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The Devices
Jan M. Rabaey
Digital Integrated Circuits
Devices
© Prentice Hall 1995
Goal of this chapter
• Present intuitive understanding of device operation
• Introduction of basic device equations
• Introduction of models for manual analysis
• Introduction of models for SPICE simulation
• Analysis of secondary and deep-sub-micron
effects
• Future trends
Digital Integrated Circuits
Devices
© Prentice Hall 1995
The MOS Transistor
Gate Oxyde
Gate
Source
Polysilicon
n+
Drain
n+
p-substrate
Field-Oxyde
(SiO2)
p+ stopper
Bulk Contact
CROSS-SECTION of NMOS Transistor
Digital Integrated Circuits
Devices
© Prentice Hall 1995
Cross-Section of CMOS
Technology
Digital Integrated Circuits
Devices
© Prentice Hall 1995
MOS transistors
Types and Symbols
D
D
G
G
S
S
NMOS Enhancement NMOS Depletion
D
D
G
G
S
S
PMOS Enhancement
Digital Integrated Circuits
B
Devices
NMOS with
Bulk Contact
© Prentice Hall 1995
Threshold Voltage: Concept
+
S
VGS
-
D
G
n+
n+
n-channel
Depletion
Region
p-substrate
B
Digital Integrated Circuits
Devices
© Prentice Hall 1995
The Threshold Voltage
Digital Integrated Circuits
Devices
© Prentice Hall 1995
Current-Voltage Relations
VGS
VDS
S
G
n+
–
V(x)
ID
D
n+
+
L
x
p-substrate
B
MOS transistor and its bias conditions
Digital Integrated Circuits
Devices
© Prentice Hall 1995
Current-Voltage Relations
Digital Integrated Circuits
Devices
© Prentice Hall 1995
Transistor in Saturation
VGS
VDS > VGS - VT
G
D
S
n+
Digital Integrated Circuits
-
VGS - VT
Devices
+
n+
© Prentice Hall 1995
I-V Relation
VDS = VGS-VT
Saturation
ID (mA)
VGS = 4V
1
0.0
VGS = 3V
1.0
2.0
3.0
VDS (V)
VGS = 2V
VGS = 1V
4.0
5.0
0.020
÷ID
Triode
Square Dependence
2
VGS = 5V
0.010
Subthreshold
Current
0.0
2.0
VT1.0
VGS (V)
3.0
(b) ID as a function of VGS
(for VDS = 5V).
(a) ID as a function of VD S
NMOS Enhancement Transistor: W = 100 m, L = 20 m
Digital Integrated Circuits
Devices
© Prentice Hall 1995
A model for manual analysis
Digital Integrated Circuits
Devices
© Prentice Hall 1995
Dynamic Behavior of MOS Transistor
G
CGS
CGD
D
S
CGB
CSB
CDB
B
Digital Integrated Circuits
Devices
© Prentice Hall 1995
The Gate Capacitance
Digital Integrated Circuits
Devices
© Prentice Hall 1995
Average Gate Capacitance
Different distributions of gate capacitance for varying
operating conditions
Most important regions in digital design: saturation and cut-off
Digital Integrated Circuits
Devices
© Prentice Hall 1995
Diffusion Capacitance
Digital Integrated Circuits
Devices
© Prentice Hall 1995
Junction Capacitance
Digital Integrated Circuits
Devices
© Prentice Hall 1995
Linearizing the Junction Capacitance
Replace non-linear capacitance by
large-signal equivalent linear capacitance
which displaces equal charge
over voltage swing of interest
Digital Integrated Circuits
Devices
© Prentice Hall 1995
The Sub-Micron MOS Transistor
• Threshold Variations
• Parasitic Resistances
• Velocity Sauturation and Mobility Degradation
• Subthreshold Conduction
• Latchup
Digital Integrated Circuits
Devices
© Prentice Hall 1995
Threshold Variations
VT
Long-channel threshold
Low VDS threshold
L
Threshold as a function of
the length (for low VDS)
Digital Integrated Circuits
Drain-induced barrier lowering
(for low L)
Devices
© Prentice Hall 1995
Parasitic Resistances
Polysilicon gate
LD
G
Drain
contact
W
VGS,eff
D
S
RS
RD
Drain
Digital Integrated Circuits
Devices
© Prentice Hall 1995
Velocity Saturation (1)
2
n (cm /Vs)
 n (cm/sec)
 sat = 10 7
constant velocity
Constant mobility (slope = )
Esat
E V/m)
700
250
0
EtV/m)

(b) Mobility degradation
(a) Velocity saturation
Digital Integrated Circuits
n0
Devices
© Prentice Hall 1995
Velocity Saturation (2)
1.5
0.5
VGS = 3
0.5
VGS = 2
VGS = 1
0.0
1.0
2.0
VDS
3.0
(V)
4.0
5.0
(a) I D as a function of VDS
ID (mA)
VGS = 4
I D (mA)
1.0
Linea r Dependence
VGS = 5
0
0.0
1.0
2.0
VGS (V)
3.0
(b) ID as a function of VGS
(for VDS = 5 V).
Linear Dependence on VGS
Digital Integrated Circuits
Devices
© Prentice Hall 1995
Sub-Threshold Conduction
102
ln(ID) (A)
104
Linear region
106
108
1010
10120.0
Digital Integrated Circuits
Subthreshold exponential region
VT 1.0
2.0
3.0
VGS (V)
Devices
© Prentice Hall 1995
Latchup
VD D
VDD
p
+
n
+
+
n
+
p
+
+
p
n-well
p-source
n
Rnwell
Rpsubs
n-source
p-substrate
(a) Origin of latchup
Digital Integrated Circuits
Rnwell
Devices
Rpsubs
(b) Equivalent circuit
© Prentice Hall 1995
SPICE MODELS
Level 1: Long Channel Equations - Very Simple
Level 2: Physical Model - Includes Velocity
Saturation and Threshold Variations
Level 3: Semi-Emperical - Based on curve fitting
to measured devices
Level 4 (BSIM): Emperical - Simple and Popular
Digital Integrated Circuits
Devices
© Prentice Hall 1995
MAIN MOS SPICE PARAMETERS
Digital Integrated Circuits
Devices
© Prentice Hall 1995
SPICE Parameters for Parasitics
Digital Integrated Circuits
Devices
© Prentice Hall 1995
SPICE Transistors Parameters
Digital Integrated Circuits
Devices
© Prentice Hall 1995
Fitting level-1 model for manual
analysis
Region of
matching
ID
Short-channel
I-V curve
VGS = 5 V
Long-channel
approximation
VDS = 5 V
VDS
Select k’ and  such that best matching is obtained @ Vgs= Vds = VDD
Digital Integrated Circuits
Devices
© Prentice Hall 1995
Technology Evolution
Digital Integrated Circuits
Devices
© Prentice Hall 1995
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