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SEMICONDUCTOR MEMORIES Digital Integrated Circuits Memory © Prentice Hall 1995 Chapter Overview • Memory Classification • Memory Architectures • The Memory Core • Periphery • Reliability Digital Integrated Circuits Memory © Prentice Hall 1995 Semiconductor Memory Classification RWM Random Access Non-Random Access SRAM FIFO DRAM LIFO NVRWM ROM EPROM Mask-Programmed E2PROM Programmable (PROM) FLASH Shift Register CAM Digital Integrated Circuits Memory © Prentice Hall 1995 Memory Architecture: Decoders Digital Integrated Circuits Memory © Prentice Hall 1995 Array-Structured Memory Architecture Problem: ASPECT RATIO or HEIGHT >> WIDTH AK AK+1 AL-1 Bit Line Storage Cell Row Decoder 2L-K Word Line M.2K Sense Amplifiers / Drivers A0 Column Decoder AK -1 Amplify swing to rail-to-rail amplitude Selects appropriate word Input-Output (M bits) Digital Integrated Circuits Memory © Prentice Hall 1995 Hierarchical Memory Architecture Row Address Column Address Block Address Global Data Bus Control Circuitry Block Selector Global Amplifier/Driver I/O Advantages: 1. Shorter wires within blocks 2. Block address activates only 1 block => power savings Digital Integrated Circuits Memory © Prentice Hall 1995 MOS NOR ROM Layout Metal1 on top of diffusion WL[0] GND (diffusion) WL[1] Polysilicon Basic cell 10 x 7 Metal1 WL[2] 2 WL[3] Only 1 layer (contact mask) is used to program memory array Programming of the memory can be delayed to one of last process steps Digital Integrated Circuits Memory © Prentice Hall 1995 MOS NOR ROM Layout BL[0] BL[1] BL[2] BL[3] Threshold raising implant WL[0] GND (diffusion) Basic Cell 8.5 x 7 Metal1 over diffusion WL[1] Polysilicon WL[2] WL[3] Threshold raising implants disable transistors Digital Integrated Circuits Memory © Prentice Hall 1995 MOS NAND ROM V DD Pull-up devices BL[0] BL[1] BL[2] BL[3] WL[0] WL[1] WL[2] WL[3] All word lines high by default with exception of selected row Digital Integrated Circuits Memory © Prentice Hall 1995 MOS NAND ROM Layout Diffusion Polysilicon Basic cell 5x 6 Threshold lowering implant No contact to VDD or GND necessary; drastically reduced cell size Loss in performance compared to NOR ROM Digital Integrated Circuits Memory © Prentice Hall 1995 Precharged MOS NOR ROM VDD pre Precharge devices WL[0] GND WL[1] WL[2] GND WL[3] BL[0] BL[1] BL[2] BL[3] PMOS precharge device can be made as large as necessary, but clock driver becomes harder to design. Digital Integrated Circuits Memory © Prentice Hall 1995 Characteristics of State-of-the-art NVM Digital Integrated Circuits Memory © Prentice Hall 1995 Read-Write Memories (RAM) • STATIC (SRAM) Data stored as long as supply is applied Large (6 transistors/cell) Fast Differential • DYNAMIC (DRAM) Periodic refresh required Small (1-3 transistors/cell) Slower Single Ended Digital Integrated Circuits Memory © Prentice Hall 1995 6-transistor CMOS SRAM Cell WL VDD M2 M4 Q M6 Q M5 M1 M3 BL Digital Integrated Circuits BL Memory © Prentice Hall 1995 CMOS SRAM Analysis (Write) WL VDD M4 Q=0 M6 Q=1 M5 M1 VDD BL = 1 BL = 0 2 2 VDD VDD VDD VDD k n M6 VDD – VTn ----------- – ---------- = k p M4 VDD – VTp ----------- – ---------- 2 2 8 8 kn M5 V VDD 2 V DD V 2 DD DD -------------- ---------- – VTn ----------- = kn M1 VDD – VTn ----------- – ---------- 2 2 2 2 8 Digital Integrated Circuits Memory (W/L)n,M60.33 (W/L)p,M4 (W/L)n,M5 