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Transcript
CMOS compatible Ion Sensitive Field Effect
Transistor with Silicon Nitride Membrane for pH
Measurement System
W. Bunjongpru, O. Trithaveesak, K. Sowsuwan, W. Jeamsaksiri, C. Hruanun, and A. Poyai
Thai Microelectronics Center (TMEC)
51/4 Moo1, Suwintawong road, Wangtakien district, Amphur Muang, Chachoengsao
Thailand 24000
Abstract- Two main parts are necessary to implement a
prototype of pH measurement system: pH sensor and interface
unit. The pH sensors, based on Ion Sensitive Field Effect
Transistor (ISFET), are designed and then fabricated used 6-inch
silicon wafers by conventional CMOS process. As ion sensitive
membrane, all transistors have 50nm high quality silicon nitride
thin film which was deposited on 10nm silicon dioxide. The
sensitivity of sensors is found in the range of 40-55 mV/pH. The
interface unit supplies the sensor with a constant current and
voltage. The pH value is identified from the output voltage of the
circuit. From the results, the system can be used for measuring
the pH values in the range of 4-10 with a resolution of 0.1 pH.
I.
INTRODUCTION
Monitoring of pH value is beneficial for the
agriculture and environment fields. The conventional pH
sensors are in a form of the glass electrode. Such sensors have
many disadvantages, the size and maintenance of electrode,
the reaction time, for examples. An alternative pH sensor was
introduced by Bergveld [1]. In stead of glass electrode, the
sensor is a solid state device, known as Ion Sensitive Field
Effect Transistor (ISFET). Principally the ISFET is very
similar to Metal Oxide Semiconductor Field Effect Transistor
(MOSFET). Fig.1 shows the schematic of MOSFET compared
to ISFET. In stead of the gate on the isolator in case of
MOSFET, the gate of ISFET, called reference electrode, float
in the electrolyte and the insulator, as know as Ion Sensitive
Membrane (ISM), contacts directly to the solution. the surface
potential changes with the pH value of the solution, this
results in changes of the threshold voltage VT of the ISFET.
In the conventional CMOS process two insulators can be used
as ISM: silicon dioxide and silicon nitride. Due to the more
stability and shorter response time [2,3], silicon nitride is used
in the studies. By combining with CMOS technology process,
the sensors can be fabricated in mass production and the
membrane dimension can be reduced to an area of a few
thousand of square microns.
In the implementation of pH meter, a read out circuit
is connected to the sensors. So the accuracy of the system
depends not only on the properties of the sensors but also on
interface unit. Fig. 2 shows the read out circuit, which is used
for the prototype [4]. The circuit is designed to apply constant
both drain-source current IDS and drain-source voltage VDS to
the sensors. The operation point can be adjusted individually
by R1 and R2 respectively. From the output voltage VO the pH
value is derived from the calibration in standard buffers.
(a)
(b)
Figure 1. (a) MOSFET has a gate dielectric deposited on top of insulator
membrane while (b) ISFEET does not have gate directly deposited on top of
the dielectric.
The following parts of the paper will start from the
experiments, the electrical characterization and finally the
conclusion.
II. EXPERIMENTS
The design and fabrication of ISFET on 6-inch
silicon wafers are described in detail elsewhere [5,6]. After the
fabrication process is finished, the wafer is diced into
individual units. The diced sensor is then glued on a prepared
print circuit board and bond wired to metal pads. For
encapsulation, negative photoresist SU8-100 is spreaded on
the metal parts and the edge of Si substrate. Finally the sensor
is cured at 85OC for 30 min and then exposed in UV light 5
min.
The electrical characterization began with the
measurement of gate leakage IG, drain current ID and source
current IS in the pH7-standard solution using HP 4156B. The
purpose of the leakage current measurements is to check the
quality of the sensors. By measuring a constant voltage VDS
of 0.3 V is applied between source and drain. Between gate
and ground the voltage VG is varied from 0 to 2 V in steps of
0.1 V and the IS, ID and IG are recorded.
Three pH buffers are used for characterization of
sensitivity. It begins with the measurement of pH4 solution.
Like the leakage current characterization a constant VDS of 0.3
V is applied with variation of VG from 0 V to 2 V. Before
measuring in the next solutions, pH7 and pH10, the sample is
then rinsed with deionized water and dried with paper wiper.
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The sensitivity is calculated from the shift of VG at the same ID
with respect to the change in pH values.
Figure 2. Interface circuit applies both constant VDS and IDS to sensor.
Figure 3 Result of a leakage current measurement at VDS=0.3V, and sweep
VG from 0 to 2 V in steps of 100mV.
For the implementation of the pH meter, the response
time and the memory effect are also studied here. It
corresponds to the reliability of the system. In order to
characterize the sensor, the sensor is connected with an
interface circuit. At the operation point the circuit supplies
VDS of 0.3 V and IDS of 10 A and the VO were recorded for
the period of 3 minutes with the following steps: pH 4, 7, 10,
7 and 4. Furthermore, the sensor is immersed in pH 7 for 10
hours to reveal long time drift behavior.
