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(Layer0) Mechanical Issues
+ Test-Beams
S. Bettarini
On behalf of the Pisa Group
V Super-B workshop – Paris 9th May 2007
Outline
• Support structure for a baseline striplet L0
• For the APSEL MAPS candidate pixel sensor:
– Mechanical/Thermal issues
– Prototypes: micro-channel on AlN substrate
• “Looking for” a test-beam facility
– The “demonstrator”
• Conclusions
Layer0 striplets R&D issues
Technology for L0 baseline striplet design well estabilshed
– Double sided Si strip detector 200 mm thick
– Existent redout chip (FSSR2 - BTeV) matches the requirements for
striplets redout with good S/N ~ 25.
– Redout speed and efficiency not an issue with the (safety factor x5 included in
the expected background rate)
– Possible reduction in L0 material budget (from 0.45%  0.35% X0) with
R&D on the connection between the silicon sensor and the FEE:
• Interconnection critical given the high number of readout channels/module
(~3000). Possible choices:
– Multiple layers of Upilex with Cu/Au traces with m-bonding (as in SVT)
– Kapton/Al microcables with Tape Automated Bonding (as in ALICE experiment)
Readout Left
Si detector
12.9x97.0 mm2
HDI
Readout Right
1st fanout, 2nd fanout
HDI
Conceptual design module “flat”
z
Mechanical constraints & assembling procedures
•
The Layer0 module must be bent (HDI w.r.t.
sensor plane) to fit inside the radius of the
current BaBar Layer1 ( R(L1)=32.5 mm )
• Each hybrid is mounting 6 chips
(FSSR2: 7.5 x 5 mm2)
Fanout
estension
R(L1)=32.5mm
Si det
R(L0)=15mm
HDI
Assembly Procedure:
• The module is assembled FLAT
(length=284 mm x width=54.5 mm):
• The fanouts are glued on the det
and micro-bonded
• The DFA is electrically tested and
Defects eventually cured
• The HDI is connected to the fanouts
and bonded
• Using bending masks we rotate the hybrids
(using the flexibility of the kapton circuits).
• Freezing the module into the final
geometry by a stiff carbon-fiber/kevlar
structure (ribs & end-pieces “a la BaBar”:
0.5 mm thick and 4 mm height)
Striplets Si detector
(fanout cut-away)
Module Layer0 (3D-view)
Carbon-Kevlar
ribs
End
piece
Buttons
(coupling HDI to flanges)
Upilex
fanout
chip
Hybrids
Placing the Layer0 module on the flanges
Semicircular
flanges
(cooling
circuit
inside)
Places for
Buttons
Thermal Conductive wings
Final Layer 0 structure
Layer 0 mounting procedures:
3-D view
• Mech. tolerances are very tight !
• Four modules are first mounted on
semi-circular flanges.
• The cooling circuit is inside the
annular region of the circular flanges,
with thermal conductive wings
to drain the heat from the hybrids
• The two halves are then coupled
to wrap the whole structure over the
beam pipe cylinder .
r-f cross section
Further investigating:
• structural and thermal FEA
• test on prototypes
.
There is still some room left for final tuning to
optimize/minimize the material
(e.g. aluminum micro-cables).
MAPS moduleThermal Study
Design Requirements
Power Dissipation:
• Electronics & sensor integrated 
great amount of heat dissipated
on the active area.
• Spec’s for the MAPS Layer 0 :
– Power = 210 W / layer (Power = 50 mW/cell = 2 W/cm )
– Electronics Working Temp. range: [0,50] oC
2
The need to evacuate heat in the sensitive area is
driving the mechanical problem.
Viable solutions depending on
The possibility of strong reduction of Pixel cell power dissipation ?
P > 5 uW/channel
(most-likely scenario)
Low Power scenario
P < 5 uW/channel
Cooling heath sink by
Thermal Conduction
•
Module Step 0 Double Side.
Cooling heath sink by
Thermal Convection
•
Module step 1 Double side.

Sensible Thermal analysis:
reduction power dissipation
versus material with better
thermal conductivity.
•Module Microchannel Double Side.
Module Step 0 Double Sided
(Dissipation with Thermal Conduction:)
Low Power scenario
Cooled Region
•
•
N°2 read-out units (“caterpillar”) composed by 4 chips each , 12.8mm x 12.8mm.
