Survey
* Your assessment is very important for improving the work of artificial intelligence, which forms the content of this project
* Your assessment is very important for improving the work of artificial intelligence, which forms the content of this project
FUTURE NANOELECTRONIC DEVICES AND THEIR APPLICATIONS Larry Cooper Arizona State University Future Directions in CAS: A Day of Brainstorming May 27, 2005, Kobe, Japan NANOELECTRONIC DEVICES AND THEIR APPLICATIONS BASIC CONCEPT LOW POWER (1000X) + HIGH SPEED (100X) +ARCHITECTURE =NEW FUNCTIONALITIES “BEYOND SILICON” “BEYOND SILICON” COMPOUND SEMICONDUCTORS FERROMAGNETIC METALS AND SEMICONDUCTORS _________________ DEVICES ARE IN THE EXPLORATORY PHASE A MEASUREABLE PROPERTY IS OBSERVED WHICH CAN BE CONTROLLED WITH CURRENTS, VOLTAGES OR MAGNETIC FIELD HOW DOES DIMENSIONAL SCALING AFFECT OUTPUT? DOES SCALING IMPROVE OPERATING TEMPERATURE? HOW LARGE ARE THE CURRENTS, VOLTAGES, ETC. AND IS DISSIPATION AND HEATING CRITICAL? WHAT ARE THE BEST MATERIALS? WHAT ARE THE BEST CIRCUIT ARCHITECTURES? CAN THEY BE MANUFACTURED COST EFFECTIVELY? IS IT WORTH THE EFFORT??? FUTURE APPLICATIONS (MY VISION) “INTELLIGENT” SENSORS NONVOLATILE-REPROGRAMMABLE COMPUTER >REPLACE: FPGA and ASIC >INSTANT ON COMPUTER MOBILE COMPUTING AND COMMUNICATIONS BIO-MEDICAL IMPLANTS >MONITORING OF PATIENT FUNCTIONS >NEURAL PROSTHESES >ARTIFICIAL RETINA AUTONOMOUS “SMALL” ROBOTS HIGH SPEED DIGITAL SIGNAL PROCESSING (FASTER & COOLER) SUPERCOMPUTING MULTIFUNCTIONAL SYSTEMS NANOELECTRONIC AND NANOMAGNETIC DEVICES RESONANT TUNNELING DIODES (RTD) NANOWIRE TRANSISTORS (NW) MAGNETOELECTRONIC DEVICES NANOMAGNETIC DEVICES SPINTRONIC DEVICES SINGLE ELECTRON TRANSISTORS (SET) QUANTUM DOTS (QD) CARBON NANOTUBE TRANSISTOR (CNT) MOLECULAR SWITCHES AND TRANSISTORS QUANTUM COHERENCE DEVICES PROPERTIES OF INTEREST ULTRA LOW POWER DISSIPATION BATTERY LIFE HIGH DENSITY CIRCUITS COOLER CIRCUITS HIGH SPEED DEVICE SWITCHING CIRCUIT ARCHITECTURES-PARALLEL COMPUTING CIRCUIT COMPACTNESS 3 DIMENSIONAL INTEGRATION MULTIFUNCTIONALITY NONVOLATILITY SEMICONDUCTOR NANOWIRES WHY? LOW CURRENTS ALL SEMICONDUCTORS AND MANY OTHER MATERIALS DIFFERENT HETEROJUNCTION DEVICES GROW ON ANY SUBSTRATE PERFECT INTERFACES (LESS SCATTERING AND OTHER LOSS) SIZE CONTROL (> 10 NANOMETERS) ISSUES? DEVELOP NEW TECHNOLOGY CIRCUIT DESIGNS AND NEW ARCHITECTURES MATERIALS FLUCTUATION (IMPURITIES) RESONANT TUNNELING DIODE WHY RESONANT TUNNELING DIODES? INTRINSIC SWITCHING SPEED IS OVER 3 TERAHERTZ NONLINEAR I-V CHARACTERISTIC FEWER DEVICES IN CIRCUIT IMPLEMENTATIONS (THAN CMOS) LOW POWER DISSIPATION VERSATILE FUNCTIONALITY-PERFORMS ALL DSP FUNCTIONS PROVEN WAFER SCALE FABRICATION TEMPERATURE INSENSITIVE HIGH SPEED DSP CIRCUITS-50 GHZ HYBRID DEVICE-RTD / HEMT (InGaAs/InP) 50 FEMTOSECOND PHASE NOISE CLOCKS POSSIBILITY OF THREE TERMINAL DEVICE PHOTOSENSITIVE RESPONSE 100 Nanometer Diameter First implementation of a 1D heterostructure nanoelectronic device in a nanowire as a double-barrier resonant tunneling diode (DBRTD) in InAs with InP barriers. 