III.
RESULTS AND DISCUSSION
A. Sensors characterization
1.
Leakage current measurement
Fig. 3 shows the current response of a sensor with a gate
length (L) of 4000 m and a gate width W of 10 m by the
leakage current measurement. Very low gate leakage current
(less than 50 pA at VG 2 V) is achieved, hence the other curves,
ID and IS, are not affected from the leakage current and
virtually symmetrical about the VG axis. From the result it
indicates that the sample has the ISFET properties, good
encapsulated and can be used for the further characterization.
2. Sensitivity
In Fig. 4 the currents of ISFET with L = 10 m and W = 3200
m is illustrated. In different buffers, IDS are separated
obviously due to the threshold voltage drift. The drift is
caused by ion-sensitive of the electrode-liquid-oxide interfaces
[7][8]. The sensitivity is specified from the varying of VG at
the same IDS in different pH buffers. From the sample in Fig.
4 the sensitivity varies linearly with 55 mV/pH at 10 A.
Various ISFETs are characterized and the range of sensitivity
is 40-50 mV/pH under the same bias condition.
Figure 4 ID curves in different pH buffers and inset shows the sensitivity of
the ISFET.
B. Sensors characterization
1.
Memory effect
At operating point, the interface circuit is set to supply a
constant current IDS of 10 A and voltage VDS of 0.3 V. In
order to characterize the ISFET, the ISFET is immersed in the
following buffers; pH4, 7, 10, 7, and 4, respectively. Fig. 5
illustrates the output voltage VO of a sample with L = 10 A
and W = 4000 A. Whatever solution into which the ISFET is
immersed , VO reaches stable value after immersing for a few
seconds. This indicates fast response time of the sensors.
From the same measurement the accuracy of the sensor can be
also defined. The inset of Fig. 5 shows the response of the
sensor as function of different pH values. A small voltage
drift can be observed only. The discussions of the hysteresis
behavior is detailed by Bousse et al.[9]. This very small drift
corresponds to the high accuracy of the sensors. From the plot
the sample shows a voltage drift of 5 mV at pH 4. By the
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sensitivity of 50 mV/pH the drift corresponds to the
measurement accuracy of 0.1 pH.
IV. CONCLUSION
The ISFET were fabricated by CMOS compatible process.
From the characterization the sensitivity of pH sensors is 4050 mV/pH. In the prototype implementation, constant IDS of
10 A and a constant VDS of 0.3 V are supplied to the sensors.
The system shows the measurement accuracy of 0.1 pH. The
long time drift behavior is negligible.
ACKNOWLEDGMENT
The authors would like to thank TMEC pilot line for
processing the devices and MEMS and Nanotechnology group
at National Electronics and Computer Technology Center for
the access to the bond wire tool
Figure 5 VO of the interface circuit in different buffers and the inset shows
VO-pH behavior of the ISFET.
REFERENCES
[1]
2.
Drift behavior
Fig. 6 shows the 10 hours record of VO in pH 7. From the
fitting line the voltage drifts with the rate of 1 mV/h.
Compared to the accuracy of the sensors, the long time drift
behavior can be neglected by the measurement.
[2]
[3]
[4]
[5]
[6]
[7]
[8]
Figure 6 VO as the function of time in pH7 buffer
[9]
P. Bergveld, “Development of an ion-sensitive solid-state device for
neurophysiological measurement,” IEEE Transactions on Electron
devices, Vol. BME-17(1), pp. 59-63, 1970
P. Bergveld, “Development, operation, and application of the IonSensitive Field Effect Transistor as a tool for electrophysiology,” IEEE
Trans. Biomed. Eng., Vol. BME-19(5), pp. 342-351, 1972
P. Bergveld, “Future applications of ISFETs,” Sensor and Actuators B,
Vol. 4, pp. 125-133, 1991
S.-S. Jan, J.-L. Chiang, Y.-C. Chen, J.-C. Chou and C.-C. Cheng,
“Characteristics of the hydrogen ion-sensitive field effect transistors
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205-216, 2002.
W. Jeamsaksiri, W. Bunjongpru, N. Atthi, K. Upracoat, C. Hruanun, and
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W. Bunjongpru, W. Jeamsaksiri, K. Upracoat, O. Trithaveesak, C.
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L. Bousse, N.F. de Rooij and P. Bergveld, “Operation of chemically
sensitive field effect sensors as a function of the insulator-electrolyte
interface,” IEEE Transactions on Electron Devices, Vol. ED-30 (10), pp.
1263-1270, 1983.
S.D. Moss, C.C. Thomson and J. Janata, “Hydrogen, calcium, and
potassium ion sensitive FET transducers: A preliminary report,” IEEE
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L. Bousse S. Mostarshed, B. van der Schoot and N.F. de Rooi,
“Comparison of the hysteresis of Ta2O5 and Si3N4 pH-sensing
insulators,” Sens. Actuator B, Vol. 17(2), pp. 157-164, 1994.
ECTI-CON 2007
The 2007 ECTI International Conference
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