Two silicon layers (up/down) placed on the mechanical support forming a ladder.
Typical DS Module Boundary Conditions
Power: 2 watt/cm2 on each silicon surface
Temperature : Surface between aluminum pipe
and AlN substrate @ 10 °C
Geometry: Longitudinal Cross Section
FEA results on Double-Sided
(thermal conduction)
Typical thermal gradient:
How the Tmax temperature changes modifying the power consumption of
silicon
(AlN substrate180 watt/mK)
• Tmax = 837 °C
with 2 watt/cm2
• Tmax = 195 °C
with 0.4 watt/cm2 (1/5 of nominal total power)
• Tmax = 103 °C
with 0.2 watt/cm2 (1/10 of nominal total power)
And……. modifying the material? (Increasing thermal conductivity)
BeO Substrate: (280 watt/mK)
• Tmax = 628 °C
with 2 watt/cm2
• Tmax = 134 °C
with 0.4 watt/cm2 (1/5 of nominal total power)
Low Power scenario
• Tmax = 72 °C
with 0.2 watt/cm2 (1/10 of nominal total power)
Diamond Substrate: (800 watt/mK)
Tmax = 236 °C with 2 watt/cm2
Tmax = 56 °C with 0.4 watt/cm2 (1/5 of nominal total power)
Tmax = 33 °C with 0.2 watt/cm2 (1/10 of nominal total power = 5uW/ch)
Module Microchannel Double Sided
(Dissipation with Thermal Convection)
High Power
Cooled channel
•
•
N°2 read-out units (“caterpillar”) composed by 4 chips each , 12.8mm x 12.8mm.
Two silicon layers (up/down) placed on the mechanical support forming a ladder.
Microchannel Module Boundary Conditions
High Power
Power: 2 watt/cm2 on each silicon surface
Temperature : Inlet cooling liquid @ 10 °C
Geometry: Transversal Cross Section
AlN-AlN Interface: 50 mm of Conductive Glue (4 watt/mK)
FEA results on Microchannel Module
High Power
Typical results:
Tmax = 11.3 °C with 2 W/cm2 on each sensor surface
The Hydraulic cooling circuit parameters are:
If we want to decrease the fluid velocity and pressure losses
we need to accept a bigger DT.
Tinlet = 10 °C
Tinlet = 10 °C
Delta T = 3 °C
Delta T = 8 °C
Hydraulic diameter = 0. 897 mm
Hydraulic diameter = 0. 897 mm
Flow = 0.251 l / min
Flow = 0.094 l / min
V (H2O) = 6.6 m/sec
V (H2O) = 2.5 m/sec
Pressure losses = 1 atm
Pressure losses = 0.187 atm
Reynold number = 5933
Reynold number = 2225
Remarks
• Module without fluid refrigerant possible only with low power
scenario and diamond support structure.
• Solutions implying fluid flowing inside the detector needs
pipes on ladders for which the ideal goal lsupport (X0) ~ l Si
(X0) is hardly achieved.
• Performace OK with a total L0 materia budget <0.5 % X0. .
– micro-channel module 0.41 % X0.
Alternative approach:
• the beam pipe tube is a cold source
(1 kW cooling system, T=12 °C ) to
evacuate the Layer 0 heat.
• The external cilinder of the beam pipe used as a support for the
Silicon chips. To study: its mechanical /thermal stress due to the
passage of the beam (normal modes, etc …).
Ongoing R&D activities
• Works in progress
– Mechanical characterization of 50/150/300 mm thick silicon wafer
(bending tests, membrane beahaviour etc.)
– AlN material procured (Haldemann & Porret) for microchannel module
prototype
– Carbon fibers (M46J) supports arriving (Plyform) for prestress test
• Future works
– R&D on Micromachining:
laser ablation for Microchannel module
– R&D on glueing technology for very low glue thickness
– Assembling of AlN microchannel prototype
structure with traditional technique
– Vibration analysis of the microchannel module prototype
– Study on the beam pipe as the L0 support
Work in Structural Diagnostic lab
Load / deformation diagram
sample 50 mm thick (L=42 mm, f=8 mm)
The Silicon sensor
can be shaped as a
cilinder of 64 mm
in diameter!
