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Product Information Sources_12_PI High Density Plasma Sources for Advanced Surface Processing Functional principles of plasma sources Plasma sources apply energy via electric and / or magnetic fields to free electrons in a low pressure gas and to generate a plasma with defined properties. Most plasma sources utilize RF or microwave frequencies for excitation. MicroSystems offers three general types of plasma sources. These sources are the basis of the MicroSys and AK platforms but are also available as stand alone products (Tab. 1). Besides the sources described below, MicroSystems also offers common parallel plate discharge arrangements including dual frequency excitation. Plasma sources by MicroSystems Circular microwave plasma sources – ECR series Fig. 1: MicroSystems PQ 160 mm ECR source The PQ 160 ECR and PQ 250 ECR utilize a patented excitation principle. A λ/4 stub antenna feeds the microwave power from the rear source side via a dielectric window. The microwave field gets superposed by a permanent magnetic field, which generates conditions for an electron cyclotron resonance (ECR) in a torus like region around the antenna. These sources are also available with a direct immersed metal antenna and give favorable performance in sputter etching of metals. Linear microwave plasma sources – LPS series The patented LPS type microwave sources consist of a partially transparent cylindrical waveguide which are fed from both sides. The coaxial microwave guide is made of a substantial inner conductor and a quartz tube with circumambient plasma, so that the preceding wave feeds the discharge. An integrated dual channel gas supply system provides for an optimized plasma density and homogeneity along the source. These sources are preferably used in inline systems (LPS 1.0) or arranged in arrays (LPS 2.1), and are the basis for the large area AK processing equipment of MicroSystems. Inductively coupled RF plasma sources – ICP series The ICP plasma sources of MicroSystems use patented excitation principle combining a circular coil which is fed by a RF current combined with a set of ferrites for forming the resulting magnetic field. The magnetic field itself generates in front of a coupling window a homogeneous and highly dense plasma. The ICP type sources (Fig. 1) are the major basis of the MicroSys and MicroCluster equipment platforms. Principle PQ 160 ECR PQ 250 ECR Resonant microwave discharge with stub antenna LPS 1.0 LPS 2.1 Microwave excitation along transparent microwave guide ICP 200 ICP 400 Inductively coupled RF discharge with planar coil arrangement Size 160 mm 250 mm Max 1.3 m 200 mm 400 mm Mounting DN 160 DN 250 Special - Wall mounted Special 250 Special 450 13.56 MHz 4.00 MHz 1.2 kW 2.0 kW Excitation Frequency Source Power Cooling Gases 2.45 GHz 800 W 1.2 kW Water 2x 4 kWCW / 2x 10 kWP Foced air / Water Water Noble gases, N2, H2, O2, Halogen containing gases, Hydorcarbons, SiH4, NH3, N2O, Silicon-organic precursors, TMA Meyer Burger (Germany) AG - BU MicroSystems [email protected], http://microsystems.meyerburger.com An der Baumschule 6-8, 09337 Hohenstein-Ernstthal, Germany, Phone: +49 3723 671 234 Technical data are subject to change / 12/2014 Type