10 (W/L)n,M1 © Prentice Hall 1995 CMOS SRAM Analysis (Read) WL VDD M4 BL Q= 0 M6 M5 Q=1 M1 V DD BL V DD V DD Cbit C bit kn M5 V VD D 2 VDD V 2 DD- – V ----------D D- = k V --------------- ---------------------- – ----------– V Tn 2 n M1 D D Tn 2 2 2 8 (W/L)n,M510 (W/L)n,M1 Digital Integrated Circuits (supercedes read constraint) Memory © Prentice Hall 1995 6T-SRAM — Layout M2 VDD M4 Q Q M1 M3 GND M5 M6 BL Digital Integrated Circuits Memory WL BL © Prentice Hall 1995 Resistance-load SRAM Cell WL VDD RL Q RL Q M3 BL M4 M1 M2 BL Static power dissipation -- Want RL large Bit lines precharged to VDD to address t p problem Digital Integrated Circuits Memory © Prentice Hall 1995 3-Transistor DRAM Cell BL1 BL2 WWL WWL RWL RWL M3 X M1 X M2 VDD -VT BL1 VDD BL2 VDD -VT CS V No constraints on device ratios Reads are non-destructive Value stored at node X when writing a “1” = VWWL -VTn Digital Integrated Circuits Memory © Prentice Hall 1995 3T-DRAM — Layout BL2 BL1 GND RWL M3 M2 WWL M1 Digital Integrated Circuits Memory © Prentice Hall 1995 1-Transistor DRAM Cell BL WL Write "1" Read "1" WL M1 X CS VDD VT GND VDD BL VDD/2 CBL sensing VDD /2 Write: CS is charged or discharged by asserting WL and BL. Read: Charge redistribution takes places between bit line and storage capacitance CS V = VBL – V PRE = V BIT – V PRE -----------------------C S + CBL Voltage swing is small; typically around 250 mV. Digital Integrated Circuits Memory © Prentice Hall 1995 DRAM Cell Observations 1T DRAM requires a sense amplifier for each bit line, due to charge redistribution read-out. DRAM memory cells are single ended in contrast to SRAM cells. The read-out of the 1T DRAM cell is destructive; read and refresh operations are necessary for correct operation. Unlike 3T cell, 1T cell requires presence of an extra capacitance that must be explicitly included in the design. When writing a “1” into a DRAM cell, a threshold voltage is lost. This charge loss can be circumvented by bootstrapping the word lines to a higher value than VDD . Digital Integrated Circuits Memory © Prentice Hall 1995 1-T DRAM Cell Capacitor Metal word line M1 word line SiO2 poly n+ Field Oxide n+ poly Inversion layer induced by plate bias Diffused bit line Polysilicon Polysilicon plate gate (a) Cross-section (b) Layout Used Polysilicon-Diffusion Capacitance Expensive in Area Digital Integrated Circuits Memory © Prentice Hall 1995 Periphery • Decoders • Sense Amplifiers • Input/Output Buffers • Control / Timing Circuitry Digital Integrated Circuits Memory © Prentice Hall 1995 Row Decoders Collection of 2M complex logic gates Organized in regular and dense fashion (N)AND Decoder NOR Decoder Digital Integrated Circuits Memory © Prentice Hall 1995 Dynamic Decoders Precharge devices GND GND VDD WL 3 WL 3 VDD WL 2 VDD WL 1 WL 2 WL 1 VDD WL 0 V DD A0 A0 A1 A1 Dynamic 2-to-4 NOR decoder WL 0 A0 A0 A1 A1 2-to-4 MOS dynamic NAND Decoder Propagation delay is primary concern Digital Integrated Circuits Memory © Prentice Hall 1995 A NAND decoder using 2-input predecoders WL 1 WL 0 A0A1 A0 A1 A0 A1 A0A 1 A 2A3 A2 A3 A2 A3 A2 A3 A1 A 0 A3 A2 A0 A1 A2 A3 Splitting decoder into two or more logic layers produces a faster and cheaper implementation Digital Integrated Circuits Memory © Prentice Hall 1995 4 input pass-transistor based column decoder A0 A1 2 input NOR decoder BL0 BL1 BL2 BL3 S0 S1 S2 S3 D Advantage: speed (tpd does not add