3 TERMINAL RTD PERMEABLE BASE-RTD SINGLE ELECTRON TRANSISTORS WHY? VERY LOW POWER HIGH DENSITY CIRCUITS MEMORY CIRCUITS DEMONSTRATED ISSUES: OPERATING TEMPERATURE CONTROL OF DIMENSIONS AND MATERIALS ELIMINATION OF SPURIOUS CHARGES PROBLEMS COMPLEXITY OF INTERCONNECTS CLOCKING OF SIGNALS ACROSS THE CIRCUITS DEVICE TO DEVICE VARIATIONS TEMPERATURE OF OPERATION CNN-UNIVERSAL MACHINE IMAGE PROCESSING COMPUTER PROGRAMMABLE IMAGE PROCESSING COMPUTER ON A CHIP 2 D ARRAY OF PROCESSING ELEMENTS HIGH LEVEL PROGRAMMING LANGUAGE ON-CHIP A/D AND D/A IMAGE FUSION CURRENT PROJECTS: MULTI-LEVEL CNNs INTEGRATION OF FOCAL PLANE ARRAYS ON CNN CHIP EXPLORING NEW APPLICATIONS & ALGORITHMS TACTILE SENSING FACIAL RECOGNITION AUTONOMOUS ROBOTS REAL-TIME IMAGE PROCESSING FOR MEDICAL IMAGING, COLLISION AVOIDANCE, OTHERS Template configurations I: Spatial feedback xij - state/ yij - output X2 (self) x2 x2 x2 z- bias (space invariant) zij - bias uij - input a 11 a 10 a 11 A a01 a00 a01 , a11 a10 a11 0 0 0 B 0 b00 0, 0 0 0 z1 i0 , z ij iij . Comparison of different CNNUM solutions Clock frequency Feature size chip area [cm2] number of physical processing element Cascadability Dissipation 3*3 convolution Erosion/ Dilation Laplace (15 iterations) Pentium IV Intel Itanium TMS 320C6 X VIRTEX XCV300 VIRTEX XCV6000 CASTLE With pipeline 64*64 CNN-UM 128*128 CNN-UM IBM 10 TeraOps 2GHz 1.5 GHz 1.2GHz 200MHz 200MHz 1/10MHz 32MHz 700MHz 0.13 µm 1.27 1 0.13 µm 3.74 1 0.12 µm 1.1 1 0.22 µm 1.2 < 12 (2bits) 200/400 MHz 0.15 µm 3.5 < 12 (2bits) 0.35 µm 0.68 3*2 0.5 µm 1 4096 0.35 µm 1.45 16384 0.18 µm 6.9468 m2 65536 no 50 W no 130 W no 1W yes 1.8 W yes 3W yes < 0.8 W yes 1.3 W yes <4W 140 110 16.384 41 (6 bit) 20 (6 bit) 10.6 1.749 270 220 32.768 82 (6bit) 41 (6bit) 10.6 1.749 3.18 2000 1560 245.7 615 307 2.67 (12 bit) 1.34 (6 bit) 5.34 (12 bit) 2.67 (6 bit) 39.6 (12 bit) 19.8 (6 bit) no 491.520 kW 3.18 11.5 1.8975 3.45 Picture size: 128pixel*128 pixel Running times in microsec RTD BASED CNN UTILIZE THE NONLINEAR CHARACTERISTIC OF RTD USE RTD AS SOURCE CONTACT OF HEMT CIRCUIT MODELING USING Q-SPICE NANOMAGNETICS LOW POWER-NONVOLATILE ELECTRONICS INTEGRATION OF HIGH DENSITY MEMORY WITH CPU REPROGRAMMABLE LOGIC MAGNETIC LOGIC ELEMENTS SINGLE DOMAINS IN MAGNETIC NANOWIRES HIGH DENSITY MEMORY Hybrid Hall Effect Device AFM of f = 500 nm prototype Ferromagnetic element (nonvolatile states) V+ I+ V negative bistable ferromagnetic film V- nonconductive region; radiation damage by FIB Mark Johnson, NRL Physical principle I- Materials: III-V’s (e.g. InAs, GaAs) and SOI Output: 30 mV (typ.) Write: pulsed I in write wire Read: fringe-field Hall effect Iw Integrated operation I- I+ Write B wire TOP VIEW A C Bilayer F film; 2 bits / cell, NDRO • 2 F elements stacked • Each with a different moment, switching field 60 nm FeCo 75 nm Py 90 nm SiO2 Write: 2 unique values of switching field Read: 4 discrete output values 8 RH (Ohms) 6 4 2 0 -200 0 H (Oe) 200 Nonvolatile Gates: New paradigms for Reprogrammable Logic • Begin with existing, inflexible Field Programmable Gate Array (FPGA) architecture – Use Nonvolatile HHE devices for Look Up Tables (LUT) in each cell and for switches that interconnect cells – Result is highly flexible Reprogrammable Gate Arrays • Dynamically Reprogrammable Boolean Gates – Use 3 input terminals - A, B and Control (C) - and 2 clock cycles – Control pulse dynamically determines one of the four basic Boolean operations: AND, OR, NAND or NOR – Result is latched for next, asynchronous logic step – Control pulse is part of data stream: Permits remote programming • HHE Nonvolatile gates are also memory cells – Integration of logic and memory is automatically achieved – Chip sectors can be continuously apportioned to memory or logic – Chip can be