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Transcript
University of California
College of Engineering
Department of Electrical Engineering
and Computer Sciences
B. Nikolić
Thursday, October 3, 2002
6:00-7:30pm
EECS 141: FALL 2002—MIDTERM 1
For all problems, you can assume the following transistor parameters (unless
otherwise mentioned):
NMOS:
VTn = 0.4, k’n = 115 A/V2, VDSAT = 0.6V,  = 0,  = 0.4 V1/2, 2F = 0.6V
PMOS:
VTp = 0.4V, k’p = 30 A/V2, VDSAT = 1V,  = 0,  = -0.4 V1/2, 2F = 0.6V
NAME
Last
SOLUTION
First
GRAD/UNDERGRAD
Problem 1: __12_/ 12
Problem 2: __20_/ 20
Problem 3: __10_/ 10
Total:
EECS 141: FALL 2002 – MIDTERM 1
__42_/ 42
1/9
PROBLEM 1. (10 pts) MOS transistor as a switch
a) (4 pts) Find the final value of the voltage Vo, as a response to a LH transition at
the input as shown in Figures 1.a – 1.d. Assume VTN = |VTP| = 0.5V. Assume that
the capacitor is initially discharged, and ignore subthreshold conduction and body
effect.
2.5V
Vo = 2V
2.5V
0V
Figure 1.a.
2.5V
2.5V
0V
2.5V
Vo = 1.5V
Figure 1.b.
2.5V
2.5V
Vo = 1.5V
2.5V
0V
Figure 1.c.
0V
2.5V
Vo = 2.5V
0V
Figure 1.d.
EECS 141: FALL 2002 – MIDTERM 1
2/9
b) (2pts) When the output reaches its final value, a 2.5V to 0 step is applied to the input.
Determine the energy consumed in the transistors from Figure 1.c. during the transition
(in symbolic terms).
E dis 
1
C (V  2VT ) 2
2
1
E1 0  C (V  2VT ) 2
2
EECS 141: FALL 2002 – MIDTERM 1
3/9
c) (6pts) For Figure 1.d, find the energy dissipated in the transistor during the first 0 1
transition. Then, when the output reaches its final value, a 2.5V to 0 step is applied to the
input, followed by the second 0 to 2.5V step. Find the energy dissipated in the transistor
in the first 1  0 transition, and the second 0 1 transition (in symbolic terms).
1
2
First E0 1  CV 2
1
2

First E1 0  C V 2  VT 2

Second E0 1  C V  VT 2
1
2
EECS 141: FALL 2002 – MIDTERM 1
4/9
PROBLEM 2. (20pts) Transistor sizing.
An inverter chain is shown in Figure 2. The first and the third inverter are supplied from
VDD1 = 2.5V, while the second inverter is supplied from VDD2 = 1.5V. The input to the
inverter chain swings between 0 and 2.5V. All transistors are minimum length, L =
0.25m.
VDD1 = 2.5V VDD2 = 1.5V
VDD1 = 2.5V
In
Out2
Out1
Wn = 1m
Wp = 2m
Wn = 1m
Figure 2.
Wn = 1m
Wp = 2m
a) (8pts) If the width of the NMOS transistor in the second stage is Wn = 1, find the size
of the PMOS transistor, such that the second inverter exhibits the same LH and HL
propagation delays (output Out1).
The 50% point at the output of the second inverter is VDD2/2 = 0.75V.
Need Reqp = Reqn.
Reqn 
3
4
V DD 2
W
kn n
L

V DSATn 2 
V DD1  VTn V DSATn 

2


VDD 2 2 
1  VDD 2



2  I D VDD 2 I D VDD 2 2 






VDD 2
VDD 2 2
1

Reqp  


2
2
2

Wp 
V DSATp 
V DD 2 VDD 2  
 Wp 

 kp
 V DD 2  VTp

 k p L  VDD 2  VTp VDSATp 
L 
2
8  
2





Reqp 




Wp = 7.14m
EECS 141: FALL 2002 – MIDTERM 1
5/9
b) (8pts) Determine the high and low output levels at the node Out2. Hint: You can make
a reasonable assumption on the operating modes of transistors, but you have to prove that
these assumptions are correct when you find the solution.
VOH = 2.5V
VOL: If output is low enough, PMOS is velocity saturated and NMOS is linear.
|Ip| = In
k p Wp
2
VOL 2 
Wn 


VDD1  VDD 2  VTp  k n
V

V
V

 DD 2

Tn OL
2 L
L 
2 


VOL = 0.09V
Check assumptions: PMOS VGS, VDS, VDSAT – saturation, NMOS linear.
VOH = 2.5V
VOL = 0.09V
EECS 141: FALL 2002 – MIDTERM 1
6/9
c) (4pts) How would you resize the third inverter to improve the noise margins?
Increase Wn, or decrease Wp/Wn ratio. This also decreases VM.
EECS 141: FALL 2002 – MIDTERM 1
7/9
3. CMOS Scaling (10pts)
A microprocessor consumes 0.3mW/MHz when fabricated using a 0.13 m process. The
area of the processor is 0.7 mm2. Assume a 200 MHz clock frequency, and 1.2 V power
supply. Its leakage power is 0.1mW. Assume short channel devices, but ignore second
order effects like mobility degradation, series resistance, etc.
a) (5pts) If the supply voltage of the microprocessor scaled to 90 nm is reduced to 1.0
V, what will the area, frequency, power consumption, and power density be?
Full scaling, since voltage and gate length change by different factors. Referring to
table 3.8 (page 119 of the reader) we get:
L
0.13
S  old 
 1.444
Lnew 0.09
V
1.2
U  old 
 1.2
Vnew 1.0
Area:
Anew 
1
0.7mm 2
A

 0.336mm 2
old
2
2
S
1.444
Frequency:
f new  Sf old  1.444  200MHz  288.8MHz
Power:
Pold  (200MHz )  0.3mW / MHz  60mW
1
60mW
Pnew  2 Pold 
 41.67mW
U
1.2 2
Power density:
P
41.67mW
PDnew  new 
 124.0mW / mm2
2
Anew 0.336mm
EECS 141: FALL 2002 – MIDTERM 1
8/9
b) (5pts) If the threshold voltage in the 0.13 m process is 0.35V, what should be the
threshold voltage in 90nm? Assuming 80mV/dec subthreshold slope, what would be
the leakage power of the new processor?
Same scaling as in problem a, so:
S  1.444 , U  1.2
Hence, the new value of the threshold voltage is:
1
0.35V
VTnew  VTold 
 0.292V
U
1.2
Hence,
ΔVT  VTold  VTnew  58mV
We know that (see pages 96 and 212-214 of the reader):
Pleak ,old  aVold I leak ,old
(1)
Pleak ,new  aVnew I leak,new
(2)
where a is a constant.
Dividing (2) by (1) we get:
Pleak ,new Vnew I leak ,new 1 ΔVT / 80mV
1 58 / 80

 10
 Pleak ,new  0.1mW
10
 441μW
Pleak ,old Vold I leak ,old U
1.2
EECS 141: FALL 2002 – MIDTERM 1
9/9