to overall memory access time) only 1 extra transistor in signal path Disadvantage: large transistor count Digital Integrated Circuits Memory © Prentice Hall 1995 4-to-1 tree based column decoder BL0 BL1 BL2 BL3 A0 A0 A1 A1 D Number of devices drastically reduced Delay increases quadratically with # of sections; prohibitive for large decoders Solutions: buffers progressive sizing combination of tree and pass transistor approaches Digital Integrated Circuits Memory © Prentice Hall 1995 Sense Amplifiers make V as small as possible C V tp = ---------------Iav large small Idea: Use Sense Amplifer small transition s.a. input Digital Integrated Circuits Memory output © Prentice Hall 1995 Differential Sensing - SRAM VDD VDD PC BL VDD EQ VDD y M3 BL M1 x SE WLi M4 M2 y x x x M5 SE (b) Doubled-ended Current Mirror Amplifier VDD SRAM cell i y Diff. Sense x x Amp y y D D x x SE (a) SRAM sensing scheme. Digital Integrated Circuits y (c) Cross-Coupled Amplifier Memory © Prentice Hall 1995 Latch-Based Sense Amplifier EQ BL BL VDD SE SE Initialized in its meta-stable point with EQ Once adequate voltage gap created, sense amp enabled with SE Positive feedback quickly forces output to a stable operating point. Digital Integrated Circuits Memory © Prentice Hall 1995 Open bitline architecture EQ L1 R L0 R0 R1 L VDD SE BLL CS ... CS BLR CS SE dummy cell Digital Integrated Circuits CS ... CS CS dummy cell Memory © Prentice Hall 1995 DRAM Read Process with Dummy Cell V (Volt) 6.0 4.0 BL 2.0 BL 5.0 1 2 3 t (nsec) (a) reading a zero 4 5 6.0 4.0 V (Volt) 0.00 SE 3.0 2.0 EQ 1.0 0.00 V (Volt) WL 4.0 1 2 3 4 (c) control signals 5 BL 2.0 0.00 BL 1 2 3 t (nsec) 4 5 (b) reading a one Digital Integrated Circuits Memory © Prentice Hall 1995 Programmable Logic Array Product Terms x0x1 x2 AND PLANE OR PLANE f0 x0 Digital Integrated Circuits x1 f1 x2 Memory © Prentice Hall 1995 Pseudo-Static PLA GND GND GND VD D GND GND GND GND VDD x0 x0 x1 x1 x2 AND-PLANE Digital Integrated Circuits x2 f0 f1 OR-PLANE Memory © Prentice Hall 1995 Dynamic PLA A ND VDD GND OR O R AND VDD x0 x0 x1 x1 x2 AND-PLANE Digital Integrated Circuits x2 f0 f1 GND OR-PLANE Memory © Prentice Hall 1995 Clock Signal Generation for self-timed dynamic PLA AND Dummy AND Row AND AND OR Dummy AND Row OR (a) Clock signals Digital Integrated Circuits (b) Timing generation circuitry. Memory © Prentice Hall 1995 PLA Layout And-Plane VDD x0 x0 x1 x1 x2 x2 Pull-up devices Digital Integrated Circuits Memory Or-Plane GND f0 f1 Pull-up devices © Prentice Hall 1995 PLA versus ROM Programmable Logic Array structured approach to random logic “two level logic implementation” NOR-NOR (product of sums) NAND-NAND (sum of products) IDENTICAL TO ROM! Main difference ROM: fully populated PLA: one element per minterm Note: Importance of PLA’s has drastically reduced 1. slow 2. better software techniques (mutli-level logic synthesis) Digital Integrated Circuits Memory © Prentice Hall 1995 Semiconductor Memory Trends Memory Size as a function of time: x 4 every three years Digital Integrated Circuits Memory © Prentice Hall 1995 Semiconductor Memory Trends Increasing die size factor 1.5 per generation Combined with reducing cell size factor 2.6 per generation Digital Integrated Circuits Memory © Prentice Hall 1995 Semiconductor Memory Trends Technology feature size for different SRAM generations Digital Integrated Circuits Memory © Prentice Hall 1995