continuously (and remotely) reprogrammed for new functions MRAM >BASED ON GIANT MAGNETORESISTANCE EFFECT IN MULTILAYER METAL FILMS >USE OF TUNNELING MAGNETORESISTANCE FOR LARGER EFFECTS >INTEGRATED NON-VOLATILE SRAM >STAND ALONE HIGH DENSITY MEMORY FET is used for read-addressing. One FET per bit is required. Vertical GMR Memory Design: A memory cell 1.0 Normalized GMR hard magnetic layers soft magnetic layers 0.5 0.0 -0.5 -1.0 -60 -40 -20 0 20 40 Sense Current (mA) M M bit line Nanomagnetic memory: Performance improves as magnetic element shrinks in size 60 Vertical GMR Memory (VMRAM) Jimmy Zhu, Carnegie Mellon University A memory cell paired word lines bit line bit line Ring shaped vertical GMR memory stack Magnetic Switching Speed read: 2x0.4 ns 1.0 I I Ibit Normalized GMR Output paired word lines 0.5 0.0 write: 0.8ns -0.5 -1.0 I I One possible chip layout 0.0 0.2 0.4 0.6 0.8 1.0 Time (ns) 1.2 1.4 1.6 Energy Density ( erg/cm3) Ultimate Density 4x10 6 3x10 6 D=1/(4l2) C ir c u la r M a g n e tiz a tio n L in e a r M a g n e tiz a tio n dc = 10 nm 2x10 6 1x10 6 M 0 5 10 15 20 25 30 Inner Diameter d (nm) Ultimate density 400 Gbits/in2 or 63 Gbits/cm2 M NiFeCo 15Å SPIN MOMENTUM TRANSFER N F1 N F2 N N F1 N F2 N N = normal metal layer F1 = fixed ferromagnetic layer – spin polarizer F2 = “free” ferromagnetic layer – excitable nanomagnet V+ Au I+ ~40 nm Insulator Free Fixed VNanopillar device Katine et al. (Cornell) Cu Nanocontact device Rippard et al. (NIST) I- Advantages of Spin-Current-Switched MRAM Over Field-Switched MRAM magnetic-field switching potential spin-transfer switching • Spin transfer gives stronger torques per unit current than for magnetic fields, in devices smaller than about 250 nm. • Improved write margin: short-range forces. • Improved density and reduced process adder (1-2 masks instead of 3-5). • Excellent scaling to small sizes -- switching currents can be minimized while maintaining magnetic anisotropy barriers for thermal stability Requirements for an effective spin switched MRAM Bit: 1 Optimizing to allow smaller currents (0.1-0.2 mA) for switching of stable nanomagnets 2. Higher impedances (~1-10 kΩ) to be compatible with readout by silicon electronics. 3 Manufacturable – process margins. Dense, fast, non-volatile memory – low power and high performance embedded Alternative Spin Transfer Device Reversible Domain Wall Displacement Domain wall drag D.W. M L. Berger, B Amer. Phys. Soc. 17 571 (1972) At sufficiently high bias currents domain wall will be dragged by the current M Freitas & Berger , J Appl Phys 57 1266 (1985) Electron Flow SEM and MFM (b) of domain wall device. Domain wall is trapped in the left constriction Low Ic Grollier et al. APL 83 509 (2003) Tsoi et al. APL 83 2617 (2003) Speed? Scalability? Thermal stability for high density memory? Quantum-Dot Cellular Automata A Quantum-Dot Cell Represent 2 extra electrons binary information by charge An Array of Cells configuration Neighboring cells tend to A cell with 4 dots align due to direct Coulombic coupling Magnetic QCA Magnetic nanopillar as bistable switch: Due to shape anisotropy there is a typically few hundred room-temperature kT energy barrier between the two stationary states. Assigning logic values: ‘0’ ‘1’ QCA – idea: ground state depends on the state of the neighbors: Different geometry logic operations different University of Notre Dame Ground state Metastable