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Magnetoresistive Random Access Memory (MRAM) Anton Kapliy University of Chicago History •1975 – M. Julierre observes weak TMR effect under low temperatures and attributes it to exchange splitting in ferromagnets •1995 – J.S. Moodera uses new materials (MgO) to achieve substantial TMR at room temperatures •2000 – Freescale, IBM, Infineon et al initiate programs to commerialize the technology •2006 - present – commercial availability. Today 1 MB costs > $1, development proceeds Exchange Splitting in Ferromagnets •External magnetic field produces Zeeman splitting in the energies of spin-up and spin-down electrons. •In case of ferromagnets, which can maintain their own B-field, this energy splitting can occur without any external field. This so-called exchange splitting can be on the order of an eV, and explains unequal density of states of electrons with different spins near Fermi surface: Tunnel Magnetoresistance (TMR) Memory Structure and Read Mode Spin Transfer Switching Each cell in MRAM is represented by an MTJ. Being in a parallel or antiparallel state defines binary memory states “0” (low R) and “1” (high R). Starting around 2006, MRAM research shifted towards the Spin Transfer Toque technique for changing layer magnetization. MRAM cells are organized into a 2-d grid such that each MTJ lies at the intersection of a Word/Digit Line and a Bit Line (see image on the left). This way we can address any cell of interest. •Electrons pass through the fixed layer and get spin-polarized along M1 •Electrons next move through the free layer and repolarize along M2 •By angular momentum conservation, they apply a torque on electrons in the free layer, so that their spin turns in the direction of M1 •With sufficient current, free layer becomes polarized parallel to M1 Read Mode: •Activate the word line (WL) •Clamp bit line (BL) to fixed voltage •Transistor will sink a current (IR) from collector to emitter •Compare that current to reference Total torque on M2 for different spin torques Note that spin torque is proportional to current A Magnetic Tunnel Junction (MTJ) consists of a thin insulating layer (~1 nm, corresponding to ~10 atomic monolayers) sandwiched between two ferromagnets (~50 angstroms). One layer has frozen magnetization, and the other is free to change. Classically, there is no conduction across MTJ when we apply bias voltage. However, quantum mechanically, electrons can tunnel through the barrier. To a good approximation, this process can be described in terms of Julierre’s two-current model: •Different spins tunnel independently: the probability for an electron to tunnel and change its spin is a 2nd order effect. •Electrons near Fermi level account for the majority of tunneling – since they are the most energetic •Tunneling probability is proportional to density of states near Fermi level – according to Fermi’s Golden rule •If two magnetizations are parallel, majority spins (↓) tunnel to majority states and account for most of the conduction. Minority spins (↑) tunnel to minority states and have negligible conduction. •If two magnetizations are antiparallel, majority spins (↓) tunnel to minority states, while minority spins (↑) tunnel to majority states. Thus, both channels are suppressed, resulting in low overall conduction. Mathematically, we can compute the TMR ratio as follows: I I R R (n n ) TMR I R 2n n 2 P 50% I n n 1 P U m B I 2n n Write Mode The sensing current produced in read mode is not sufficient to change the magnetization state of free layer. Instead, the state is changed as follows: •Send a unidirectional (“hard”) current through the digit line. •Send a bi-directional (“soft”) current through the bit line •Turn the isolation transistor off so that no current flows through the junction during write cycle •Use ferromagnetic material with such coercivity that the switching doesn’t occur when exposed to B-field from one line only. Sketch of state switching Reversal gap between states vs switch fields 2 2 Hysteresis curve: Remanence and Coercivity 2 2 Device model from Freescale 2 n n P n n (spin polarization) Phase space of switch fields Since spin transfer method doesn’t require a strong externally-generated Bfield, it promises lower power consumption and better scalability. Conclusions MRAM has many benefits over alternative technologies: •Non-volatile (draws no power when idle) •No mechanical parts and no wear mechanism •Low power and high density •Much faster than Flash memory However, it still faces many challenges: •Requires good material uniformity (e.g., for small MTJ resistance variation) •Close packing reduces switching barrier; prone to thermal auto-switching •B-field from neighboring locations starts to interfere as size is reduced •Low adoption, and as a consequence, high prices References 1. Physics Review, Volume 168, N2 531 (1968) – Spin-disorder scattering and magnetoresistance of magnetic semiconductors 2. J.M. De Teresa et al, Role of the Barrier in Magnetic Tunnel Junctions 3. JOM-e 52(6) (2000) (J.M. Slaughter et al) – Magnetic Tunnel Junction Materials for Electronic Applications 4. Freescale Semiconductor – website materials (http://www.freescale.com/) 5. Industrial Embedded Systems (magazine) – Magnetic Tunnel Junction sensor development for industrial applications 6. H. Kimura et al - A Study of Multiple-Valued MRAM Using Binary MTJ Devices 7. Wikipedia.org (to review many relevant concepts) 8. Plus half-a-dozen other academic and industrial papers/datasheets