Test-beam in 2008
• In the 2nd half of 2008 MAPS and striplet
detectors ready to be tested on the beam
• Still looking for the best site.
• Test of the whole system, consisting of:
– Sensor MAPS
– DSSD striplets
– Read-out (FSSR2)
– DAQ/AM
The “DEMONSTRATOR”
S-1,2,3
(inside the reference telescope)
scintillator
(coinc. NIM/TTL output
to the DAQ)
Striplets-2
Striplets-1
S2
T-4,3
T-2,1
MAPS-1
beam
S3
MAPS-2
MAPS-1,2 : MAPS (several mm2)
50x50 mm2 (50 mm-thick)
T-1,2,3,4 :reference telescope modules
(~2x2 cm2 )
DSSD 300 mm thick
25 p-side, 50 n-side mm pitch
50 mm r.o. pitch (3 chip FSSR2/side)
S1
Striplets-1,2:
(1.29x7.0 cm2 )
DSSD 200 mm thick ( 45o)
25 p-side, 50 n-side mm pitch
50 mm r.o. pitch (chip FSSR2)
Test-beam
Demonstrator
The Associative Memory Board
provides Level 1 trigger signal to the DAQ
based on the hits of the demonstrator:
pattern-matching “a la CDF”, tracks found
during detector readout.
DAQ architecture
Test-beam purposes
• Find the capability rate of the system
• Study efficiencies & resolutions
vs. track’s incident angle
Conclusions
• Provided a working design for the striplet L0
• R&D ongoing for the mechanical/thermal issues of the
pixel L0 with the CMOS MAPS sensor. Focus on:
– power dissipation
– minimize the material
The spec’s of the problem are defined:
room for new ideas and mechanical solutions!
• Series of test-beams for the demonstrator
(1st starting in summer 2008 and then in 2009)
Looking for the best test-beam facility.
Back-up SLIDES
Layer 0 baseline design
• Octagonal shape with R=1.5 cm, LAB accept. 300 mrad in
FW and BW
• Module active area = 1.29 x 9.7 cm2
• Double sided detector, 200 um thick, with striplets, (45 degrees w.r.t
det edges), readout pitch 50 um.
• strip area = 50 um x 1.83 cm, 3080 strips/module
• 770 strips readout on each short side of the module (left/right)
– bring signals outside the active region with traces on a fanout support (as
in SVT modules, z side  several fanout layers/module depending on
pitch
Readout Left
r= 1.5 cm
V
U
1.29 cm
9.7 cm
Readout Right
P side
d~ 1.29 cm
L_strip ~ 1.83 cm
50 mm
L~ 9.7 cm
N side
Pstop to
insulate n+
strips or
pspray
50 mm
Front end chip I
• Expected background hit rate = 5 MHz/cm2 @
r=1.5cm
– Including x 10 safety factor  50 MHz/cm2 used
in the following
• L0 strip rates (> 450 kHz) are not acceptable
with present SVT front end (ATOM chip) :
– With 1 ms readout window L0 strip occupancy > 45%
– Inefficiency due to shadowing: a single hit (the first
in the readout window) is retrieved from the pipeline
when LV1 trigger is received  background hits can
shadow hits from physics
– Such a high occupancy affects pattern recognition
Front end chip II
• Try a different approach for readout: fast, data driven
readout architecture, with no analog storage, with
enough output bandwidth to ensure that no data is lost
due to readout deadtime.
• FSSR2, designed for the BTeV Forward Silicon Tracker
(Pavia/Bergamo-Fermilab), has the right features:
–
Mixed-signal integrated circuit for the readout of silicon strip
detectors (selectable shaper peaking time: 65-85-125 ns)
–
TSMC 0.25 µm CMOS tech. with enclosed NMOS  Rad. Hard
–
128 analog channels, sparsified digital output with address,
timestamp, and pulse height information for all hits
Architecture designed to run with 132 ns bunch crossing
(timestamp granularity = BCO clock = 7.6 MHz), readout clock @
70more
MHzdetails
 840onMb/s
output
data
rate. :
For
FSSR2
see for
example
–
–
•
V. Re et al., “FSSR2, a Self-Triggered Low Noise Readout Chip for Silicon Strip Detectors”,
2005 IEEE Nuclear Science Symposium Conference Record
•
V. Re: “First prototype of a silicon microstrip detector with the data-driven readout chip FSSR2
for a tracking-based trigger system” , presented @ 10th Pisa Meeting on Advanced Detectors, La
Biodola (Isola d’Elba), May 21 – 27, 2006
FSSR2 for L0 striplets
• In SuperB L0 expected FSSR2 chip occupancy (132 ns) =
6%
– Should be OK for pattern recognition
– Is FSSR2 fast enough for SuperB?