state Center for Nano Science and Technology The Nanomagnet Wire and Inverter Magnetic Force Microscopy Image: Micromagnetic Simulation of a six-dot chain 1.5μm Physical basis: Antiferromagnetic coupling between single–domain dots Logic equivalent Adiabatic Switching of the Nanowire H ext 0.5μm Input dot: retains its magnetization t Clocked Operation Output block Input block CMOS preprocessor circuits Input realization CMOS postprocessor circuits Integrated Nanomagnet Logic Output realization Information flow Concept of edge-driven computing: Only dots on the edge of the structure are accessed individually Magnetic QCA − a system built on majority logic Input 1 Input 3 Input 2 Output ‘Central dot’ Input 1 Input 2 Input 3 Output 1 0 0 0 1 0 1 1 1 1 0 1 1 1 1 1 0 0 0 0 0 0 1 0 0 1 0 0 0 1 1 1 Input 2 OR Input 3 Input 2 AND Input 3 POSSIBLE NANODEVICE ARCHITECTURES EDGE DRIVEN COMPUTERS PIP-PROPAGATED INSTRUCTION PROCESSOR QCA-QUANTUM CELLULAR AUTOMATA MQCA-MAGNETIC QUANTUM CELLULAR AUTOMATA CNN-CELLULAR NONLINEAR NETWORK FIELD REPROGRAMMABLE GATE ARRAY MULTIVALUE LOGIC/MULTIVALUE MEMORY 3 DIMENSIONAL MULTIFUNCTIONAL PROCESSORS PARALLEL COMPUTING END Semiconductor Spintronics Resonant Interband Tunneling Diode AlSb Ferromagnetic Semiconductor p - GaMnSb AlSb GaMnSb Ef InAs InAs Ec Electrons tunnel through SPIN-POLARIZED valence band states of quantum well Ev • bias dependent spin-polarized source • gated RITD (with polarized emitter) Jonker RTD / GMR Hybrid Devices exchange coupled GMR resistor RTD H input 60 30 RITD 20 um 3.4 HIGH LOW 30 20 10 um Resistance ( ) 40 - sat / sat = 28 % 25 3.2 20 15 3 10 2.8 10 5 0 2.6 0 0.1 0.2 0.3 0.4 0.5 Voltage (V) 0.6 0.7 R/R (%) Current (mA) 50 Ho = 80 Oe 0.8 0 -1 -0.5 0 0.5 dR/R= 28% 1 Applied Field (kOe) T = 300 K May 2000 RTD - GMR Hybrid MOnostable-BIstable Logic Element – MOBILE Maezawa & Mizutani (1993) MOBILE INVERTER RTD-FET Logic Cell Chen et al, IEEE Elec. DeviceLett. 16, 70 (1995) Bias Voltage (Clock) RTD - Large Input Voltage FET Bias Output RTD - Small Input Output Fast, low component count cell for logic, digital signal processing High (1) 0V Low (0) Jonker Device opportunity: spintronic currents without injection Bias M Write Read Fabricated prototype device structure integrating electronics, magnetics, and photonics… SPINTRONICS ELECTRON SPIN CONTROLLED ELECTRONICS ULTRA-LOW POWER MULTIFUNCTIONAL DEVICES HIGH SPEED ISSUES: MATERIALS (LOW OPERATING TEMPERATURE) MOBILITY NEED ELECTRON INJECTION (May be useful for optical applications, I.e. THz switching and modulation) (Electron spin control for quantum information processing) MATERIALS-BEYOND SILICON CMOS III-V COMPOUND SEMICONDUCTORS HETEROJUNCITONS NANOWIRES FERROMAGNETIC METALS MAGNETOELECTRONICS MAGNETIC NANOWIRES-SINGLE DOMAINS MAGNETIC SEMICONDUCTORS SPINTRONICS SILICON/GERMANIUM CARBON NANOTUBES MOLECULAR SWITCHES Reprogrammable Logic: FRePGA • Need: nonvolatile switch, ME + FET • Then: FRePGA chip uses ME for LUT and interconnect switches • Programming of FRePGA is by software - NO ROM needed • ME is nonvolatile; values for LUT and interconnect switches are always there: Instant ON • Flexibility: Reprogrammable ME LUT – Hardware upgrade is by software – Reprogram blocks at any time by storing new values in ME LUT – Blocks can also be apportioned for use as nonvolatile RAM, as needed • ME cell size < SRAM so Block Density increases by 2x Xylink, Infineon