Download Diapositivo 1 - European Space Agency

Survey
yes no Was this document useful for you?
   Thank you for your participation!

* Your assessment is very important for improving the workof artificial intelligence, which forms the content of this project

Document related concepts

Tube sound wikipedia , lookup

Alternating current wikipedia , lookup

Mains electricity wikipedia , lookup

Opto-isolator wikipedia , lookup

Integrated circuit wikipedia , lookup

Power MOSFET wikipedia , lookup

History of the transistor wikipedia , lookup

Transistor wikipedia , lookup

CMOS wikipedia , lookup

Analog-to-digital converter wikipedia , lookup

Transcript
Design and Testing of a Radiation Hardened
13-bit 80 MS/s Pipeline ADC Implemented in
a 90nm Standard CMOS Process
B. Vaz, N. Paulino *, J. Goes *, M. Rodrigues, P. Faria,
R. Monteiro, N. Penetra, T. Domingues
Silicon and Software Systems Limited
* Also with Universidade Nova de Lisboa
Outline
•
•
•
•
•
•
•
Introduction
Circuit specifications
Architecture
Architecture optimization
Electrical design
Radiation hardening design procedures
Experimental results
Introduction
• High speed, high resolution ADCs are very important for
communication and imaging systems.
• In space applications the ADCs need to work in a harsh
environment, subjected to severe temperature variations
and high energy radiation effects.
• The objective is to develop and implement in silicon a
new high-speed high-resolution ADC that improves
linearity, energy-efficiency, cost and reliability for space
applications
ADC specifications
• Resolution of 13-bits and effective-number-of-bits (ENOB, e.g.
linearity) equivalent to 10.5-bits (un-calibrated mode);
• Sampling frequency (e.g. conversion speed) of 80MS/s;
• Energy-efficiency better than 0.7 pico-Joule per conversion
step;
• Standard 90nm 1-poly 8-metals CMOS manufacturing
process to lower costs and nominal operating voltage of 1.2V
(TSMC 90nm LP);
• Robustness of the custom designed mixed analogue-digital
sections against supply voltage variations, temperature
variations and space radiation effects;
AVDD
AVSS
BANDGAP
BIASING
DVSS
DVDD
IREF2
IREF1
To ADC
opamps
REFERENCE
BUFFERS
To ADC
Flash
VREFN
VREFP
VCM
Block diagram
AS1380abR
CB[1 : 0]
OPERATING
MODES
OM[3 : 0]
VINP
13 - BIT
ADC
S/H
VINN
DIGITAL
CORRECTION
CF
D[12 : 0]
DCKO
TIMING
CLKP
CLKN
CLK
CM[1 : 0]
AVSS
AVDD
DF
Pipeline ADC Architecture
vin
S/H
Stage
1
4-bits
Stage
2
Stage
3
2-bits
Stage
4
2-bits
Stage
5
2-bits
Stage
6
2-bits
Stage
7
2-bits
Sinchronization Logic
22-bits
Digital Correction Logic
13-bits
Dout
MDAC
vin j
vres j
G
Flash
ADC
DAC
M j  bits
vra j
S H
vout j
2-bits
Stage
8
Stage
9
2-bits
2-bits
Stage
10
2-bits
Architecture optimization
• The ADC architecture was optimized using a proprietary tool in
order to achieve the optimum power-efficiency for the target
performance specifications.
• The ADC architecture optimization takes into account the thermal
noise, the power dissipation, the differential non-linearity (DNL)
and the total ADC capacitance.
• The best architecture optimization resulted in an ADC with three
different pipeline stages and four different amplifiers.
• The optimizer provides another important set of design outputs
including:
– optimum values for the unit capacitances required in each stage;
– optimum values for the compensation capacitances required in each
stage;
– biasing currents to be used in the amplifiers;
– GBW specification for the amplifiers.
Electrical design (1)
• The selected amplifier topology uses a foldedcascode input stage followed by a differential-pair
second-stage.
• Enhanced cascode-compensation is used instead of
the conventional Miller compensation in order to
improve the bandwidth.
• The amplifiers are optimized using a proprietary
optimization tool. A key input to the system is a file
containing all relevant process technology
parameters which are specific to the chosen
fabrication technology.
• The specifications for each amplifier are obtained
during the architecture optimization.
Electrical design (2)
• The amplifier optimization takes into account the
following key opamp features:
–
–
–
–
–
–
–
low frequency gain
product gain-bandwidth
output swing
slew-rate
settling time
excess noise factor,
gate area.
• Furthermore, the optimization is performed considering
17 different design corners simultaneously
• The complete ADC is simulated in all the relevant
corners in order to verify the design
Radiation effects in CMOS technology (1)
• An ionizing particle or photon striking a CMOS circuit
results in the creation of electron-holes pairs.
