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Development of a Digital Temperature Transducer ASIC in a 28 nm FD-SOI CMOS Process for a Spaceborne Low Power Sensor Bus P. P. Boraa, M. Ronerb, D. Borggrevea, A. Hurnib, E. Isaa, L. Maurerc aFraunhofer EMFT, Munich, Germany bOHB System AG, Oberpfaffenhofen, Germany cUniversität der Bundeswehr, Neubiberg, Germany 13.06.2016 This work is funded through project THINGS2DO under the ENIAC grant agreement number 621221 and the national grant agreement number 16ES0240. © Fraunhofer Agenda Background 28 nm FD-SOI Technology System Requirements System Description Demonstrator Conclusion © Fraunhofer 2 Agenda Background 28 nm FD-SOI Technology System Requirements System Description Demonstrator Conclusion © Fraunhofer 3 Background Housekeeping in Geostationary Satellites where the satellite is pointing which parts are working properly what its temperature is °C Importance of temperature sensing Large temperature difference Image Courtesy: NASA To support the onboard Thermal © Fraunhofer Control System Temperature requirements of equipments for reliable operation 4 Source: spac0255, NOAA In Space Collection Housekeeping Data tells: Sensor F Sensor C A Sensor G Background Sensor Interrogator Sensor I Sensor H Conventional vs Serial Sensor Network Current Star Topology Sensor B Sensor A Sensor D Sensor B Sensor E Sensor A Sensor F Sensor C Sensor G Sensor Interrogator Future Bus Topology Sensor I Sensor H Conventional Network FutureSensor Bus Topology Star Sensor topology Sensor D B Sensor Lot of cables A Extra weight Inflexible for future Sensor © Fraunhofer Interrogator Sensor I Sensor F Sensor C Sensor G Sensor Interrogator Sensor I Sensor H Digital Temperature Transducer ASIC in 28 nm FD-SOI Hybrid Bus topology Sensor E Serial Bus line: reduction in wiring Electrical and fiber optical sensor network Sensor G Sensor H Sensor E Future Sensor Bus System Sensor F Sensor C Sensor D 5 Agenda Background 28 nm FD-SOI Technology System Requirements System Description Demonstrator Conclusion © Fraunhofer 6 28 nm FD-SOI Technology Process Features Characteristics [1] Source Fully Depleted Silicon Film Low Cds and Ileakage High Speed (LVT, Forward BB) Low leakage (RVT, Reverse BB) High Body-biasing tuning range and sensitivity [3] Robust against latch-up Front Gate Drain Gate Oxide 7 nm 25 nm Buried Oxide (BOX) Well Back Gate [2] Radiation tolerance Image ©STMicroelectronics Thin front oxide Reduced sensitive volume Robust against SEL High TID tolerance due to 25 nm BOX Bulk CMOS versus FD-SOI CMOS Ionizing Particle Ionizing Particle BOX Bulk transistor [1] S. Shopov, S.P. Voinigescu, "Characterization of the High Frequency Performance of 28-nm UTBB FDSOI MOSFETs as a Function of Backgate Bias", Compound Semiconductor Integrated Circuit Symposium (CSICs), 2014 IEEE © Fraunhofer [2] http://cmp.imag.fr/documents/doc/UTBB-FDSOI%20Design%20and%20Migration%20Methodology_.pdf [3] S. Le Tual et al, “A 20GHz-BW 6b 10GS/s 32mW Time-Interleaved SAR ADC with Master T&H in 28nm UTBB FDSOI Technology”, ISSCC2014 7 FD-SOI transistor Agenda Background 28 nm FD-SOI Technology System Requirements System Description Demonstrator Conclusion © Fraunhofer 8 System Requirements Temperature Range -40 °C to +125 °C Accuracy ±1 °C in [-20 °C, +20 °C] and ±3 °C outside Measurement Resolution 0.1 °C ADC Resolution ≥ 11 bits SEU LET threshold ≥ 20 MeV∙cm²/mg TID tolerance ≥ 300 krad Interface type Serial (I2C) Lifetime 15 years in-orbit operation © Fraunhofer 9 