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Problem For silicon at T=300K, given that the value of Nc =2.8x1019 cm-3 and Nv=1.04x1019 cm-3, find: a) The electron concentration for an n-type doped semiconductor if EF is located at 146 meV below EC. b) The hole concentration for a p-type doped semiconductor if EF is located at 0.31eV above EV. Solution a) Givens: Nc =2.8x1019 cm-3 , Ec - EF= 0.146eV, k=8.6173324×10β5eV.K-1 and T=300K Substituting in the equation π = ππ π β(πΈπ βπΈπΉ ) πΎπ β΄n = 9.87x1016cmβ3 b) Givens: Nv=1.04x1019 cm-3, EF β Ev= 0.31eV, k=8.6173324×10β5eV.K-1 and T=300K Substituting in the equation π = ππ£ π β΄p = 6.44x1013cmβ3. β(πΈπΉ βπΈπ£ ) πΎπ