– YES, if you believe to simulation performed for BTeV
• FSSR2 chip optimized for BTeV operation:
– With 2 interactions/bunch crossing (132 ns), expected BTeV FSSR2
occupancy 2%
– With standard operation (132 ns BCO clock) FSSR2 can handle 2%
occupancy with efficiency > 99%.
• FSSR2 Simulation performed for BTeV with 6% occupancy
(6 interactions/bunch crossing) indicates:
– Efficiency ~ 96.5%, with standard BCO clock frequency
– Can improve efficiency (~ 98.5%) with x 4 BCO clock frequency.
• FSSR2 chip can read L0 striplets (6% occupancy) with
98.5% efficiency
Layer 0 S/N with FSSR2
• Assume noise performance
as measured in FSSR2:
• Serie resistance increases
by ~ 14% the slope b:
Rs = Lfanout *2 /cm + Ldet*20
/cm=55  e_n=4kT Rs/3
Equivalent Noise Charge =
600 e-
1500
ENC [e rms]
– ENC=a+b*CD
– a=240 e- , b=35 e-/pF
FSSR2 noise vs det Capacitance
2000
C
9pF
D =
BLR
selected
1000
500
tp=65 ns ENC = 240 + 35 e/pF
tp=85 ns ENC = 230 + 28 e/pF
tp=125 ns ENC = 220 + 24 e/pF
0
0
10
20
30
CD [pF]
• Signal = 16000 e- (Si 200 um thick)
• S/N = 26 ( ~ 24 including 300 e- thr. dispersion
added to noise in quadrature)
40
50
Radiation Hardness
• Si detector dose ~ 6.6 Mrad/yr (safety included). Should be
ok (rough estimate of noise contribution due to leakage
current ~ 670 e- after 5 years of operation, to be added in
quadrature to previous noise figure).
• Chip dose depends on their radial location.
– Assuming chip located at radius of ~ 2.4 cm
 expected chip dose ~ 200 krad/yr  OK !
FSSR2

Irradiation with 60Co g-rays to a total ionizing dose of 20 Mrad (no bias
applied during irradiation)

Chip fully functional after irradiation; noise and charge sensitivity are not
affected

Threshold dispersion with BLR selected increases by about 15 % (remains
below the spec value of 500 e rms)
Materials Data Sheet
Material X0 (cm) Density (gr/cm3) K = Termal Cond.(W/ mK) E (kg/mm2) CTE(um/ mK)
Si
9.4
2.3
124
11200
5.5
Be
35.3
1.8
216
28000
11.5
Al
9.0
2.7
210
7000
24.0
C.F.
25.0
1.6
160
12400
Upilex
28.5
1.4
0,35
300
30.0
Al2O3
25.0
4.8
30
35000
8.0
Cu
1.4
9.0
386
12000
16.4
H20
36.0
1.0
609x10 -3
AlN
25.0
3.3
180
27600
4.7
BeO
35
2.86
280
36000
7.5
KX1100
25
2.2
600 - 2.5
600
0.1
We have to look materials for support structure with the following
properties:
Low CTE, low X0, high K, high tensile modulus E, high temporal stability.
Important to use materials with similar CTE to reduce bimetallic effect.
Resolution
sintrinsicDUT= (sresiduals2 - sextr.track2 - sMSonDUT2)1/2
D=500 mm, d=10 mm, P(p)=15 GeV, Si(DUT)=300 mm,
sx/y =25 mm/sqrt(12)=7.2 mm=
sintrinsic
<q>MS= 4 x 10-5 rad
Line Fit to the hits of the telescope(w/o DUT)
250 mm
residual
DUT
hit
sresiduals = 8.8 mm
sextr.track = 3.6 mm
sMSonDUT= 3.6 mm
Event Display
(50 tracks)