Agenda Background 28 nm FD-SOI Technology System Requirements System Description Demonstrator Conclusion © Fraunhofer 10 System Description Sensor Core Timing and Control VREF Vin+ Signal Conditioning circuit Analog Decimation ∑Δ Modulator MUX Filter Vin- + VPTAT ‒ ADC + ‒ ΔVBE+ + VBE2 VBE1 ‒ ‒ + µ VREF Temperature sensing concept © Fraunhofer . . . . Digital Interface .. VREF = VBE2 + VPTAT m·I1 Voltage (V) I1 Serial I/O External sensor Inputs from VPTAT Biasing Address Temperature Transducer ASIC Clock Block Diagram 11 VBE2 VPTAT = α . (VBE2 - VBE1) -40 +125 Temperature (°C) System Description Radiation Hardening System-level Circuit-level • Optimal transistor sizing • Offset-compensation • Back gate biasing • Redundancy techniques FF1 Input FF2 Voter Output FF3 Image ©STMicroelectronics Device-level Layout-level • FD-SOI CMOS technology • Placement of guard-rings Cell Image ©STMicroelectronics © Fraunhofer VSS 12 Agenda Background 28 nm FD-SOI Technology System Requirements System Description Demonstrator Conclusion © Fraunhofer 13 Demonstrator AMBER1: Top Level Developed under THINGS2DO project 1800 µm Aim: Validate core design components ∑∆ Validate process features (Body-biasing, Passive devices) BGR DCO SAR LNA 1.0 V (Core) and 1.8 V (I/O) Supplies T. Line Features design blocks for: DAC Mixer ∑∆ Modulator, SAR ADC, DAC, LNA, DCO, Mixer, Transmission line, Band Gap Reference. © Fraunhofer 1800 µm 92 pins, QFN 100 package 14 Demonstrator Sigma-Delta Modulator Modulator: 159 µm Operation voltage 1.0 V (nominal) ∑∆ Modulator Fully-differential 1st order, discrete time Modulator Output Vin+ 1-bit quantization - 249 µm Bandwidth = 500 Hz fsampling = 200 kHz Symmetrical Layout OTA Operational Transconductance Amplifier DC Gain = 65 dB Gain Bandwidth = 20 MHz © Fraunhofer 15 Demonstrator Sigma-Delta Modulator VREF- VREF+ CLK ϕ2.BS- Vin + - ∑ + - ∫ + Vin Dout - ϕ1 ϕ1 ϕ2 VCM ϕ1 Cs ϕ2.BS+ ϕ2 CCDS CCDS - + -25 - BS+ ϕ1 + Ci Current-mirror OTA [2] Input Amplitude 1.0 VPP (½ Full Scale) ENOB 7.14 bits SINAD 44.78 dB SNR 64.94 dB SFDR 44.82 dB Power 64 µW (1.0 V Supply) -50 - -75 - 102 Bandwidth = 500 Hz 103 104 - - - - -125 10 - ---100 - 105 (Hz) [1] Enz, Christian C., and Gabor C. Temes. "Circuit techniques for reducing the effects of op-amp imperfections: autozeroing, correlated double sampling, and chopper stabilization." Proceedings of the IEEE 84.11 (1996): 1584-1614. © Fraunhofer 16 [2]Roh, Jeongjin, et al. "A 0.9-V 60-μW 1-bit fourth-order delta-sigma modulator with 83-dB dynamic range." SolidState Circuits, IEEE Journal of 43.2 (2008): 361-370. Dout BS- ϕ1 Correlated-double Sampling (CDS) [1] f_in = 121.07 Hz Dynamic Comparator with latch [2] ϕ1 VREF+ VREF- 0 -6 - Power (dB) ϕ2.BS+ Cs ϕ2.BS- DAC ϕ1 C i Agenda Background 28 nm FD-SOI Technology System Requirements System Description Demonstrator Conclusion © Fraunhofer 17 Conclusion Digital Temperature Transducer ASIC: Sensing, data-conversion and communication 28 nm FDSOI CMOS Process: Reduced parasitics, back-gate biasing, good radiation tolerance System Requirements: Up to ±1 °C accuracy in [-20 °C, +20 °C] with 0.1 °C resolution Demonstrator: AMBER1 IC ∑∆ Modulator:1st order, discrete-time, correlated double sampling Next Steps: Validate 1st order ∑∆ Modulator on AMBER1 IC Integrate sensor core and digital circuitry Outlook: Digital intensive design: exploit low-power features of 28 nm FD-SOI CMOS process Further integration of components for space applications based on FD-SOI © Fraunhofer 18 THANK YOU © Fraunhofer