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University of California College of Engineering Department of Electrical Engineering and Computer Sciences B. Nikolić Thursday, October 3, 2002 6:00-7:30pm EECS 141: FALL 2002—MIDTERM 1 For all problems, you can assume the following transistor parameters (unless otherwise mentioned): NMOS: VTn = 0.4, k’n = 115 A/V2, VDSAT = 0.6V, = 0, = 0.4 V1/2, 2F = 0.6V PMOS: VTp = 0.4V, k’p = 30 A/V2, VDSAT = 1V, = 0, = -0.4 V1/2, 2F = 0.6V NAME Last SOLUTION First GRAD/UNDERGRAD Problem 1: __12_/ 12 Problem 2: __20_/ 20 Problem 3: __10_/ 10 Total: EECS 141: FALL 2002 – MIDTERM 1 __42_/ 42 1/9 PROBLEM 1. (10 pts) MOS transistor as a switch a) (4 pts) Find the final value of the voltage Vo, as a response to a LH transition at the input as shown in Figures 1.a – 1.d. Assume VTN = |VTP| = 0.5V. Assume that the capacitor is initially discharged, and ignore subthreshold conduction and body effect. 2.5V Vo = 2V 2.5V 0V Figure 1.a. 2.5V 2.5V 0V 2.5V Vo = 1.5V Figure 1.b. 2.5V 2.5V Vo = 1.5V 2.5V 0V Figure 1.c. 0V 2.5V Vo = 2.5V 0V Figure 1.d. EECS 141: FALL 2002 – MIDTERM 1 2/9 b) (2pts) When the output reaches its final value, a 2.5V to 0 step is applied to the input. Determine the energy consumed in the transistors from Figure 1.c. during the transition (in symbolic terms). E dis 1 C (V 2VT ) 2 2 1 E1 0 C (V 2VT ) 2 2 EECS 141: FALL 2002 – MIDTERM 1 3/9 c) (6pts) For Figure 1.d, find the energy dissipated in the transistor during the first 0 1 transition. Then, when the output reaches its final value, a 2.5V to 0 step is applied to the input, followed by the second 0 to 2.5V step. Find the energy dissipated in the transistor in the first 1 0 transition, and the second 0 1 transition (in symbolic terms). 1 2 First E0 1 CV 2 1 2 First E1 0 C V 2 VT 2 Second E0 1 C V VT 2 1 2 EECS 141: FALL 2002 – MIDTERM 1 4/9 PROBLEM 2. (20pts) Transistor sizing. An inverter chain is shown in Figure 2. The first and the third inverter are supplied from VDD1 = 2.5V, while the second inverter is supplied from VDD2 = 1.5V. The input to the inverter chain swings between 0 and 2.5V. All transistors are minimum length, L = 0.25m. VDD1 = 2.5V VDD2 = 1.5V VDD1 = 2.5V In Out2 Out1 Wn = 1m Wp = 2m Wn = 1m Figure 2. Wn = 1m Wp = 2m a) (8pts) If the width of the NMOS transistor in the second stage is Wn = 1, find the size of the PMOS transistor, such that the second inverter exhibits the same LH and HL propagation delays (output Out1). The 50% point at the output of the second inverter is VDD2/2 = 0.75V. Need Reqp = Reqn. Reqn 3 4 V DD 2 W kn n L V DSATn 2 V DD1 VTn V DSATn 2 VDD 2 2 1 VDD 2 2 I D VDD 2 I D VDD 2 2 VDD 2 VDD 2 2 1 Reqp 2 2 2 Wp V DSATp V DD 2 VDD 2 Wp kp V DD 2 VTp k p L VDD 2 VTp VDSATp L 2 8 2 Reqp Wp = 7.14m EECS 141: FALL 2002 – MIDTERM 1 5/9 b) (8pts) Determine the high and low output levels at the node Out2. Hint: You can make a reasonable assumption on the operating modes of transistors, but you have to prove that these assumptions are correct when you find the solution. VOH = 2.5V VOL: If output is low enough, PMOS is velocity saturated and NMOS is linear. |Ip| = In k p Wp 2 VOL 2 Wn VDD1 VDD 2 VTp k n V V V DD 2 Tn OL 2 L L 2 VOL = 0.09V Check assumptions: PMOS VGS, VDS, VDSAT – saturation, NMOS linear. VOH = 2.5V VOL = 0.09V EECS 141: FALL 2002 – MIDTERM 1 6/9 c) (4pts) How would you resize the third inverter to improve the noise margins? Increase Wn, or decrease Wp/Wn ratio. This also decreases VM. EECS 141: FALL 2002 – MIDTERM 1 7/9 3. CMOS Scaling (10pts) A microprocessor consumes 0.3mW/MHz when fabricated using a 0.13 m process. The area of the processor is 0.7 mm2. Assume a 200 MHz clock frequency, and 1.2 V power supply. Its leakage power is 0.1mW. Assume short channel devices, but ignore second order effects like mobility degradation, series resistance, etc. a) (5pts) If the supply voltage of the microprocessor scaled to 90 nm is reduced to 1.0 V, what will the area, frequency, power consumption, and power density be? Full scaling, since voltage and gate length change by different factors. Referring to table 3.8 (page 119 of the reader) we get: L 0.13 S old 1.444 Lnew 0.09 V 1.2 U old 1.2 Vnew 1.0 Area: Anew 1 0.7mm 2 A 0.336mm 2 old 2 2 S 1.444 Frequency: f new Sf old 1.444 200MHz 288.8MHz Power: Pold (200MHz ) 0.3mW / MHz 60mW 1 60mW Pnew 2 Pold 41.67mW U 1.2 2 Power density: P 41.67mW PDnew new 124.0mW / mm2 2 Anew 0.336mm EECS 141: FALL 2002 – MIDTERM 1 8/9 b) (5pts) If the threshold voltage in the 0.13 m process is 0.35V, what should be the threshold voltage in 90nm? Assuming 80mV/dec subthreshold slope, what would be the leakage power of the new processor? Same scaling as in problem a, so: S 1.444 , U 1.2 Hence, the new value of the threshold voltage is: 1 0.35V VTnew VTold 0.292V U 1.2 Hence, ΔVT VTold VTnew 58mV We know that (see pages 96 and 212-214 of the reader): Pleak ,old aVold I leak ,old (1) Pleak ,new aVnew I leak,new (2) where a is a constant. Dividing (2) by (1) we get: Pleak ,new Vnew I leak ,new 1 ΔVT / 80mV 1 58 / 80 10 Pleak ,new 0.1mW 10 441μW Pleak ,old Vold I leak ,old U 1.2 EECS 141: FALL 2002 – MIDTERM 1 9/9