Survey
* Your assessment is very important for improving the workof artificial intelligence, which forms the content of this project
* Your assessment is very important for improving the workof artificial intelligence, which forms the content of this project
Modeling Advanced Oxidation Processes for Water Treatment Ashley N. Anhalt, A. Eduardo Sáez, Robert G. Arnold, and Mario R. Rojas Department of Chemical and Environmental Engineering The University of Arizona • Many conventional wastewater treatment processes only partially remove trace organics that result from human use, including hormones and pharmaceuticals. • Advanced oxidation processes (AOPs) can be used to remove the chemicals that remain. Ultraviolet Photolysis of H2O2 (UV/H2O2) is one of the most common AOPs used in practice. • In this work, we propose a kinetic model to simulate the UV/H2O2 process taking into account the destruction of trace organics by radicals generated in multiple reactions. • This research predicts the degradation of organic contaminants over a wide range of conditions and illustrates the potential for polishing conventionally treated wastewater with AOPs. CHEMICAL REACTIONS METHODOLOGY ABSTRACT Learning the Model: • In order to validate the efficacy of the UV/H2O2 model, data from previously published research were successfully reproduced. • Accurate comparisons between these graphs and those previously developed demonstrate an understanding of the model. Fixing the Model: • Originally, the UV/H2O2 model functioned as one reactor (Figure 2), in which the concentrations of the radicals are assumed to be uniform throughout the reactor. This assumption of uniformity throughout the reactor is inaccurate. • We adjusted the model by dividing the reactor into multiple equivalent sections (Figures 3 and 4). • By considering two or three individual reactors, the model better accounts for light intensity effects and spatial variations of radical concentrations. • Comparisons between the one-reactor setup, the two-reactor setup, and the three-reactor setup allow for insight as to how depth influences the chemical degradations. INTRODUCTION • Typical wastewater treatment processes do not completely remove organics, such as pharmaceuticals and endocrine disrupters. • An advanced treatment method which removes these unwanted chemicals in a cost-efficient manner is highly desirable. • This research simulates and analyzes a UV/H2O2 AOP, which converts organic contaminants into carbon dioxide (CO2), instead of transporting the contaminants across different treatment phases, such as in adsorption processes. Figure 2: This one-reactor setup assumes uniformity of all chemical concentrations. Figure 3: This two-reactor setup considers each reactor1 and reactor2 as separate reactors and assumes uniformity of all chemical concentrations in each reactor. Figure 4: This three-reactor setup considers each reactor1, reactor2, and reactor3 as separate reactors and assumes uniformity of all chemical concentrations in each reactor. Figure 5: Light intensity attenuated by absorption. RESULTS Preliminary model results demonstrate that the UV/H2O2 model was successful in reproducing previously published results (Figure 6). Below are the elementary chemical reactions involved in the UV/H2O2 model. Kinetic and equilibrium constants are at 25°C. Reactions E1 to E4 are considered to equilibrate instantaneously. No. Reaction Rate constant, k (M-1s-1) or equilibrium constant, K R1 R2 R3 R4 R5 R6 R7 R8 R9 R10 R11 R12 R13 R14 R15 R16 R17 R18 R19 R20 R21 E1 E2 E3 E4 f=0.5 (primary quantum yield) k2 = 2.7 107 k3 = 7.5 109 k4 = 8.5 106 k5 = 3.9 108 k6 = 6.6 109 k7 = 8.0 109 k8 = 5.5 109 k9 = 3.0 109 k10 = 1.3 10-1 k11 = 6.5 108 k12 = 9.7 107 k13 = 8.6 105 k14 = 3.7 k15 = 8.0 105 k16 = 3.0 107 k17 = 2.0 107 kPC = 1.2 1010 kNP = 1.33 1010 kIPOH = 1.9 109 kEtOH = 1.9 109 Ka1 = 10-11.60 Ka2 = 10-4.86 Ka3 = 10-6.30 Ka4 = 10-10.36 H2O2 + hn → 2HO· ·OH + H2O2 → O2·- + H2O + H+ ·OH + HO2- → O2·- + H2O ·OH + HCO3- → CO3·- + H2O ·OH + CO32- → CO3·- + OH·OH + HO2· → O2 + H2O ·OH + O2·- → O2 + OH·OH + ·OH → H2O2 ·OH + CO3·- → Products O2·- + H2O2 → ·OH + O2 + OHO2·- + CO3·- → O2 + CO32O2·- + HO2· + H2O → H2O2 + O2 + OHHO2· + HO2· → H2O2 + O2 HO2· + H2O2 → ·OH + O2 + H2O CO3·- + H2O2 → HCO3- + O2·- + H+ CO3·- + HO2- → HCO3- + O2·CO3·- + CO3·- → 2CO32PC + ·OH → Products NP + ·OH → Products C3H8O + ·OH → Products C2H6O + ·OH → Products H2O2 HO2- + H+ HO2· O2·- + H+ H2CO3 HCO3-+ H+ HCO3- CO32-+ H+ CONCLUSIONS • The adjusted UV/H2O2 models, which take into account the spatial variations of radical concentrations, are improved models. • Expanding this multiple-reactor approach to other data sets and different conditions would be rewarding future research. • As originally hypothesized, the degradation of organic contaminants is predictable over a wide range of conditions. Figure 1: Student conducting UV/H2O2 AOP experiments. • This project applies an innovative approach to the UV/H2O2 model, taking into account spatial variations of radical concentrations in the reactor. • This UV/H2O2 model illustrates the promise for effectively and efficiently removing potentially harmful contaminants in water. • By improving an already robust UV/H2O2 AOP model, there is obvious potential for polishing conventionally treated wastewater. • The implications of these results are significant. UV/H2O2 MODEL OBJECTIVES • To oxidize unwanted compounds remaining in wastewater. Figure 6: The decomposition of p-cresol for three initial H2O2 concentrations using the UV/H2O2 model. [PC]0=240μM and λ=250nm. (Left) Figure from Rojas et al. (2010). (Right) From this research. The new multiple-reactor approaches take into account spatial variations of radical concentrations. The figure below (Figure 7) demonstrates slight improvement in the accuracy of the multiple-reactor models compared to the original single-reactor model. • To characterize the mechanism and kinetics behind the decomposition of nonylphenol (NP) and p-cresol (PC), two chemicals in wastewater that serve as surrogates for endocrine disruptors. • To improve an already robust UV/H2O2 AOP model by taking into account spatial variations of radical concentrations. • To predict the degradation of organic contaminants over a wide range of conditions, thus broadening the model’s applications. Figure 7: (Left) The decomposition of PC using the original single-reactor UV/H2O2 model. (Middle) The decomposition of PC using the improved two-reactor UV/H2O2 model. (Right) The decomposition of PC using the improved three-reactor UV/H2O2 model. • Determining a consistently successful and cost-effective method for the removal of these pollutants is essential. ACKNOWLEDGEMENTS I would like to thank: • Dr. Maria Teresa Velez, the Director of the University of Arizona Undergraduate Research Opportunities Consortium (UROC) • Donna Treloar, the Director of the University of Arizona Summer Research Institute (SRI) This research was supported by the Western Alliance to Expand Student Opportunities (WAESO) ‘Senior Alliance’ Louis Stokes Alliance for Minority Participation (LSAMP) National Science Foundation (NSF).