are currently investigating strain effects in piezoresistive microelectromechanical systems (MEMS) transducers and advanced CMOS devices, noise mechanisms in piezoresistive MEMS transducers, MEMS piezoelectric transducers for vibrational energy reclamation, MEMS capacitive microphones, and biomedical applications of MEMS. He received his Ph.D. (1988) and M.S. degrees in Electrical and Computer engineering and B.S. degree in Engineering physics at the University of Illinois at Urbana-Champaign. With colleagues and students, he has received three best paper awards. He also received the 2003 College of Engineering Teacher of the Year award. He holds three U.S. patents. He is a member of IEEE, Materials Research Society, American Physical Society, and the American Society for Engineering Education 1