• If the event occurs in doped silicon the resulting charge
will dissipate in a short time because of the low resistivity
of the material.
• If the energy of the ionization particle is very high, it can
cause the creation of a large amount of carriers within
the integrated circuit structure.
• This can result in an instantaneous large current known
as Single Event Effect (SEE), which can be further
divided into SEU (single event upset) and SEL (single
event latch-up).
Radiation effects in CMOS technology (2)
• When an electron-hole pair is created in the oxide, the
electron will disappear faster than the hole because the
mobility of the electron is much higher than the mobility
of the hole.
• The holes will tend to accumulate over time close to the
interface layer between the oxide and Silicon, resulting
in a positive charge that builds up over time. This is
know as the total ionization dose effect (TID).
Radiation effects in CMOS technology (3)
• TID Effects in the CMOS technology:
– The charge accumulation in the gate of a NMOS transistor
causes its Vt voltage to decrease.
– The charge accumulation in the gate of a PMOS transistor
causes the Vt voltage of the PMOS transistor to increase
– The charge build-up in the “bird's beak” regions around the
NMOS transistors causes two parasitic N channels to appear
and a current can flow between the drain and source of the
transistor.
– The charge build-up in the field oxide region can create an N
channel in the P substrate under the oxide and current can now
flow between two previously unconnected circuit nodes.
Radiation hardening design procedures (1)
• At an architecture level, the pipeline ADC architecture is
naturally robust to offset variations in the comparators
because it uses digital correction.
• Whenever possible the electrical design will use low
VDsat values in the transistors in order to have an extra
voltage margin to accommodate for Vt variations.
• The comparators are designed to have a low offset
voltage, also to accommodate the Vt variations.
• The circuits are biased using current mirrors which
compensates for the variation of the Vt voltages.
• The parasitic N channels that occur under the field oxide
can be interrupted using P+ guard rings connected to
ground.
Radiation hardening design procedures (2)
• The guard rings also improve the robustness of the
circuit to SEE, because they provide a path for the
carriers that are created by high energy particles, to
dissipate quickly and increase the resistance in the
parasitic NPNP structure making it harder for a latch up
to occur.
• Some key transistors use enclosed layout in order to
eliminate the parasitic N channels that appear on the
edges of the NMOS transistors (birds beak region).
• The foundry waved the DRC error caused by this
transistor layout. However, there is no electrical model
for this type of transistor.
Enclosed layout transistor
Chip Layout
ADC core area is only 0.66mm2
Experimental results (1)
• The radiation test of the ADC was performed by TRAD
• The measurement of TID effects in the performance
parameters of the ADC (TID total dose of 100 krad(Si)
was realized using 5 samples plus one reference.
– The test board and package used in these tests introduced a
performance degradation in the measured ADC parameters.
– The ADC was evaluated at a sampling frequency of 40 MHz.
• Three samples were irradiated with heavy ions with
energies from 1 to 70MeV.cm².mg-1 to verify for SEL
events.
Experimental results (2)
• In order to measure the performance of the ADC a dedicated 4 layer
PCB with the ADC die on the board connected using direct bonding
(Chip-On-Board technology) was used.
• The measured results using this board are the following (ADC
operating in un-calibrated mode):
VDD (V)
SFDR (dB) THD (dB)
SNR (dB)
SINAD (dB)
ENOB (bit)
1.1
68.320
-65.847
68.099
63.818
10.310
1.2
70.395
-65.696
67.891
63.646
10.280
1.3
67.034
-65.447
67.664
63.405
10.240
Reference voltage TID test results
DNL TID test results
SNR TID test results
THD TID test results
ENOB TID test results
SEL test results
No SEL observed during this test under a Xenon irradiation
(LET = 69.99 MeV.cm²/mg) with a total fluence equal to 1E+7 #/cm².
Conclusions
• The circuit is robust against SEL events.
• The TID test results indicate that the ADC
performance is not affected by the radiation.
• However the PCB board used in the TID test
introduced a significant performance
degradation (about 2 bits in the ADC ENOB).
• This degradation could mask some minor
radiation effects in the ADC performance.