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Baker Ch. 3 The Metal Layers
Introduction to VLSI
 Chapter 3
– The Metal Layers
•
•
•
•
•
Bond Pad
Design and Layout
Parasitics
DRC
Cross Talk, Ground Bounce
Joseph A. Elias, Ph.D. Adjunct Professor, University of Kentucky; Modeling Principal, Cypress Semiconductor
1
Baker Ch. 3 The Metal Layers

Bond Pad

Introduction to VLSI
DESCRIPTION
–
–
INTERFACE: CHIP TO WORLD
ESD PROTECTION
•
•
–
NECESSARY
MORE DETAILS LATER
SIZE DEPENDS ON USAGE
•
BOND PAD
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•
ETEST PAD
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•
SIZE SET BY MICRO-TIP
LOCATION
•
BOND PAD
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•
•
TOP METAL LAYER
ETEST PAD
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ALL ROUTING LAYERS
MICRO PAD
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–
SIZE SET BY PROBE CARD
MICRO PAD
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–
SIZE SET BY WIRE PROCESS
ANY ROUTING LAYER
PASSIVATION
•
•
MUST REMOVE TO PROBE
PAD.DG LAYER USED FOR MASK
Joseph A. Elias, Ph.D. Adjunct Professor, University of Kentucky; Modeling Principal, Cypress Semiconductor
2
Baker Ch. 3 The Metal Layers

Design and Layout

Introduction to VLSI
DESCRIPTION
–
CONNECTIVITY
•
–
METAL1  VIA1  METAL2
RULES
•
VIA1 MUST BE ENCLOSED BY
–
–
•
–
VIA1 IS ONE FIXED W/L
CONNECTIVITY
•
•
•
–
METAL1
METAL2
METAL1  VIA1  METAL2
NWELL IS NOT CONNECTED
HOW TO CONNECT TO NWELL?
CAN / SHOULD HAVE MANY VIAS
•
HOW MANY VIAS IN A DESIGN?
Joseph A. Elias, Ph.D. Adjunct Professor, University of Kentucky; Modeling Principal, Cypress Semiconductor
3
Baker Ch. 3 The Metal Layers

Parasitics

DESCRIPTION
–
SEPARATE DEVICE FROM OTHER
•
•

METAL SHEET RHO
•
•
–
WHAT ARE UNITS OF SHEET RHO?
HOW IS SHEET RHO FOUND?
VIA RESISTANCE
•
NO SHEET RHO, WHY?
CAPACITANCE
–
METAL1 OVER SUBSTRATE
•
•
–

WHAT DEVICES ARE HERE?
WHAT “OTHER” IS HERE?
RESISTANCE
–

Introduction to VLSI
WHERE ARE TERMINALS?
DISTRIBUTED CAP  LUMPED
METAL2 OVER METAL 1
DISTRIBUTIONS
–
RESISTANCES, CAPS DO NOT
HAVE ONE VALUE ONLY
Joseph A. Elias, Ph.D. Adjunct Professor, University of Kentucky; Modeling Principal, Cypress Semiconductor
4
Baker Ch. 3 The Metal Layers


ELECTOMIGRATION, DRC
DESCRIPTION
–
ELECTROMIGRATION
•
•
•
0.6um
0.7um
0.225um
0.35um
0.8um
0.6um
Introduction to VLSI
–
DRC RULES
•
•
–
LIMITS Imax
DUE TO BAMBOO FORMATION
SEPARATION, FAILURE
BOOK VALUES ARE NOT TYPICAL
NEED DESIGN RULE PRIMER
TERMINOLOGY
•
•
•
•
ENCLOSURE
SPACING
WIDTH
OVERLAP
1.0um
KEY PHRASE, THESE ARE NOT
THE RULES THAT YOU USE
Joseph A. Elias, Ph.D. Adjunct Professor, University of Kentucky; Modeling Principal, Cypress Semiconductor
5
Baker Ch. 3 The Metal Layers

Cross Talk, Ground Bounce

Introduction to VLSI
DESCRIPTION
–
CONDUCTORS INTERACT
•
–
CROSS TALK
•
•
–
AC, DC SIGNALS
V=IR
•
•
•
•
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AC SIGNALS
Imutual=Cmutual dVsignal/dt
GROUND BOUNCE
•
–
EM FIELD OVERLAP, V INDUCED
CAUSE AND EFFECT
V IS FROM POWER SUPPLY
I IS FROM V/R
R IS FIXED, BASED ON ROUTING
DECOUPLING CAP
•
•
STORES VDD CHARGE
TRANSIENT CURRENT
Joseph A. Elias, Ph.D. Adjunct Professor, University of Kentucky; Modeling Principal, Cypress Semiconductor
6